Patents by Inventor Chien-Chiang Chen

Chien-Chiang Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240168324
    Abstract: A decoration panel includes a first substrate, a first transparent conductive element, a transparent structure, a second substrate, a second transparent conductive element, and a first cholesteric liquid crystal layer. The first transparent conductive element is disposed on the first substrate. The transparent structure is disposed on the first substrate. The second substrate is disposed opposite to the first substrate. The second transparent conductive element is disposed on the second substrate. The first cholesteric liquid crystal layer is disposed between the first transparent conductive element and the second transparent conductive element. A display apparatus is adapted to render a decoration pattern, and the decoration pattern corresponds to the transparent structure. Moreover, a display apparatus including the decoration panel is also provided.
    Type: Application
    Filed: November 20, 2023
    Publication date: May 23, 2024
    Applicant: AUO Corporation
    Inventors: Chien-Chuan Chen, Wei-Jen Su, Hsin Chiang Chiang, Chun-Han Lee, Peng-Yu Chen, Ko-Ruey Jen, Yung-Chih Chen
  • Publication number: 20240162349
    Abstract: A device includes a semiconductor fin, and a gate stack on sidewalls and a top surface of the semiconductor fin. The gate stack includes a high-k dielectric layer, a work-function layer overlapping a bottom portion of the high-k dielectric layer, and a blocking layer overlapping a second bottom portion of the work-function layer. A low-resistance metal layer overlaps and contacts the work-function layer and the blocking layer. The low-resistance metal layer has a resistivity value lower than second resistivity values of both of the work-function layer and the blocking layer. A gate spacer contacts a sidewall of the gate stack.
    Type: Application
    Filed: January 24, 2024
    Publication date: May 16, 2024
    Inventors: Chung-Chiang Wu, Po-Cheng Chen, Kuo-Chan Huang, Hung-Chin Chung, Hsien-Ming Lee, Chien-Hao Chen
  • Patent number: 11978526
    Abstract: A data processing circuit and a fault mitigating method are provided. The method is adapted for a memory having at least one fault bit. The memory provides a block for data storage. A difference between an output of a value of a plurality of bits input to at least one computing layer in a neural network and a correct value is determined. The bits are respectively considered the at least one fault bit. A repair condition is determined based on the difference. The repair condition includes a correspondence between a position where the fault bit is located in the block and at least one non-fault bit in the memory. A value of at least one non-fault bit of the memory replaces a value of the fault bit based on the repair condition.
    Type: Grant
    Filed: March 28, 2022
    Date of Patent: May 7, 2024
    Assignee: Skymizer Taiwan Inc.
    Inventors: Shu-Ming Liu, Kai-Chiang Wu, Chien-Fa Chen, Wen Li Tang
  • Publication number: 20240134239
    Abstract: A display device including a substrate, a cholesteric liquid crystal layer, and a transparent electrode layer that are sequentially stacked is provided. The cholesteric liquid crystal layer includes cholesteric liquid crystal molecules and a plurality of transparent photoresist structures. Each of the transparent photoresist structures is a closed structure, and the cholesteric liquid crystal molecules are respectively accommodated in a plurality of patterned areas respectively surrounded by the transparent photoresist structures, so as to form a plurality of cholesteric liquid crystal patterns. The transparent electrode layer includes a plurality of sub-electrodes. The cholesteric liquid crystal patterns are respectively driven by the sub-electrodes. An orthogonal projection of each of the transparent photoresist structures on the substrate falls in an orthogonal projection of a corresponding sub-electrode of the sub-electrodes on the substrate.
    Type: Application
    Filed: October 22, 2023
    Publication date: April 25, 2024
    Applicant: AUO Corporation
    Inventors: Chun-Han Lee, Chien-Chuan Chen, Ju-Wen Chang, Hsin Chiang Chiang, Peng-Yu Chen
  • Patent number: 11916146
    Abstract: A device includes a semiconductor fin, and a gate stack on sidewalls and a top surface of the semiconductor fin. The gate stack includes a high-k dielectric layer, a work-function layer overlapping a bottom portion of the high-k dielectric layer, and a blocking layer overlapping a second bottom portion of the work-function layer. A low-resistance metal layer overlaps and contacts the work-function layer and the blocking layer. The low-resistance metal layer has a resistivity value lower than second resistivity values of both of the work-function layer and the blocking layer. A gate spacer contacts a sidewall of the gate stack.
    Type: Grant
    Filed: April 11, 2022
    Date of Patent: February 27, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chung-Chiang Wu, Po-Cheng Chen, Kuo-Chan Huang, Hung-Chin Chung, Hsien-Ming Lee, Chien-Hao Chen
  • Publication number: 20230356140
    Abstract: Provided are apparatus and systems for performing a swing adsorption process. In particular, the method and system involves swing adsorption processes and systems designed to lessen the temperature, pressure and product stream composition fluctuations in the adsorption step of a swing adsorption process, particularly involving preparation of the adsorption bed unit using feed stream cooling in conjunction with splitting the cooled feed stream to the adsorption bed units during adsorption steps while staggering the timing of back-to-back adsorption steps in the swing adsorption process. The process may be utilized for swing adsorption processes, such as rapid cycle TSA and/or rapid cycle PSA, which are utilized to remove one or more contaminants from a gaseous feed stream.
    Type: Application
    Filed: July 30, 2021
    Publication date: November 9, 2023
    Inventors: Joseph Renaldo VELLA, Bennett D. MARSHALL, Chien-Chiang CHEN
  • Patent number: 9457295
    Abstract: Systems and methods for separating mine tailings from water-absorbing polymers and regenerating the separated water-absorbing polymers. The systems and methods include a separation assembly that is configured to receive an augmented mine tailings slurry that includes mine tailings, water, and a swollen water-absorbing polymer. The separation assembly separates the swollen water-absorbing polymer from the augmented mine tailings slurry to produce a dewatered mine tailings slurry. The systems and methods further include a water-absorbing polymer regeneration unit that is configured to receive the swollen water-absorbing polymer. The water-absorbing polymer regeneration unit at least partially releases water from the swollen water-absorbing polymer to produce a regenerated water-absorbing polymer, and as a separate output or product, the released water.
    Type: Grant
    Filed: March 21, 2014
    Date of Patent: October 4, 2016
    Assignee: ExxonMobil Upstream Research Company
    Inventors: Wei Ren, Paul L. Tanaka, Aaron Ortiz Gomez, Babak A. Jajuee, Chien-Chiang Chen, Robert D. Kaminsky
  • Publication number: 20160115391
    Abstract: The disclosure includes techniques for recovering hydrocarbons from a bituminous feed in a non-aqueous extraction process, comprising a vessel that comprises a feed inlet on a proximate end of the vessel, a feed outlet on a distal end of the vessel, a bitumen outlet, and a plurality of hoppers, wherein each hopper comprises a tailing outlet.
    Type: Application
    Filed: September 30, 2015
    Publication date: April 28, 2016
    Inventors: Andrew P. Steinhauser, Edward J. Grave, Paul D. Oldenburg, Chien-Chiang Chen
  • Publication number: 20140305873
    Abstract: Systems and methods for separating mine tailings from water-absorbing polymers and regenerating the separated water-absorbing polymers. The systems and methods include a separation assembly that is configured to receive an augmented mine tailings slurry that includes mine tailings, water, and a swollen water-absorbing polymer. The separation assembly separates the swollen water-absorbing polymer from the augmented mine tailings slurry to produce a dewatered mine tailings slurry. The systems and methods further include a water-absorbing polymer regeneration unit that is configured to receive the swollen water-absorbing polymer. The water-absorbing polymer regeneration unit at least partially releases water from the swollen water-absorbing polymer to produce a regenerated water-absorbing polymer, and as a separate output or product, the released water.
    Type: Application
    Filed: March 21, 2014
    Publication date: October 16, 2014
    Inventors: Wei Ren, Paul L. Tanaka, Aaron Ortiz Gomez, Babak A. Jajuee, Chien-Chiang Chen, Robert D. Kaminsky