Patents by Inventor Chien-Chia Tseng

Chien-Chia Tseng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9966494
    Abstract: A method for manufacturing a polycrystalline silicon ingot includes steps of: a) melting a silicon material in a container disposed in a thermal field to form a molten silicon; b) controlling the thermal field to provide heat to the molten silicon from above the container and to solidify a portion of the molten silicon contacting a base part and at least a portion of a wall part proximate to the base part of the container to form a solid silicon crystalline isolation layer; and c) controlling the thermal field to continuously provide heat to the rest of the molten silicon from above the container and to solidify the rest of the molten silicon gradually from a bottom to a top of the rest of the molten silicon to form a polycrystalline silicon ingot.
    Type: Grant
    Filed: August 5, 2015
    Date of Patent: May 8, 2018
    Assignee: AUO CRYSTAL CORPORATION
    Inventors: Kuo-Chen Ho, Ya-Lu Tsai, Chien-Chia Tseng, Chia-Ying Yang
  • Patent number: 9911893
    Abstract: A method for manufacturing a polycrystalline silicon ingot includes steps of: a) melting a silicon material in a container disposed in a thermal field to form a molten silicon; b) controlling the thermal field to provide heat to the molten silicon from above the container and to solidify a portion of the molten silicon contacting a base part and at least a portion of a wall part proximate to the base part of the container to form a solid silicon crystalline isolation layer; and c) controlling the thermal field to continuously provide heat to the rest of the molten silicon from above the container and to solidify the rest of the molten silicon gradually from a bottom to a top of the rest of the molten silicon to form a polycrystalline silicon ingot.
    Type: Grant
    Filed: August 5, 2015
    Date of Patent: March 6, 2018
    Assignee: AUO CRYSTAL CORPORATION
    Inventors: Kuo-Chen Ho, Ya-Lu Tsai, Chien-Chia Tseng, Chia-Ying Yang
  • Publication number: 20160043266
    Abstract: A method for manufacturing a polycrystalline silicon ingot includes steps of: a) melting a silicon material in a container disposed in a thermal field to form a molten silicon; b) controlling the thermal field to provide heat to the molten silicon from above the container and to solidify a portion of the molten silicon contacting a base part and at least a portion of a wall part proximate to the base part of the container to form a solid silicon crystalline isolation layer; and c) controlling the thermal field to continuously provide heat to the rest of the molten silicon from above the container and to solidify the rest of the molten silicon gradually from a bottom to a top of the rest of the molten silicon to form a polycrystalline silicon ingot.
    Type: Application
    Filed: August 5, 2015
    Publication date: February 11, 2016
    Inventors: Kuo-Chen Ho, Ya-Lu TSAI, Chien-Chia TSENG, Chia-Ying YANG
  • Patent number: 8951699
    Abstract: An adjustable photo-mask for providing variable properties includes a casing and a plate. The casing has a receiving room inside and a plurality of openings, with the openings extending from the receiving room to a front face of the casing. The plate has a plurality of through holes, with an axial direction of the through holes defined as a ray-transmission direction, with the plate slideably received in the receiving room, and with the through holes and the openings totally or partially overlapping in the ray-transmission direction.
    Type: Grant
    Filed: March 6, 2013
    Date of Patent: February 10, 2015
    Assignee: National Kaohsiung University of Applied Science
    Inventors: Chia-Chin Chiang, Chien-Chia Tseng
  • Publication number: 20140205935
    Abstract: An adjustable photo-mask for providing variable properties is proposed. The adjustable photo-mask includes a casing and a plate. The casing has a receiving room inside and a plurality of openings, with the openings extending from the receiving room to a front face of the casing. The plate has a plurality of through holes, with an axial direction of the through holes being defined as a ray-transmission direction, with the plate being slide-ably received in the receiving room, and with the through holes and the openings totally or partially overlapping in the ray-transmission direction.
    Type: Application
    Filed: March 6, 2013
    Publication date: July 24, 2014
    Applicant: National Kaohsiung University of Applied Sciences
    Inventors: Chia-Chin Chiang, Chien-Chia Tseng