Patents by Inventor Chien-Chang Chen

Chien-Chang Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11969727
    Abstract: Present invention is related to a tumor microenvironment on chip or a biochip for cell therapy having a carrier, a first cell or tissue culture area and a second cell or tissue area imbedded within the carrier. The present invention provides a biochip successfully cooperating micro fluidic technology and cell culture achieving the goal for detecting or testing the function of cell therapy for cancer or tumor.
    Type: Grant
    Filed: October 22, 2021
    Date of Patent: April 30, 2024
    Assignees: China Medical University, China Medical University Hospital
    Inventors: Yi-Wen Chen, Ming-You Shie, Der-Yang Cho, Shao-Chih Chiu, Kai-Wen Kan, Chien-Chang Chen
  • Publication number: 20240134268
    Abstract: A mask for use in a semiconductor lithography process includes a substrate, a mask pattern disposed on the substrate, and a light absorbing border surrounding the mask pattern. The light absorbing border is inset from at least two edges of the substrate to define a peripheral region outside of the light absorbing border. In some designs, a first peripheral region extends from an outer perimeter of the light absorbing border to a first edge of the substrate, and a second peripheral region that extends from the outer perimeter of the light absorbing border to a second edge of the substrate, where the first edge of the substrate and the second edge of the substrate are on opposite sides of the mask pattern.
    Type: Application
    Filed: January 3, 2024
    Publication date: April 25, 2024
    Inventors: Chien-Cheng Chen, Huan-Ling Lee, Ta-Cheng Lien, Chia-Jen Chen, Hsin-Chang Lee
  • Patent number: 11967594
    Abstract: A semiconductor device structure, along with methods of forming such, are described. The structure includes a stack of semiconductor layers spaced apart from and aligned with each other, a first source/drain epitaxial feature in contact with a first one or more semiconductor layers of the stack of semiconductor layers, and a second source/drain epitaxial feature disposed over the first source/drain epitaxial feature. The second source/drain epitaxial feature is in contact with a second one or more semiconductor layers of the stack of semiconductor layers. The structure further includes a first dielectric material disposed between the first source/drain epitaxial feature and the second source/drain epitaxial feature and a first liner disposed between the first source/drain epitaxial feature and the second source/drain epitaxial feature. The first liner is in contact with the first source/drain epitaxial feature and the first dielectric material.
    Type: Grant
    Filed: August 10, 2022
    Date of Patent: April 23, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Shih-Cheng Chen, Zhi-Chang Lin, Jung-Hung Chang, Lo Heng Chang, Chien Ning Yao, Kuo-Cheng Chiang, Chih-Hao Wang
  • Publication number: 20240113187
    Abstract: The present disclosure relates to an integrated chip. The integrated chip includes a substrate having one or more interior surfaces forming a recess within an upper surface of the substrate. Source/drain regions are disposed within the substrate on opposing sides of the recess. A first gate dielectric is arranged along the one or more interior surfaces forming the recess, and a second gate dielectric is arranged on the first gate dielectric and within the recess. A gate electrode is disposed on the second gate dielectric. The second gate dielectric includes one or more protrusions that extend outward from a recessed upper surface of the second gate dielectric and that are arranged along opposing sides of the second gate dielectric.
    Type: Application
    Filed: January 5, 2023
    Publication date: April 4, 2024
    Inventors: Jhu-Min Song, Ying-Chou Chen, Yi-Kai Ciou, Chien-Chih Chou, Fei-Yun Chen, Yu-Chang Jong, Chi-Te Lin
  • Publication number: 20240101784
    Abstract: A novel additive for recycling thermoset materials, its related recyclable thermoset composition and its application are disclosed. Specifically, the composition of the additive comprises at least one copolymer that has at least one carbamate group, at least one carbonate group and/or at least one urea group, and a number-average molecular weight of the copolymer is between 100 and 50,000 Da.
    Type: Application
    Filed: September 5, 2023
    Publication date: March 28, 2024
    Inventors: Chien-Hsin Wu, Ying-Chi Huang, Ying-Feng Lin, Wen-Chang Chen, Ho-Ching Huang, Ru-Jong Jeng
  • Patent number: 11940828
    Abstract: A voltage tracking circuit is provided. The voltage tracking circuit includes first and second P-type transistors and a control circuit. The drain of the first P-type transistor is coupled to a first voltage terminal. The gate and the drain of the second P-type transistor are respectively coupled to the first voltage terminal and a second voltage terminal. The control circuit is coupled to the first and second voltage terminals and generates a control voltage according to the first voltage and the second voltage. The sources of the first and second P-type transistors are coupled to an output terminal of the voltage tracking circuit, and the output voltage is generated at the output terminal. In response to the second voltage being higher than the first voltage, the control circuit generates the control signal to turn off the first P-type transistor.
    Type: Grant
    Filed: August 17, 2022
    Date of Patent: March 26, 2024
    Assignee: VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION
    Inventors: Shao-Chang Huang, Yeh-Ning Jou, Ching-Ho Li, Kai-Chieh Hsu, Chun-Chih Chen, Chien-Wei Wang, Gong-Kai Lin, Li-Fan Chen
  • Publication number: 20240097039
    Abstract: The present disclosure describes a semiconductor device having a crystalline high-k dielectric layer. The semiconductor structure includes a fin structure on a substrate, a gate dielectric layer on the fin structure, and a gate structure on the gate dielectric layer. A top portion of the gate dielectric layer is crystalline and includes a crystalline high-k dielectric material.
    Type: Application
    Filed: March 22, 2023
    Publication date: March 21, 2024
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventor: Chien-Chang CHEN
  • Patent number: 11929287
    Abstract: The present disclosure describes a semiconductor structure with a dielectric liner. The semiconductor structure includes a substrate and a fin structure on the substrate. The fin structure includes a stacked fin structure, a fin bottom portion below the stacked fin structure, and an isolation layer between the stacked fin structure and the bottom fin portion. The semiconductor structure further includes a dielectric liner in contact with an end of the stacked fin structure and a spacer structure in contact with the dielectric liner.
    Type: Grant
    Filed: April 23, 2021
    Date of Patent: March 12, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Zhi-Chang Lin, Shih-Cheng Chen, Kuo-Cheng Chiang, Kuan-Ting Pan, Jung-Hung Chang, Lo-Heng Chang, Chien Ning Yao
  • Publication number: 20240077804
    Abstract: A method includes forming a test pattern and a reference pattern in an absorption layer of a photomask structure. The test pattern has a first trench and a second trench, the reference pattern has a third trench and a fourth trench, the test pattern and the reference pattern have substantially the same dimension in a top view, and the second trench is deeper than the first trench, the third trench, and the fourth trench. The method further includes emitting a light beam to the test pattern to obtain a first interference pattern reflected from the test pattern, emitting the light beam to the reference pattern to obtain a second interference pattern reflected from the reference pattern; and comparing the first interference pattern with the second interference pattern to obtain a measured complex refractive index of the absorption layer.
    Type: Application
    Filed: September 1, 2022
    Publication date: March 7, 2024
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ping-Hsun LIN, Chien-Cheng CHEN, Shih Ju HUANG, Pei-Cheng HSU, Ta-Cheng LIEN, Hsin-Chang LEE
  • Publication number: 20240071888
    Abstract: A package structure including a redistribution circuit structure, a wiring substrate, first conductive terminals, an insulating encapsulation, and a semiconductor device is provided. The redistribution circuit structure includes stacked dielectric layers, redistribution wirings and first conductive pads. The first conductive pads are disposed on a surface of an outermost dielectric layer among the stacked dielectric layers, the first conductive pads are electrically connected to outermost redistribution pads among the redistribution wirings by via openings of the outermost dielectric layer, and a first lateral dimension of the via openings is greater than a half of a second lateral dimension of the outermost redistribution pads. The wiring substrate includes second conductive pads. The first conductive terminals are disposed between the first conductive pads and the second conductive pads. The insulating encapsulation is disposed on the surface of the redistribution circuit structure.
    Type: Application
    Filed: August 28, 2022
    Publication date: February 29, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chien-Chang Lin, Yen-Fu Su, Chin-Liang Chen, Wei-Yu Chen, Hsin-Yu Pan, Yu-Min Liang, Hao-Cheng Hou, Chi-Yang Yu
  • Publication number: 20240069431
    Abstract: In a method of manufacturing an attenuated phase shift mask, a photo resist pattern is formed over a mask blank. The mask blank includes a transparent substrate, an etch stop layer on the transparent substrate, a phase shift material layer on the etch stop layer, a hard mask layer on the phase shift material layer and an intermediate layer on the hard mask layer. The intermediate layer is patterned by using the photo resist pattern as an etching mask, the hard mask layer is patterned by using the patterned intermediate layer as an etching mask, and the phase shift material layer is patterned by using the patterned hard mask layer as an etching mask. The intermediate layer includes at least one of a transition metal, a transition metal alloy, or a silicon containing material, and the hard mask layer is made of a different material than the intermediate layer.
    Type: Application
    Filed: February 16, 2023
    Publication date: February 29, 2024
    Inventors: Wei-Che HSIEH, Chien-Cheng Chen, Ping-Hsun Lin, Ta-Cheng Lien, Hsin-Chang Lee
  • Patent number: 11916122
    Abstract: A method for forming a gate all around transistor includes forming a plurality of semiconductor nanosheets. The method includes forming a cladding inner spacer between a source region of the transistor and a gate region of the transistor. The method includes forming sheet inner spacers between the semiconductor nanosheets in a separate deposition process from the cladding inner spacer.
    Type: Grant
    Filed: July 8, 2021
    Date of Patent: February 27, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Zhi-Chang Lin, Kuan-Ting Pan, Shih-Cheng Chen, Jung-Hung Chang, Lo-Heng Chang, Chien-Ning Yao, Kuo-Cheng Chiang
  • Patent number: 11914941
    Abstract: Systems, methods, and devices are described herein for integrated circuit (IC) layout validation. A plurality of IC patterns are collected which include a first set of patterns capable of being manufactured and a second set of patterns incapable of being manufactured. A machine learning model is trained using the plurality of IC patterns. The machine learning model generates a prediction model for validating IC layouts. The prediction model receives data including a set of test patterns comprising scanning electron microscope (SEM) images of IC patterns. Design violations associated with an IC layout are determined based on the SEM images and the plurality of IC patterns. A summary of the design violations is provided for further characterization of the IC layout.
    Type: Grant
    Filed: April 19, 2021
    Date of Patent: February 27, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Rachid Salik, Chin-Chang Hsu, Cheng-Chi Wu, Chien-Wen Chen, Wen-Ju Yang
  • Publication number: 20240031635
    Abstract: An audio-visual managing system, applied to at least one data receiving circuit which receives audio-visual data and outputs processed audio-visual data, each of the data receiving circuit comprising a tuner or a demodulator, the audio-visual managing system comprising: a plurality of transmitting circuits, configured to stream the processed audio-visual data; wherein the processed audio-visual data output by a first data receiving circuit of the data receiving circuit can be used by a first transmitting circuit and a second transmitting circuit of the transmitting circuits simultaneously, when the first transmitting circuit and the second transmitting circuit receive the processed audio-visual data output by the first data receiving circuit.
    Type: Application
    Filed: July 24, 2023
    Publication date: January 25, 2024
    Applicant: Realtek Semiconductor Corp.
    Inventor: Chien-Chang Chen
  • Publication number: 20230402796
    Abstract: A USB device includes a base, a circuit board disposed on the base and having front-end and rear-end portions and a ground circuitry, an upper cover, solder points, a switch and a button mount. The rear-end portion is used for inserting into a connection port of a computer terminal. The upper cover covers the front-end portion and has an opening. The solder points are formed on the front-end portion and coupled to the ground circuitry. The switch having a metal cover is soldered to the solder points for controlling wireless connection between the computer terminal and an external device. The button mount is movably disposed through the opening and sleeves the front-end portion for triggering the switch. An electrostatic discharge entering from the opening can pass through a first guide hole of the button mount and is conducted to the ground circuitry via the metal cover and the solder point.
    Type: Application
    Filed: May 15, 2023
    Publication date: December 14, 2023
    Applicant: DARFON ELECTRONICS CORP.
    Inventors: Cheng-Min Su, Chien-Chang Chen
  • Publication number: 20230292009
    Abstract: A display device includes a display module and a camera module. The camera module includes a first housing, a second housing and a camera unit. The first housing is movably disposed on the display module. The second housing is separably connected to the first housing. The camera unit is disposed on the second housing. The second housing is able to move with the first housing in relative to the display module, such that the camera unit is exposed from the display module or hidden in the display module. When the second housing is separated from the first housing, the second housing is able to rotate in relative to the first housing, so as to adjust an orientation of the camera unit.
    Type: Application
    Filed: June 15, 2022
    Publication date: September 14, 2023
    Applicants: Inventec (Pudong) Technology Corp., Inventec Corporation
    Inventors: Chien-Chang Chen, Chin-Yi Lin, Chia-Chen Chen, Chi-Zen Peng
  • Publication number: 20230074515
    Abstract: An electrical device includes a base, a display screen, and a driving structure. The base having an upper shell and a lower shell, in which the upper shell is movably connected to the lower shell. The display screen is pivoted to and rotatably with respect to the base. The driving structure is connected to the display screen and partially disposed between the upper shell and the lower shell. The driving structure is configured for driving the upper shell to cover the lower shell to form a close state or separate from the lower shell to form an open state, so as to enable the base to switch between the close state and the open state.
    Type: Application
    Filed: September 15, 2021
    Publication date: March 9, 2023
    Inventors: Chun Hao WANG, Chien Chang CHEN, Chia-Chen CHEN, Chi-Zen PENG
  • Publication number: 20230008649
    Abstract: Present invention is related to a tumor microenvironment on chip or a biochip for cell therapy having a carrier, a first cell or tissue culture area and a second cell or tissue area imbedded within the carrier. The present invention provides a biochip successfully cooperating micro fluidic technology and cell culture achieving the goal for detecting or testing the function of cell therapy for cancer or tumor.
    Type: Application
    Filed: October 22, 2021
    Publication date: January 12, 2023
    Inventors: Yi-Wen Chen, Ming-You Shie, Der-Yang Cho, Shao-Chih Chiu, Kai-Wen Kan, Chien-Chang Chen
  • Publication number: 20230011168
    Abstract: The present invention is related to a biochip and production method thereof. The biochip comprises a carrier, a cell or tissue culture area deposited on the carrier, and a sensor area deposited on the carrier adjacent and fluidly communicating with the cell or tissue culture area. A containing space is contained in the cell or tissue culture area comprising a simulated vascular channel, a cell or a tissue and a culture medium. At least one sensor fixation area is contained at the sensor area for placing a sensor element. The present invention can be a model for stimulating cancer of specific patient to realtimely reflecting the cancer formation, transferring status and treatment strategies. The biochip could also carry testing drugs to observe how the drugs functioning to the cells/tissue as to provide a more accurate instruction of the drugs. The present invention can perform multiple test just within on chip which can save cost and also provide a more accurate test model for the patient.
    Type: Application
    Filed: October 22, 2021
    Publication date: January 12, 2023
    Inventors: Yi-Wen Chen, Ming-You Shie, Chien-Chang Chen
  • Patent number: 11417953
    Abstract: A compact electronic device for wireless communication is disclosed. The compact electronic device includes a main printed circuit board, one or more antennas, at least one conductor, and a shell. The one or more antennas are configured for wireless communication. The at least one conductor being configured to provide at least one of control signals and power to a fan. The shell mounts the fan relative to the main printed circuit board. The shell includes walls forming a cavity. The walls encapsulate the conductor in the cavity.
    Type: Grant
    Filed: November 14, 2019
    Date of Patent: August 16, 2022
    Assignee: Plume Design, Inc.
    Inventors: Miroslav Samardzija, Chien Chang Chen, Ming-Tsung Su, Brian Nam, Liem Hieu Dinh Vo, William McFarland