Patents by Inventor Chieko Mihara

Chieko Mihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240276873
    Abstract: An organic light-emitting device includes, in sequence, a first electrode, a first light-emitting layer, a charge transport layer, a charge generation portion, a second light-emitting layer, and a second electrode. The charge transport layer contains a fused polycyclic hydrocarbon compound.
    Type: Application
    Filed: January 23, 2024
    Publication date: August 15, 2024
    Inventors: SATORU SHIOBARA, YOSUKE NISHIDE, ITARU TAKAYA, HITOSHI NAGASHIMA, CHIEKO MIHARA
  • Patent number: 11332597
    Abstract: The present invention provides a photo-curable composition, and UV imprint method, that requires a small demolding force, wherein the photo-curable composition contains a polymerizable monomer (A), a polymerization initiator (B), and a fluorine-containing surfactant (C), and the photo-cured product of the photo-curable composition has a water contact angle of 74 degrees or less.
    Type: Grant
    Filed: December 18, 2019
    Date of Patent: May 17, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Toshiki Ito, Chieko Mihara, Kanae Kawahata, Motoki Okinaka, Youji Kawasaki
  • Publication number: 20200123343
    Abstract: The present invention provides a photo-curable composition, and UV imprint method, that requires a small demolding force, wherein the photo-curable composition contains a polymerizable monomer (A), a polymerization initiator (B), and a fluorine-containing surfactant (C), and the photo-cured product of the photo-curable composition has a water contact angle of 74 degrees or less.
    Type: Application
    Filed: December 18, 2019
    Publication date: April 23, 2020
    Inventors: Toshiki Ito, Chieko Mihara, Kanae Kawahata, Motoki Okinaka, Youji Kawasaki
  • Patent number: 10535519
    Abstract: It is intended to provide a photocured product that is prepared using the photo-imprint method and has favorable pattern precision and improvement in pattern defects. The present invention provides a photocured product obtained by irradiating a coating film in contact with a mold with light, the photocured product containing a fluorine atom-containing surfactant, wherein of secondary ion signals obtained by the surface analysis of the photocured product based on time-of-flight secondary ion mass spectrometry, the intensity of a C2H5O+ ion signal is higher than that of a C3H7O+ ion signal.
    Type: Grant
    Filed: June 9, 2017
    Date of Patent: January 14, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Yohei Murayama, Toshiki Ito, Chieko Mihara, Motoki Okinaka
  • Patent number: 10472445
    Abstract: A photocurable composition which decreases a mold releasing force is provided. The photocurable composition is a photocurable composition which is cured using light while being in contact with a mold having a surface in which a concavo-convex pattern is formed so as to manufacture a film having a concavo-convex pattern and which includes a polymerizable compound, a photopolymerization initiator, and a photosensitive gas generating agent having a photostimulation responsive portion. The photosensitive gas generating agent has a repeating structure containing at least one alkylene oxide chain and generates a gas from the photostimulation responsive portion by light irradiation.
    Type: Grant
    Filed: September 20, 2013
    Date of Patent: November 12, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Toshiki Ito, Chieko Mihara, Naoko Matsufuji, Kenji Kitagawa
  • Patent number: 10233274
    Abstract: A curable composition contains a polymerizable compound and a polymerization initiator. The polymerization initiator initiates polymerization to cure the polymerizable compound. The curable composition further contains compounds having the following general formulae (1) and (2): wherein X1 is selected from a hydroxy group, a carboxy group, a sulfo group, an amino group, and an alkoxy group, l1 denotes an integer in the range of 0 to 7, m1 denotes an integer in the range of 1 to 5, and n1 denotes an integer in the range of 1 to 16, and X2 is selected from a hydroxy group, a carboxy group, a sulfo group, an amino group, and an alkoxy group, l2 denotes an integer in the range of 0 to 7, m2 denotes an integer in the range of 1 to 5, and n2 denotes an integer in the range of 1 to 16.
    Type: Grant
    Filed: May 21, 2013
    Date of Patent: March 19, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Chieko Mihara, Toshiki Ito, Motoki Okinaka
  • Patent number: 9982102
    Abstract: Provided are a photocurable composition having high filling property and capable of reducing a mold release force upon production of a film through the utilization of a photo-imprint method, and a method of manufacturing a film using the photocurable composition. The photocurable composition is a photocurable composition, including at least the following component (A) to component (C): (A) a polymerizable compound; (B) a photopolymerization initiator; and (C) a surfactant represented by the following general formula (1): Rf1-Rc-X.
    Type: Grant
    Filed: September 11, 2013
    Date of Patent: May 29, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Toshiki Ito, Chieko Mihara, Youji Kawasaki
  • Patent number: 9961776
    Abstract: The present invention provides a photo-curable composition that requires a small mold-releasing force in a method of producing a cured product and also provides a method of producing a cured product with a small mold-releasing force. The method of producing a cured product includes applying a photo-curable composition onto a base material; pressing a mold to the photo-curable composition to form a pattern in the photo-curable composition; irradiating the photo-curable composition provided with the pattern with first light to generate a cured product having the pattern; and releasing the mold from the cured product, wherein a gas-generating region is formed from a gas-generating agent between the cured product and the mold; the gas-generating region is irradiated with second light to generate a gas in the gas-generating region; and the mold is released from the cured product after the generation of the gas or simultaneously with the generation of the gas.
    Type: Grant
    Filed: December 12, 2012
    Date of Patent: May 1, 2018
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuya Suzuki, Toshiki Ito, Chieko Mihara
  • Publication number: 20170278704
    Abstract: It is intended to provide a photocured product that is prepared using the photo-imprint method and has favorable pattern precision and improvement in pattern defects. The present invention provides a photocured product obtained by irradiating a coating film in contact with a mold with light, the photocured product containing a fluorine atom-containing surfactant, wherein of secondary ion signals obtained by the surface analysis of the photocured product based on time-of-flight secondary ion mass spectrometry, the intensity of a C2H5O30 ion signal is higher than that of a C3H7O+ ion signal.
    Type: Application
    Filed: June 9, 2017
    Publication date: September 28, 2017
    Inventors: Yohei Murayama, Toshiki Ito, Chieko Mihara, Motoki Okinaka
  • Patent number: 9704710
    Abstract: It is intended to provide a photocured product that is prepared using the photo-imprint method and has favorable pattern precision and improvement in pattern defects. The present invention provides a photocured product obtained by irradiating a coating film in contact with a mold with light, the photocured product containing a fluorine atom-containing surfactant, wherein of secondary ion signals obtained by the surface analysis of the photocured product based on time-of-flight secondary ion mass spectrometry, the intensity of a C2H5O+ ion signal is higher than that of a C3H7O+ ion signal.
    Type: Grant
    Filed: January 31, 2013
    Date of Patent: July 11, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Yohei Murayama, Toshiki Ito, Chieko Mihara, Motoki Okinaka
  • Publication number: 20150252131
    Abstract: A photocurable composition which decreases a mold releasing force is provided. The photocurable composition is a photocurable composition which is cured using light while being in contact with a mold having a surface in which a concavo-convex pattern is formed so as to manufacture a film having a concavo-convex pattern and which includes a polymerizable compound, a photopolymerization initiator, and a photosensitive gas generating agent having a photostimulation responsive portion. The photosensitive gas generating agent has a repeating structure containing at least one alkylene oxide chain and generates a gas from the photostimulation responsive portion by light irradiation.
    Type: Application
    Filed: September 20, 2013
    Publication date: September 10, 2015
    Inventors: Toshiki Ito, Chieko Mihara, Naoko Matsufuji, Kenji Kitagawa
  • Publication number: 20150183942
    Abstract: Provided are a photocurable composition having high filling property and capable of reducing a mold release force upon production of a film through the utilization of a photo-imprint method, and a method of manufacturing a film using the photocurable composition.
    Type: Application
    Filed: September 11, 2013
    Publication date: July 2, 2015
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Toshiki Ito, Chieko Mihara, Youji Kawasaki
  • Publication number: 20150152208
    Abstract: A curable composition contains a polymerizable compound and a polymerization initiator. The polymerization initiator initiates polymerization to cure the polymerizable compound. The curable composition further contains compounds having the following general formulae (1) and (2): wherein X1 is selected from a hydroxy group, a carboxy group, a sulfo group, an amino group, and an alkoxy group, l1 denotes an integer in the range of 0 to 7, m1 denotes an integer in the range of 1 to 5, and n1 denotes an integer in the range of 1 to 16, and X2 is selected from a hydroxy group, a carboxy group, a sulfo group, an amino group, and an alkoxy group, 12 denotes an integer in the range of 0 to 7, m2 denotes an integer in the range of 1 to 5, and n2 denotes an integer in the range of 1 to 16.
    Type: Application
    Filed: May 21, 2013
    Publication date: June 4, 2015
    Inventors: Chieko Mihara, Toshiki Ito, Motoki Okinaka
  • Publication number: 20150086755
    Abstract: To provide a photocured product having small mold releasing force. A photocured product obtained by curing with light and containing a surface active agent, wherein a peak area of the ether bond derived peak is 3.0 times or more as large as a peak area of the ester bond derived peak, wherein the peak areas are obtained by peak separation processing by curve fitting of an X-ray photoelectron spectroscopy spectrum obtained as an analytical result on a chemical state of carbon at topmost surface of the photocured product, the analytical result being among analytical results on the topmost surface of the photocured product obtained by surface analysis of the photocured product with angle resolved X-ray photoelectron spectroscopy.
    Type: Application
    Filed: May 21, 2013
    Publication date: March 26, 2015
    Inventors: Chieko Mihara, Toshiki Ito, Yohei Murayama, Motoki Okinaka
  • Publication number: 20150004790
    Abstract: It is intended to provide a photocured product that is prepared using the photo-imprint method and has favorable pattern precision and improvement in pattern defects. The present invention provides a photocured product obtained by irradiating a coating film in contact with a mold with light, the photocured product containing a fluorine atom-containing surfactant, wherein of secondary ion signals obtained by the surface analysis of the photocured product based on time-of-flight secondary ion mass spectrometry, the intensity of a C2H5O+ ion signal is higher than that of a C3H7O+ ion signal.
    Type: Application
    Filed: January 31, 2013
    Publication date: January 1, 2015
    Inventors: Yohei Murayama, Toshiki Ito, Chieko Mihara, Motoki Okinaka
  • Publication number: 20140363584
    Abstract: The present invention provides a photo-curable composition that requires a small mold-releasing force in a method of producing a cured product and also provides a method of producing a cured product with a small mold-releasing force. The method of producing a cured product includes applying a photo-curable composition onto a base material; pressing a mold to the photo-curable composition to form a pattern in the photo-curable composition; irradiating the photo-curable composition provided with the pattern with first light to generate a cured product having the pattern; and releasing the mold from the cured product, wherein a gas-generating region is formed from a gas-generating agent between the cured product and the mold; the gas-generating region is irradiated with second light to generate a gas in the gas-generating region; and the mold is released from the cured product after the generation of the gas or simultaneously with the generation of the gas.
    Type: Application
    Filed: December 12, 2012
    Publication date: December 11, 2014
    Inventors: Tatsuya Suzuki, Toshiki Ito, Chieko Mihara
  • Publication number: 20140349086
    Abstract: The present invention provides a photo-curable composition that requires a small demolding force. The present invention also provides a UV imprint method that requires a small demolding force. The photo-curable composition contains a polymerizable monomer (A), a polymerization initiator (B), and a fluorine-containing surfactant (C). A photo-cured product of the photo-curable composition has a water contact angle of 74 degrees or less.
    Type: Application
    Filed: October 24, 2012
    Publication date: November 27, 2014
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Toshiki Ito, Chieko Mihara, Kanae Kawahata, Motoki Okinaka
  • Patent number: 8178271
    Abstract: A polymer is provided in which a sulfonic group or a derivative thereof is introduced. The polymer includes a unit represented by the following chemical formula (1): wherein R represents -A1-SO2R1; A1 is selected from an alkylene group, a heterocyclic ring, an aromatic ring; and —SO2R1 is a sulfonic group or of a derivative of a sulfonic acid.
    Type: Grant
    Filed: May 20, 2010
    Date of Patent: May 15, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuki Fukui, Takashi Kenmoku, Ako Kusakari, Chieko Mihara, Tetsuya Yano, Norikazu Fujimoto
  • Patent number: 8067136
    Abstract: To provide: a charge control agent having negative chargeability, which contributes to environmental conservation and the like to an increased degree, has high performance (high charge amount, quick rise-up of charge, excellent stability with time, and high environmental stability), and has improved dispersibility; a toner for developing an electrostatic charge image containing the charge control agent; and an image forming method and an image forming apparatus each using the toner for developing an electrostatic charge image. A charge control agent for controlling a charged state of powder, characterized by including one or more units each represented by the following chemical formula (1) in a molecule.
    Type: Grant
    Filed: June 9, 2005
    Date of Patent: November 29, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tetsuya Yano, Takashi Kenmoku, Tatsuki Fukui, Ako Kusakari, Chieko Mihara
  • Publication number: 20100233610
    Abstract: A polymer is provided in which a sulfonic group or a derivative thereof is introduced. The polymer includes a unit represented by the following chemical formula (1): wherein R represents -A1-SO2R1; A1 is selected from an alkylene group, a heterocyclic ring, an aromatic ring; and —SO2R1 is a sulfonic group or of a derivative of a sulfonic acid.
    Type: Application
    Filed: May 20, 2010
    Publication date: September 16, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Tatsuki Fukui, Takashi Kenmoku, Ako Kusakari, Chieko Mihara, Tetsuya Yano, Norikazu Fujimoto