Abstract: A multiphoton absorption lithography processing system configured to process a to-be-processed object is provided. The multiphoton absorption lithography processing system includes a femtosecond laser source, a spatial light modulator, a lens array, and a stage. The femtosecond laser source is configured to emit a femtosecond laser beam. The spatial light modulator is configured to modulate the femtosecond laser beam into a modulated beam. The lens array is disposed on a path of the modulated beam and configured to divide the modulated beam into a plurality of sub-beams and make the sub-beams be focused on a plurality of position points at the to-be-processed object, so as to form multiphoton absorption reaction at the position points. The stage is configured to carry the to-be-processed object. The stage and the lens array are adapted to move with respect to each other in three dimensions.

Abstract: In a laser interference lithography apparatus, a laser source provides a first laser beam, and an optics assembly is optically coupled to the laser source and receives and processes the first laser beam into one or multiple second laser beams. An exposure stage carries a to-be-exposed object. The fiber assembly receives and processes the second laser beam(s) into one or multiple single mode and stable coherent third laser beams without spatial noise. An interference pattern is generated on the to-be-exposed object using the third laser beam(s). The apparatus is configured without a pin hole spatial filter and a beam expander being disposed on an optical path from an output end of the laser source to the exposure stage.

Abstract: In a laser interference lithography apparatus, a laser source provides a first laser beam, and an optics assembly is optically coupled to the laser source and receives and processes the first laser beam into one or multiple second laser beams. An exposure stage carries a to-be-exposed object. The fiber assembly receives and processes the second laser beam(s) into one or multiple single mode and stable coherent third laser beams without spatial noise. An interference pattern is generated on the to-be-exposed object using the third laser beam(s). The apparatus is configured without a pin hole spatial filter and a beam expander being disposed on an optical path from an output end of the laser source to the exposure stage.

Abstract: An apparatus adapted to a microscope includes a body, a revolvable structure, a stage and a driving device. The body has a slot for holding a liquid to form a horizontally level surface of the liquid. The revolvable structure partially accommodated within the slot and pivotally connected to the body is revolvable relative to the body about a horizontal axis and is for supporting a sample, which is immersed in the liquid. The revolvable structure penetrates through the body in a horizontal direction substantially parallel to the horizontal axis and is pivotally engaged to the body through a sealing ring, which makes the liquid be held in the slot and stops the liquid from leaking in the horizontal direction. The stage supports the body. The driving device is disposed on the stage and connected to the revolvable structure to revolve the revolvable structure.

Abstract: A fan structure includes a cap, a fixing shaft, a bearing, an impeller and a protection lid, wherein the cap comprises a bottom portion, a body and an accommodating space. The fixing shaft is disposed within the accommodating space, a first end portion of the fixing shaft couples the bottom portion, and a second end portion of the fixing shaft protrudes to the body. The bearing couples to the fixing shaft, the second end portion of the fixing shaft protrudes to the bearing, and a hub of the impeller couples to the bearing. The second end portion of the fixing shaft protrudes to the hub. The protection lid couples to the second end portion of the fixing shaft to prevent lubricants for lubricating the bearing from splashing. The protection lid provides the impeller with protection to prevent the impeller from being compressed by external force to avoid destruction.

Abstract: A laser interference lithography apparatus capable of stitching small exposed areas into a large exposed area includes a body, a laser beam supplying unit, a reflecting mechanism, an L-shaped fixing mechanism and a substrate stage. The laser beam supplying unit fixed onto the body provides a laser beam. The reflecting mechanism is movably and rotatably mounted on the body. The L-shaped fixing mechanism mounted on the body includes a first mounting seat and a second mounting seat. An upright first reflecting mirror is fixed to the first mounting seat. The second mounting seat connected to the first mounting seat fixes a horizontal mask, and is substantially perpendicular to the first mounting seat. The substrate stage, movably mounted on the body and disposed below the second mounting seat, supports a substrate. Thus, a large-area pattern formed by stitching small-area patterns may be obtained.

Abstract: A method of forming 3D micro structures with high aspect ratios includes the steps of: disposing a mask, which has a plurality of through holes having at least two different sizes, on a substrate to expose the substrate through the through holes; forming a negative photoresist layer on the mask and the substrate; providing a light source to illuminate the negative photoresist layer through the substrate and the through holes of the mask so as to form a plurality of exposed portions and an unexposed portion; and removing the unexposed portion and leaving the exposed portions to form a plurality of pillars each having a bottom portion contacting the substrate and a top portion opposite to the bottom portion. A top area of the top portion is slightly smaller than a bottom area of the bottom portion, and the pillars are allowed to have at least two different heights.

Abstract: A method of manufacturing a hollow micro-needle structure includes the steps of: disposing a first mask layer and a second mask layer respectively aside a first substrate and aside a rear surface of the first substrate, wherein the first substrate is transparent to predetermined light; forming a photoresist layer on the front surface of the first substrate and the first mask layer; providing the predetermined light to illuminate the first substrate in a direction from the rear surface to the front surface so as to expose the photoresist layer to form an exposed portion and an unexposed portion; and removing the unexposed portion to form the micro-needle structure, which is formed by the exposed portion. The micro-needle structure has an inclined sidewall and a through hole surrounded by the inclined sidewall.

Abstract: A laser interference lithography apparatus capable of stitching small exposed areas into a large exposed area includes a body, a laser beam supplying unit, a reflecting mechanism, an L-shaped fixing mechanism and a substrate stage. The laser beam supplying unit fixed onto the body provides a laser beam. The reflecting mechanism is movably and rotatably mounted on the body. The L-shaped fixing mechanism mounted on the body includes a first mounting seat and a second mounting seat. An upright first reflecting mirror is fixed to the first mounting seat. The second mounting seat connected to the first mounting seat fixes a horizontal mask, and is substantially perpendicular to the first mounting seat. The substrate stage, movably mounted on the body and disposed below the second mounting seat, supports a substrate. Thus, a large-area pattern formed by stitching small-area patterns may be obtained.

Abstract: A microscopy system includes an image focusing module, a stage for supporting a sample, image collection unit for collecting sliced images of the sample acquired by the image focusing module, and an image fusion unit for fusing sliced images of the sample acquired from different observation angles. The stage supports the sample and is configured to be revolvable around a rotational axis which is substantially perpendicular to an extending direction from the sample to the image focusing module so that enabling the image focusing module to acquire sliced images of the sample from different observation angles. The image fusion unit is used for remapping the sliced images acquired from different observation angles into a reference coordinate system, converting anisotropic voxels resolution of the sliced images to isotropic resolution, and fusing the sliced images into a final image.

Abstract: The invention provides an optical scanning apparatus for appliances for recording or reproducing information using an optical recording medium, said scanning apparatus automatically matching itself to the curvature of a curved recording medium or of a recording medium with axial runout without there being different wire diameters for the resilient support of the lens holder (LH) or other additional damping means or an additional control loop for this purpose. This object is achieved by virtue of an arrangement comprising coils and magnets being provided which has an asymmetrical magnetic field distribution which is provided for matching the orientation of a lens (L) in the optical scanning device to a curved recording medium or to any axial runout in the recording medium.

Abstract: A sample carrying apparatus capable of revolving a sample includes a body and a revolvable structure. The body has a slot. The revolvable structure partially accommodated within the slot is pivotally connected to the body and is revolvable relative to the body.

Abstract: A manufacturing method of a self separation layer includes the steps of: forming a plurality of convex portions on a substrate; growing a main material layer on the convex portions; and separating the main material layer from the substrate.

Abstract: A microscopy system includes an objective lens and a stage for holding a sample. The objective lens focuses incident light coming from one side of the objective lens to the sample disposed on the other side of the objective lens, and focuses an optical signal emitted from the sample to a photosensor disposed on the one side of the objective lens. The stage supports the sample and is configured to be revolvable about an axis, which is substantially perpendicular to an extending direction from the sample to the objective lens.

Abstract: A method of forming a dual damascene opening comprising the following steps. A structure having an overlying exposed conductive layer formed thereover is provided. A dielectric layer is formed over the exposed conductive layer. An anti-reflective coating layer is formed over the dielectric layer. The anti-reflective layer and the dielectric layer are etched using a via opening process to form an initial via exposing a portion of the conductive layer. A protective film portion is formed over at least the exposed portion of the conductive layer. The anti-reflective coating layer and the dielectric layer are patterned to reduce the initial via to a reduced via and to form a trench opening substantially centered over the reduced via. The trench opening and the reduced via comprising the dual damascene opening.

Abstract: Via hole and trench structures and fabrication methods are disclosed. The structure includes a conductive layer in a dielectric layer, and a via structure in the dielectric layer contacting a portion of a surface of the conductive layer. The via structure includes the conductive liner contacting the portion of the surface of the first conductive layer. A trench structure is formed on the via structure in the dielectric without the conductive liner layer in the trench.

Abstract: A method of forming 3D micro structures with high aspect ratios includes the steps of: disposing a mask, which has a plurality of through holes having at least two different sizes, on a substrate to expose the substrate through the through holes; forming a negative photoresist layer on the mask and the substrate; providing a light source to illuminate the negative photoresist layer through the substrate and the through holes of the mask so as to form a plurality of exposed portions and an unexposed portion; and removing the unexposed portion and leaving the exposed portions to form a plurality of pillars each having a bottom portion contacting the substrate and a top portion opposite to the bottom portion. A top area of the top portion is slightly smaller than a bottom area of the bottom portion, and the pillars are allowed to have at least two different heights.

Abstract: A novel multifunctional nano-probe interface is proposed for applications in neural stimulation and detecting. The nano-probe interface structure consists of a carbon nanotube coated with a thin isolation layer, a micro-electrode substrate array, and a controller IC for neural cell recording and stimulation. The micro-electrode substrate array contains wires connecting the carbon nanotube with the controller IC, as well as microfluidic channels for supplying neural tissues with essential nutrition and medicine. The carbon nanotube is disposed on the micro-electrode substrate array made by silicon, coated with a thin isolation layer around thereof, and employed as a nano-probe for neural recording and stimulation.

Abstract: A mold manufacturing method includes the steps of: disposing a mask layer on a front side and a backside of a first substrate, wherein the first substrate is transparent to a predetermined light source and the mask layer has a top portion and a bottom portion, which are respectively disposed on the front side and the backside and arranged alternately; forming a photoresist layer on the front side of the first substrate; providing the predetermined light source to illuminate the backside of the first substrate so as to expose the photoresist layer to form an exposed portion and an unexposed portion; and removing the unexposed portion to form a patterned structure having trenches and micro-holes arranged alternately; forming a metal layer on the patterned structure of the photoresist layer and the first substrate; and removing the photoresist layer and the first substrate; to remain the metal layer.

Abstract: A method of manufacturing a hollow micro-needle structure includes the steps of: disposing a first mask layer and a second mask layer respectively aside a first substrate and aside a rear surface of the first substrate, wherein the first substrate is transparent to predetermined light; forming a photoresist layer on the front surface of the first substrate and the first mask layer; providing the predetermined light to illuminate the first substrate in a direction from the rear surface to the front surface so as to expose the photoresist layer to form an exposed portion and an unexposed portion; and removing the unexposed portion to form the micro-needle structure, which is formed by the exposed portion. The micro-needle structure has an inclined sidewall and a through hole surrounded by the inclined sidewall.