Patents by Inventor Chien-Chung Han

Chien-Chung Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11697634
    Abstract: A method for producing a homocyclic or heterocyclic compound includes reacting a compound of formula (I) with a compound of formula (II) in presence of a base: R1—B-G??(I) In formula (I), B is an unsaturated moiety selected from substituted or unsubstituted vinylene, ethynylene, aryleneethynylene, substituted or unsubstituted arylenevinylene, and a combination thereof, the vinylene or arylenevinylene has n (=0, 1 or 2) substituent(s) R2, G is an electron-withdrawing group, R1 is hydrogen or a substituent, and two of R1, R2 and G may joint together to form a ring. In formula (II), R3 and R4 are independently hydrogen or a substituent, R5 is an electron-withdrawing group, and two of R3, R4 and R5 may joint together to form a ring. The conjugate acid of the base has a pKa in the range of 1 to 15.
    Type: Grant
    Filed: May 17, 2021
    Date of Patent: July 11, 2023
    Assignee: National Tsing Hua University
    Inventors: Chien-Chung Han, Suman Alishetty
  • Patent number: 11655378
    Abstract: A composition for forming an electroactive coating includes an acid as a polymerization catalyst, at least one functional component, and at least one compound of formula (1) as a monomer: wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y? whose conjugate acid (HY) has a pKa of less than 45, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HY) has a pKa of less than 45, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) includes at least one compound of formula (1) with Z?H and Y?H.
    Type: Grant
    Filed: November 3, 2019
    Date of Patent: May 23, 2023
    Assignee: PolyM technology corporation
    Inventors: Chien-Chung Han, Ting-Chia Ku, Jo-Wen Chiang
  • Publication number: 20210269391
    Abstract: A method for producing a homocyclic or heterocyclic compound includes reacting a compound of formula (I) with a compound of formula (II) in presence of a base: In formula (I), B is an unsaturated moiety selected from substituted or unsubstituted vinylene, ethynylene, aryleneethynylene, substituted or unsubstituted arylenevinylene, and a combination thereof, the vinylene or arylenevinylene has n (=0, 1 or 2) substituent(s) R2, G is an electron-withdrawing group, R1 is hydrogen or a substituent, and two of R1, R2 and G may joint together to form a ring. In formula (II), R3 and R4 are independently hydrogen or a substituent, R5 is an electron-withdrawing group, and two of R3, R4 and R5 may joint together to form a ring. The conjugate acid of the base has a pKa in the range of 1 to 15.
    Type: Application
    Filed: May 17, 2021
    Publication date: September 2, 2021
    Applicant: National Tsing Hua University
    Inventors: Chien-Chung Han, Suman Alishetty
  • Patent number: 11053189
    Abstract: A method for producing a homocyclic or heterocyclic compound includes reacting a compound of formula (I) with a compound of formula (II) in presence of a base: In formula (I), B is an unsaturated moiety selected from substituted or unsubstituted vinylene, ethynylene, aryleneethynylene, substituted or unsubstituted arylenevinylene, and a combination thereof, the vinylene or arylenevinylene has n (=0, 1 or 2) substituent(s) R2, G is an electron-withdrawing group, R1 is hydrogen or a substituent, and two of R1, R2 and G may joint together to form a ring. In formula (II), R3 and R4 are independently hydrogen or a substituent, R5 is an electron-withdrawing group, and two of R3, R4 and R5 may joint together to form a ring. The conjugate acid of the base has a pKa in the range of 1 to 15.
    Type: Grant
    Filed: March 25, 2019
    Date of Patent: July 6, 2021
    Assignee: National Tsing Hua University
    Inventors: Chien-Chung Han, Suman Alishetty
  • Publication number: 20200308101
    Abstract: A method for producing a homocyclic or heterocyclic compound includes reacting a compound of formula (I) with a compound of formula (II) in presence of a base: In formula (I), B is an unsaturated moiety selected from substituted or unsubstituted vinylene, ethynylene, aryleneethynylene, substituted or unsubstituted arylenevinylene, and a combination thereof, the vinylene or arylenevinylene has n (=0, 1 or 2) substituent(s) R2, G is an electron-withdrawing group, R1 is hydrogen or a substituent, and two of R1, R2 and G may joint together to form a ring. In formula (II), R3 and R4 are independently hydrogen or a substituent, R5 is an electron-withdrawing group, and two of R3, R4 and R5 may joint together to form a ring. The conjugate acid of the base has a pKa in the range of 1 to 15.
    Type: Application
    Filed: March 25, 2019
    Publication date: October 1, 2020
    Applicant: National Tsing Hua University
    Inventors: Chien-Chung Han, Suman Alishetty
  • Publication number: 20200062973
    Abstract: A composition for forming an electroactive coating includes an acid as a polymerization catalyst, at least one functional component, and at least one compound of formula (1) as a monomer: wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y? whose conjugate acid (HY) has a pKa of less than 45, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HY) has a pKa of less than 45, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) includes at least one compound of formula (1) with Z?H and Y?H.
    Type: Application
    Filed: November 3, 2019
    Publication date: February 27, 2020
    Applicant: PolyM technology corporation
    Inventors: Chien-Chung Han, Ting-Chia Ku, Jo-Wen Chiang
  • Patent number: 10538633
    Abstract: A method for forming a conjugated heteroaromatic polymer is described, wherein at least one compound of formula (1) is polymerized using an acid as a catalyst, wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y? whose conjugate acid (HY) has a pKa of less than 30, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HY) has a pKa of less than 30, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) being polymerized includes at least one compound of formula (1) with Z?H and Y?H.
    Type: Grant
    Filed: September 1, 2017
    Date of Patent: January 21, 2020
    Assignee: PolyM technology corporation
    Inventors: Chien-Chung Han, Balasubramanian Arumugam
  • Patent number: 10519328
    Abstract: A composition for forming an electroactive coating includes an acid as a polymerization catalyst, at least one functional component, and at least one compound of formula (1) as a monomer: wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y? whose conjugate acid (HY) has a pKa of less than 45, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HY) has a pKa of less than 45, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) includes at least one compound of formula (1) with Z?H and Y?H.
    Type: Grant
    Filed: March 13, 2017
    Date of Patent: December 31, 2019
    Assignee: PolyM technology corporation
    Inventors: Chien-Chung Han, Ting-Chia Ku, Jo-Wen Chiang
  • Patent number: 10475592
    Abstract: A composition for forming an electroactive coating is described, including an acid as a polymerization catalyst, at least one functional component, and at least one compound of formula (1) as a monomer: wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y? whose conjugate acid (HY) has a pKa of less than 30, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HY) has a pKa of less than 30, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) includes at least one compound of formula (1) with Z=H and Y?H.
    Type: Grant
    Filed: February 8, 2017
    Date of Patent: November 12, 2019
    Assignee: PolyM technology corporation
    Inventors: Chien-Chung Han, Ting-Chia Ku, Jo-Wen Chiang
  • Patent number: 10407402
    Abstract: A method of forming a chalcogenophene compound of formula (I) includes reacting a compound of formula (II) with a chalcogenide salt in presence of a proton source. Y is O, S, Se, Te or Po. R1 is hydrogen, deuterium, an aliphatic, heteroaromatic, or aromatic group, or a precursor of a leaving group Z whose conjugate acid (HZ) has pKa less than 30. R2 is hydrogen, deuterium, or an aliphatic, heteroaromatic, or aromatic group. R1 and R2 may be the same or different, and may joint together to form a saturated or unsaturated, heteroalicyclic or alicyclic ring. R3 is, for example, alkyl, aryl, heteroaryl, organosilyl, organotin, or organogermyl. R3? is the same as R3 or is hydrogen. X is a precursor of a leaving group X whose conjugate acid (HX) has a pKa of less than 30.
    Type: Grant
    Filed: February 13, 2019
    Date of Patent: September 10, 2019
    Assignee: National Tsing Hua University
    Inventors: Chien-Chung Han, Vamsi Krishna Karapala
  • Patent number: 9859062
    Abstract: A composition for forming an electroactive coating is described, including an acid as a polymerization catalyst, at least one functional component, and at least one compound of formula (1) as a monomer: wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y? whose conjugate acid (HY) has a pKa of less than 30, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HY) has a pKa of less than 30, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) includes at least one compound of formula (1) with Z=H and Y?H.
    Type: Grant
    Filed: October 8, 2014
    Date of Patent: January 2, 2018
    Assignee: PolyM technology corporation
    Inventors: Chien-Chung Han, Ting-Chia Ku, Jo-Wen Chiang
  • Publication number: 20170362393
    Abstract: A method for forming a conjugated heteroaromatic polymer is described, wherein at least one compound of formula (1) is polymerized using an acid as a catalyst, wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y? whose conjugate acid (HY) has a pKa of less than 30, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HY) has a pKa of less than 30, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) being polymerized includes at least one compound of formula (1) with Z?H and Y?H.
    Type: Application
    Filed: September 1, 2017
    Publication date: December 21, 2017
    Applicant: PolyM technology corporation
    Inventors: Chien-Chung Han, Balasubramanian Arumugam
  • Patent number: 9790330
    Abstract: A method for forming a conjugated heteroaromatic polymer is described, wherein at least one compound of formula (1) is polymerized using an acid as a catalyst, wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y? whose conjugate acid (HY) has a pKa of less than 30, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HZ) has a pKa of less than 30, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) being polymerized includes at least one compound of formula (1) with Z=H and Y?H.
    Type: Grant
    Filed: October 28, 2012
    Date of Patent: October 17, 2017
    Assignee: PolyM technology corporation
    Inventors: Chien-Chung Han, Balasubramanian Arumugam
  • Publication number: 20170183512
    Abstract: A composition for forming an electroactive coating includes an acid as a polymerization catalyst, at least one functional component, and at least one compound of formula (1) as a monomer: wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y? whose conjugate acid (HY) has a pKa of less than 45, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HY) has a pKa of less than 45, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) includes at least one compound of formula (1) with Z=H and Y?H.
    Type: Application
    Filed: March 13, 2017
    Publication date: June 29, 2017
    Applicant: PolyM technology corporation
    Inventors: Chien-Chung Han, Ting-Chia Ku, Jo-Wen Chiang
  • Publication number: 20170148578
    Abstract: A composition for forming an electroactive coating is described, including an acid as a polymerization catalyst, at least one functional component, and at least one compound of formula (1) as a monomer: wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y? whose conjugate acid (HY) has a pKa of less than 30, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HY) has a pKa of less than 30, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) includes at least one compound of formula (1) with Z=H and Y?H.
    Type: Application
    Filed: February 8, 2017
    Publication date: May 25, 2017
    Applicant: PolyM technology corporation
    Inventors: Chien-Chung Han, Ting-Chia Ku, Jo-Wen Chiang
  • Patent number: 9627147
    Abstract: A composition for forming an electroactive coating is described, including an acid as a polymerization catalyst, at least one functional component, and at least one compound of formula (1) as a monomer: wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y? whose conjugate acid (HY) has a pKa of less than 30, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HY) has a pKa of less than 30, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) includes at least one compound of formula (1) with Z?H and Y?H.
    Type: Grant
    Filed: June 17, 2014
    Date of Patent: April 18, 2017
    Assignee: PolyM technology corporation
    Inventors: Chien-Chung Han, Ting-Chia Ku, Jo-Wen Chiang
  • Patent number: 9006490
    Abstract: A method for direct functionalization of polyaniline and other molecules with at least one diiminoquinoid ring through C—C bond formation is described. Fluoride ion, or a weak base whose conjugated acid form has a pKa value of 1-10, is used as a catalyst to react the molecule with an organic compound that has an abstractable proton directly bonded to the target carbon atom thereof to be bonded to the diiminoquinoid ring and has a pKa value less than 30 for the abstractable proton.
    Type: Grant
    Filed: November 23, 2010
    Date of Patent: April 14, 2015
    Inventors: Chien-Chung Han, Hong-Pin Shih
  • Publication number: 20150029641
    Abstract: A composition for forming an electroactive coating is described, including an acid as a polymerization catalyst, at least one functional component, and at least one compound of formula (1) as a monomer: wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y? whose conjugate acid (HY) has a pKa of less than 30, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HY) has a pKa of less than 30, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) includes at least one compound of formula (1) with Z=H and Y?H.
    Type: Application
    Filed: October 8, 2014
    Publication date: January 29, 2015
    Inventors: Chien-Chung Han, Ting-Chia Ku, Jo-Wen Chiang
  • Publication number: 20140293514
    Abstract: A composition for forming an electroactive coating is described, including an acid as a polymerization catalyst, at least one functional component, and at least one compound of formula (1) as a monomer: wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y? whose conjugate acid (HY) has a pKa of less than 30, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HY) has a pKa of less than 30, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) includes at least one compound of formula (1) with Z=H and Y?H.
    Type: Application
    Filed: June 17, 2014
    Publication date: October 2, 2014
    Inventors: Chien-Chung Han, Ting-Chia Ku, Jo-Wen Chiang
  • Publication number: 20140121326
    Abstract: A method for forming a conjugated heteroaromatic polymer is described, wherein at least one compound of formula (1) is polymerized using an acid as a catalyst, wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y? whose conjugate acid (HY) has a pKa of less than 30, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HY) has a pKa of less than 30, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) being polymerized includes at least one compound of formula (1) with Z?H and Y?H.
    Type: Application
    Filed: October 28, 2012
    Publication date: May 1, 2014
    Inventors: Chien-Chung Han, Balasubramanian Arumugam