Abstract: Lithographic patterning method for creating features on a surface of a substrate, including the steps of: applying a resist material to the surface; performing resist processing steps, including at least: selectively exposing the resist material layer to a surface treatment step, wherein the resist material in the exposed locations is chemically modified; and developing the resist material layer to selectively remove the resist material locally. The method further comprises detecting, during or after the resist processing steps, a chemical modification of the resist material for monitoring or evaluating the processing steps. The step of detecting is performed by scanning the surface using a scanning probe microscopy device, and wherein the scanning includes contacting the surface with the probe tip in a probing area. The probing area coincides with at least one location of the exposed locations and non-exposed locations, for detecting the chemical modification. The document further describes a system.

Abstract: A flying safety net device has a first post, a second post, a main net, a first main rope, a center rope, a second main rope, a first lateral rope, a second lateral rope, a first main loop, a second main loop, a third main loop, a fourth main loop, a first auxiliary loop, and a second auxiliary loop. The main net has a plurality of upper fringe thread sections, a plurality of lower fringe thread sections, a large number of netting thread sections, a large number of netting loops, and a large number of meshes. The first main rope passes through the upper fringe thread sections of the main net. The second main rope passes through the lower fringe thread sections of the main net. The center rope passes through a middle portion of the main net.