Abstract: A mask inspection system employs TDI imaging. The mask inspection system is calibrated by iteratively repeating, until a stopping criterion is met: (i) simultaneously acquiring first and second TDI images using respective first and second TDI image sensors of the mask inspection system, the first and second TDI image sensors being configured to acquire the respective first and second TDI images with light of mutually orthogonal polarizations, and (ii) automatically adjusting a position of the second TDI image sensor using an electronic controller that receives a feedback error signal indicative of the shift of the second TDI image respective to the first TDI image along the shift direction. The adjusting may utilize an electronic controller that controls the motor based on a received feedback error signal indicative of the shift of the second TDI image respective to the first TDI image along the shift direction.

Abstract: Methods and apparatuses for a lithography exposure process are described. The method includes irradiating a target droplet with a laser beam to create an extreme ultraviolet (EUV) light. The methods utilized and the apparatuses include two or more collectors for collecting the generated EUV light and reflecting the collected EUV light to a focal point of one of the collectors. In some embodiments, one of the two collectors includes a ring-shaped collector.

Abstract: A radiator and an immersion tank using the radiator is provided. The immersion tank includes a first condensation tank and the radiator. Multiple motherboards and a first working fluid are located in the first condensation tank. The radiator includes a condensation assembly and multiple heat exchanger parts. The condensation assembly is assembled outside the first condensation tank along a first direction, wherein the condensation assembly has a second condensation tank, and the second working fluid flows through the second condensation tank. Each heat exchanger part extends along the first direction, a first end of the heat exchanger part is plugged into the first condensation tank, and a second end of each heat exchanger part is plugged into the condensation assembly.

Abstract: An extreme ultraviolet (EUV) source includes a collector associated with the vessel. The extreme ultraviolet (EUV) source includes a plurality of vanes along walls of the vessel. Each vane includes a stacked vane segment, and the stacked vane segments for each vane are stacked in a direction of drainage of tin (Sn) in the vessel. The EUV source includes a thermal control system comprising a plurality of independently controllable heating elements, where a heating element is configured to provide localized control for heating of a vane segment of the stacked vane segments.

Abstract: An electronic device and an operating method thereof are provided. The electronic device includes a first switch array, a second switch array, a first signal processor, and a controller. The first signal processor is coupled between the first and second switch arrays. The controller is coupled to the first and second switch arrays. The controller transmits an input signal to the first signal processor through the first switch array, and receives an output signal of the first signal processor through the second switch array. The controller determines whether the output signal is equal to an expected signal to generate a detection result. When the detection result is an abnormal state, the first switch array and the second switch array change the controller to be coupled to a backup signal processor.

Abstract: A method includes capturing a first reference image of a mask by an inspection apparatus, the capturing comprising measuring a first reflected light intensity from the first reference image; performing, using the mask, an exposure process on a wafer; after performing the exposure process, measuring a second reflected light intensity on the mask by the inspection apparatus; comparing the second reflected light intensity with the first reflected light intensity from the first reference image; determining whether a first comparison result of the first and second reflected light intensities is acceptable; in response to the determination determines that the first comparison result is unacceptable, adjusting an inspection parameter of the inspection apparatus.

Abstract: In order to prevent long down-time that occurs with unexpected material depletion, an inline tin stream monitor (ITSM) system precisely measures the tin amount introduced by an in-line refill system and precisely estimates remaining runtime by measuring pressure level changes before and after in-line refill.

Abstract: A system and method for dynamically controlling a temperature of a thermostatic reticle. A thermostatic reticle assembly that includes a reticle, temperature sensors located in proximity to the reticle, and one or more heating elements. A thermostat component that is in communication with the temperature sensors and the heating element monitors the current temperature of the reticle relative to a steady-state temperature. In response to the current temperature of the reticle being lower than the steady-state temperature, the heating elements are activated to preheat the reticle to the steady-state temperature.

Abstract: A system for monitoring and controlling an EUV light source includes a first temperature sensor, a signal processor, and a process controller. The first temperature sensor includes a portion inserted into a space surrounded by a plurality of vanes through a vane of the plurality of vanes, and obtains an ambient temperature that decreases with time as a function of tin contamination coating on the inserted portion. The signal processor determines an excess tin debris deposition on the vane based on the obtained chamber ambient temperature. The process controller activates a vane cleaning action upon being informed of the excess tin debris deposition by the signal processor, thereby improving availability of the EUV light source tool and reducing risks of tin pollution on other tools such as a reticle.

Abstract: A method includes irradiating debris deposited in an extreme ultraviolet (EUV) lithography system with laser, controlling one or more of a wavelength of the laser or power of the laser to selectively vaporize the debris and limit damage to the EUV) lithography system, and removing the vaporized debris.

Abstract: A method includes: depositing a mask layer over a substrate; directing first radiation reflected from a central collector section of a sectional collector of a lithography system toward the mask layer according to a pattern; directing second radiation reflected from a peripheral collector section of the sectional collector toward the mask layer according to the pattern, wherein the peripheral collector section is vertically separated from the central collector section by a gap; forming openings in the mask layer by removing first regions of the mask layer exposed to the first radiation and second regions of the mask layer exposed to the second radiation; and removing material of a layer underlying the mask layer exposed by the openings.

Abstract: In accordance with some embodiments, a method of controlling an extreme ultraviolet (EUV) radiation in lithography system is provided. The method includes generating a plurality of target droplets. The method also includes generating a pre-pulse and a main pulse from an excitation laser module to generate EUV light and reflecting the EUV light by a collector mirror. The method further includes measuring a separation between a pre-pulse and a main pulse. Moreover, the method includes determining whether the separation between the pre-pulse and the main pulse in the y-axis is changed, if not adjusting a configurable parameter of the excitation laser module to set the variation in the energy of the EUV light within an acceptable range.

Abstract: A method for operating a reticle inspection system includes training an analysis model of the reticle inspection system with a machine learning process, generating a difference threshold based on the machine learning process, storing a reference image, and generating a scan image of a reticle with the reticle inspection system. The method includes generating a relative difference value by comparing the scan image to the reference image. The method includes, if the relative difference value is less than the difference threshold, determining that the reticle is not defective. The method includes, if the relative difference value is greater than the difference threshold, determining that the reticle is defective.

Abstract: Some implementations described herein provide a reticle cleaning device and a method of use. The reticle cleaning device includes a support member configured for extension toward a reticle within an extreme ultraviolet lithography tool. The reticle cleaning device also includes a contact surface disposed at an end of the support member and configured to bond to particles contacted by the contact surface. The reticle cleaning device further includes a stress sensor configured to measure an amount of stress applied to the support member at the contact surface. During a cleaning operation in which the contact surface is moving toward the reticle, the stress sensor may provide an indication that the amount of stress applied to the support member satisfies a threshold. Based on satisfying the threshold, movement of the contact surface and/or the support member toward the reticle ceases to avoid damaging the reticle.

Abstract: A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. The target droplet source further includes a sleeve disposed in the chamber distal to the nozzle. The sleeve is configured to provide a path for the target droplets in the chamber.

Abstract: An antenna-in-package with a heat dissipation structure includes a circuit board, an antenna substrate, a chip, a plurality of heat dissipation fins, a chassis, and dielectric fluid. The circuit board has a first surface and a second surface opposite to the first surface. The antenna substrate is disposed above the first surface of the circuit board. The chip is disposed between the antenna substrate and the first surface of the circuit board and is electrically connected to the antenna substrate. The plurality of heat dissipation fins protrude from the second surface of the circuit board. The chassis encapsulates the circuit board, the antenna substrate, the chip, and the plurality of heat dissipation fins. The dielectric fluid circulates and flows in the chassis through a cooling circulation device and is in direct contact with the plurality of heat dissipation fins.

Abstract: A method includes positioning a substrate in an optical path of a multiwavelength light source; generating a first detection result by exposing a first region of the substrate to a first light having a first wavelength band selected by the light source; and generating a second detection result by exposing a second region of the substrate to a second light having a second wavelength band selected by the multiwavelength light source. A system includes a multiwavelength light source including a light source and a wavelength selector in an optical path of light generated by the light source. The system further includes a spectrometer operable to measure a spectrum of a first light selected by the wavelength selector; a mask stage operable to position a mask in the optical path; and a controller operable to adjust a parameter of the multiwavelength light source responsive to the spectrum of the first light.

Abstract: In a method of generating extreme ultraviolet (EUV) radiation in a semiconductor manufacturing system one or more streams of a gas is directed, through one or more gas outlets mounted over a rim of a collector mirror of an EUV radiation source, to generate a flow of the gas over a surface of the collector mirror. The one or more flow rates of the one or more streams of the gas are adjusted to reduce an amount of metal debris deposited on the surface of the collector mirror.

Abstract: Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.

Abstract: A system and method for dynamically controlling a temperature of a thermostatic reticle. A thermostatic reticle assembly that includes a reticle, temperature sensors located in proximity to the reticle, and one or more heating elements. A thermostat component that is in communication with the temperature sensors and the heating element monitors the current temperature of the reticle relative to a steady-state temperature. In response to the current temperature of the reticle being lower than the steady-state temperature, the heating elements are activated to preheat the reticle to the steady-state temperature.