Patents by Inventor Chien-Chuan Yu

Chien-Chuan Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10935969
    Abstract: A virtual metrology system at least includes a process apparatus including a set of process data, the process apparatus producing a workpiece according to the set of process data. A virtual metrology server is configured to gather the set of process data, cluster the set of process data to obtain data clusters, and compare the data clusters with patterns. If the data clusters meet the patterns corresponding to the data clusters, performing a corresponding maintenance, repair, and overhaul step on the process apparatus.
    Type: Grant
    Filed: February 25, 2019
    Date of Patent: March 2, 2021
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Feng-Chi Chung, Ching-Hsing Hsieh, Yi-Chun Lin, Chien-Chuan Yu
  • Publication number: 20190187674
    Abstract: A virtual metrology system at least includes a process apparatus including a set of process data, the process apparatus producing a workpiece according to the set of process data. A virtual metrology server is configured to gather the set of process data, cluster the set of process data to obtain data clusters, and compare the data clusters with patterns. If the data clusters meet the patterns corresponding to the data clusters, performing a corresponding maintenance, repair, and overhaul step on the process apparatus.
    Type: Application
    Filed: February 25, 2019
    Publication date: June 20, 2019
    Applicant: United Microelectronics Corp.
    Inventors: Feng-Chi Chung, Ching-Hsing Hsieh, Yi-Chun Lin, Chien-Chuan Yu
  • Patent number: 10261504
    Abstract: A virtual metrology system and a method therefor are provided herein. In the system, a set of process data is gathered and clustered according to a plurality of predetermined patterns. The clustered set of process data is calculated according to the corresponding pattern, so as to obtain a comparison result. If the obtained result meets a desired output, a corresponding step is performed based on the result. In one case, the corresponding step is a normal sampling step if the clustered set of process data meets the corresponding pattern. If the clustered set of process data does not meet the corresponding pattern, an alarm is generated thereby, and the corresponding equipment may be shut down. In another case, the corresponding step is a maintenance, repair, and overhaul step if the clustered set of process data meets the corresponding pattern.
    Type: Grant
    Filed: September 12, 2014
    Date of Patent: April 16, 2019
    Assignee: United Microelectronics Corp.
    Inventors: Feng-Chi Chung, Ching-Hsing Hsieh, Yi-Chun Lin, Chien-Chuan Yu
  • Publication number: 20160041548
    Abstract: A virtual metrology system and a method therefor are provided herein. In the system, a set of process data is gathered and clustered according to a plurality of predetermined patterns. The clustered set of process data is calculated according to the corresponding pattern, so as to obtain a comparison result. If the obtained result meets a desired output, a corresponding step is performed based on the result. In one case, the corresponding step is a normal sampling step if the clustered set of process data meets the corresponding pattern. If the clustered set of process data does not meet the corresponding pattern, an alarm is generated thereby, and the corresponding equipment may be shut down. In another case, the corresponding step is a maintenance, repair, and overhaul step if the clustered set of process data meets the corresponding pattern.
    Type: Application
    Filed: September 12, 2014
    Publication date: February 11, 2016
    Inventors: Feng-Chi Chung, Ching-Hsing Hsieh, Yi-Chun Lin, Chien-Chuan Yu