Patents by Inventor Chien-Fu Chen

Chien-Fu Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250096092
    Abstract: A stacked via structure disposed on a conductive pillar of a semiconductor die is provided. The stacked via structure includes a first dielectric layer, a first conductive via, a first redistribution wiring, a second dielectric layer, a second conductive via, and a second redistribution wiring. The first dielectric layer covers the semiconductor die. The first conductive via is embedded in the first dielectric layer and electrically connected to the conductive pillar. The first redistribution wiring covers the first conductive via and the first dielectric layer. The second dielectric layer covers the first dielectric layer and the first redistribution wiring. The second conductive via is embedded in the second dielectric layer and landed on the first redistribution wiring. The second redistribution wiring covers the second conductive via and the second dielectric layer. A lateral dimension of the first conductive via is greater than a lateral dimension of the second conductive via.
    Type: Application
    Filed: November 28, 2024
    Publication date: March 20, 2025
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Che-Yu Yeh, Tsung-Shu Lin, Wei-Cheng Wu, Tsung-Yu Chen, Li-Han Hsu, Chien-Fu Tseng
  • Publication number: 20250087888
    Abstract: An antenna assembly includes a patch antenna, a metal layer, and a feed-in signal layer. The metal layer is disposed on a side of the patch antenna and includes a first slot and a second slot. The feed-in signal layer is disposed on a side of the metal layer opposite the second antenna and includes a transmitting port, a receiving port, a hybrid coupler, and two microstrips. The transmitting port and the receiving port are connected to the hybrid coupler, and the two microstrips are extended in the direction away from the hybrid coupler. Projections of two ends of the two microstrips onto the metal layer are overlapped with the first slot and the second slot. An antenna array is also mentioned.
    Type: Application
    Filed: May 30, 2024
    Publication date: March 13, 2025
    Applicant: PEGATRON CORPORATION
    Inventors: Chien-Yi Wu, Tse-Hsuan Wang, Chih-Fu Chang, Hsin-Feng Hsieh, Wu-Hua Chen, Chih-Wei Liao, Chao-Hsu Wu
  • Patent number: 12243901
    Abstract: A circuit, including: a photodetector including a first readout terminal and a second readout terminal different than the first readout terminal; a first readout circuit coupled with the first readout terminal and configured to output a first readout voltage; a second readout circuit coupled with the second readout terminal and configured to output a second readout voltage; and a common-mode analog-to-digital converter (ADC) including: a first input terminal coupled with a first voltage source; a second input terminal coupled with a common-mode generator, the common-mode generator configured to receive the first readout voltage and the second readout voltage, and to generate a common-mode voltage between the first and second readout voltages; and a first output terminal configured to output a first output signal corresponding to a magnitude of a current generated by the photodetector.
    Type: Grant
    Filed: March 15, 2023
    Date of Patent: March 4, 2025
    Assignee: Artilux, Inc.
    Inventors: Yun-Chung Na, Che-Fu Liang, Shu-Lu Chen, Szu-Lin Cheng, Han-Din Liu, Chien-Lung Chen, Yuan-Fu Lyu, Chieh-Ting Lin, Bo-Jiun Chen, Hui-Wen Chen, Shu-Wei Chu, Chung-Chih Lin, Kuan-Chen Chu
  • Patent number: 12219879
    Abstract: A method includes forming Magnetic Tunnel Junction (MTJ) stack layers, which includes depositing a bottom electrode layer; depositing a bottom magnetic electrode layer over the bottom electrode layer; depositing a tunnel barrier layer over the bottom magnetic electrode layer; depositing a top magnetic electrode layer over the tunnel barrier layer; and depositing a top electrode layer over the top magnetic electrode layer. The method further includes patterning the MTJ stack layers to form a MTJ; and performing a passivation process on a sidewall of the MTJ to form a protection layer. The passivation process includes reacting sidewall surface portions of the MTJ with a process gas comprising elements selected from the group consisting of oxygen, nitrogen, carbon, and combinations thereof.
    Type: Grant
    Filed: November 28, 2023
    Date of Patent: February 4, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Tai-Yen Peng, Yu-Shu Chen, Sin-Yi Yang, Chen-Jung Wang, Chien Chung Huang, Han-Ting Lin, Jyu-Horng Shieh, Qiang Fu
  • Patent number: 12218279
    Abstract: An optoelectronic device includes a first semiconductor layer, a second semiconductor layer and an active layer between the first semiconductor layer and the second semiconductor layer; a first insulating layer on the second semiconductor layer and including a plurality of first openings exposing the first semiconductor layer, wherein the first openings include a first group and a second group; a third electrode on the first insulating layer and including a first extended portion and a second extended portion, wherein the first extended portion and the second extended portion are respectively electrically connected to the first semiconductor layer through the first group of the first openings and the second group of the first openings, and wherein the number of the first group of the first openings is different from the number of the second group of the first openings; and a plurality of fourth electrodes on the second insulating layer and electrically connected to the second semiconductor layer, wherein in a
    Type: Grant
    Filed: January 11, 2024
    Date of Patent: February 4, 2025
    Assignee: EPISTAR CORPORATION
    Inventors: Chao-Hsing Chen, Jia-Kuen Wang, Chien-Chih Liao, Tzu-Yao Tseng, Tsun-Kai Ko, Chien-Fu Shen
  • Publication number: 20250027227
    Abstract: Provided are a silicon carbide crystal growth device and a quality control method. The device includes: an annealing unit, a crystal growth unit, an atmosphere control unit, and a transport system; the atmosphere control unit provides a gas environment with low water, oxygen and nitrogen; the transport system transports a plurality of target objects after high-temperature purification by the annealing unit to the atmosphere control unit; after assembling silicon carbide seed crystal and silicon carbide powder in a graphite crucible and covering with thermal insulation material to form a container inside the atmosphere control unit, the transport system transports the container to the crystal growth unit. The method uses a weighing system in a chamber of the crystal growth unit to detect a weight change of silicon carbide seed crystal and silicon carbide powder during a crystal growth process through a plurality of weight sensors of the weighing system.
    Type: Application
    Filed: July 20, 2023
    Publication date: January 23, 2025
    Inventors: Yun-Fu Chen, Wei-Tse Hsu, Min-Sheng Chu, Chien-Li Yang, Tsu-Hsiang Lin, Yuan-Hong Huang
  • Publication number: 20240290771
    Abstract: An integrated circuit layout includes an upper active region comprising a first edge and a second edge extending along a first direction and respectively adjacent to an upper cell boundary by a distance D3 and a distance D4. A first gate line is disposed on the upper active region, extends along a second direction, and protrudes from the first edge by a length L3. A second gate line is disposed on the upper active region, extends along the second direction, and protrudes from the second edge by a length L4. Two dummy gate lines respectively extend along the second direction and are disposed at two sides of the upper active region and away from the upper cell boundary by a distance S. The first direction and the second direction are perpendicular. The distances D3, D4, S and the lengths L3 and L4 have the relationships: L3?D3?S, L4?D4?S, and D3?D4.
    Type: Application
    Filed: May 8, 2024
    Publication date: August 29, 2024
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Ruei-Yau Chen, Wei-Jen Wang, Kun-Yuan Wu, Chien-Fu Chen, Chen-Hsien Hsu
  • Patent number: 12066386
    Abstract: A sampling device is provided, including: a syringe barrel having an opening and a holding portion; a plunger body having a protruding wall and disposed in the syringe barrel through the opening, where the protruding wall has a first recessed portion; a spring disposed around the plunger body; and a fastening assembly having an engaging structure for engaging the fastening assembly with the holding portion, a groove rail for receiving the protruding wall of the plunger body and a fastening portion for limiting displacement of the plunger body. A semi-automatic sample feeding device is further provided and includes the sampling device and a flow control device, and a test paper detection system is also provided and includes the semi-automatic sample feeding device and a test paper device. The test paper detection system is able to stably introduce samples, suitable for large-volume samples, which meets the needs of point-of-care applications.
    Type: Grant
    Filed: May 12, 2021
    Date of Patent: August 20, 2024
    Assignee: National Taiwan University
    Inventors: Chien-Fu Chen, Shih-Jie Chen, Jia-Hui Lin
  • Patent number: 11984442
    Abstract: A layout includes a first and a second standard cells abutting along a boundary line. The first cell includes first fins. An edge of the first fins closest to and away from the boundary line by a distance D1. A first gate line over-crossing the first fins protrudes from the edge by a length L1. The second cell includes second fins. An edge of the second fins closest to and away from the boundary line by a distance D2. A second gate line over-crossing the second fins protrudes from the edge by a length L2. Two first dummy gate lines at two sides of the first fins and two second dummy lines at two sides of the second fins are respectively away from the boundary line by a distance S. The lengths L1 and L2, the distances S, D1 and D2 have the relationships: L1?D1?S, L2?D2?S, and D1?D2.
    Type: Grant
    Filed: April 8, 2022
    Date of Patent: May 14, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Ruei-Yau Chen, Wei-Jen Wang, Kun-Yuan Wu, Chien-Fu Chen, Chen-Hsien Hsu
  • Publication number: 20240062924
    Abstract: A device, which is used to inspect the confinement boundary of a vertical spent nuclear fuel storage canister during operation, includes a vertical spent nuclear fuel storage unit, a lifting unit, a transferring unit and an inspection platform. The vertical spent nuclear fuel storage unit includes a vertical storage canister and a storage overpack. The vertical storage canister is configured for storing spent nuclear fuels, and the storage overpack is configured for storing the vertical storage canister. The lifting unit, connected with the vertical storage canister, is configured for lifting the vertical storage canister. The transferring unit, connected with the lifting unit, is configured for protecting the lifted vertical storage canister. The inspection platform, connected with the transferring unit and the storage overpack, is configured for creating more space with sufficient shielding for the usage of inspecting the confinement boundary of the vertical storage canister.
    Type: Application
    Filed: October 19, 2022
    Publication date: February 22, 2024
    Inventors: CHING-WEI YANG, KUEI-JEN CHENG, YING-WEI LIN, CHIEN-FU CHEN
  • Patent number: 11862622
    Abstract: An integrated circuit layout includes a first standard cell and a second standard cell. The first standard cell includes first gate lines arranged along a first direction and extending along a second direction. The second standard cell abuts to one side of the first standard cell along the second direction and includes second gate lines arranged along the first direction and extending along the second direction. A first gate line width of the first gate lines and a second gate line width of the second gate lines are different. A first cell width of the first standard cell and a second cell width of the second standard cell are integral multiples of a default gate line pitch of the first gate lines and the second gate lines. At least some of the second gate lines and at least some of the first gate lines are aligned along the second direction.
    Type: Grant
    Filed: June 16, 2021
    Date of Patent: January 2, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Kun-Yuan Wu, Wei-Jen Wang, Chien-Fu Chen, Chen-Hsien Hsu, Chien-Hung Chen, Chun-Hsien Lin
  • Publication number: 20230313280
    Abstract: An integrated nucleic acid loop-mediated isothermal amplification and mobile device system is provided and includes a main body and a power supply, where the 5 main body at least has a delivery unit, a heating unit and a control unit, the control unit is electrically connected to the delivery unit and the heating unit, and the power supply is electrically connected to the main body. A method for operating the integrated nucleic acid loop-mediated isothermal amplification and mobile device system is also provided.
    Type: Application
    Filed: October 14, 2022
    Publication date: October 5, 2023
    Inventors: Chien-Fu CHEN, Shou-Cheng WU, Shi-Jia CHEN, Yuh-Shiuan CHIEN, Wang-Huei SHENG
  • Publication number: 20230097189
    Abstract: A method for forming an integrated circuit layout including at least two standard cells having different cell heights is disclosed. The standard cells respectively have a well boundary to divide a PMOS region and an NMOS region. The standard cells are abutted side by side along their side edges in a way that the well boundaries of the cells are aligned along the row direction. The power rail and the ground rail of one of the standard cells are shifted to align and connect to the power rail and the ground rail of the other one of the standard cells.
    Type: Application
    Filed: July 19, 2022
    Publication date: March 30, 2023
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Chien-Hung Chen, Ruei-Yau Chen, Wei-Jen Wang, Kun-Yuan Wu, Chien-Fu Chen, Chen-Hsien Hsu
  • Publication number: 20230099326
    Abstract: A method for forming an integrated circuit layout including at least two standard cells having different cell heights is disclosed. The standard cells respectively have a well boundary to divide a PMOS region and an NMOS region. The standard cells are abutted side by side along their side edges in a way that the well boundaries of the cells are aligned along the row direction. The power rail and the ground rail of one of the standard cells are extended in width or length to connect to the power rail and the ground rail of the other one of the standard cells.
    Type: Application
    Filed: July 21, 2022
    Publication date: March 30, 2023
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Chien-Hung Chen, Ruei-Yau Chen, Wei-Jen Wang, Kun-Yuan Wu, Chien-Fu Chen, Chen-Hsien Hsu
  • Publication number: 20230095481
    Abstract: An integrated circuit layout includes a first and a second standard cells abutting along a boundary line. The boundary line and a first active region of the first standard cell include a distance D1. A first gate line on the first active region protrudes from the first active region by a length L1. The boundary line and a second active region of the second standard cell include a distance D2. A second gate line on the second active region protrudes from the second active region by a length L2. Two first dummy gate lines and two second dummy gate lines are disposed at two sides of the first active region and the second active region and are away from the boundary line by a distance S. The lengths L1 and L2, the distances S, D1 and D2 have the relationships: L1?D1?S, L2?D2?S, and D1?D2.
    Type: Application
    Filed: November 2, 2021
    Publication date: March 30, 2023
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Ruei-Yau Chen, Wei-Jen Wang, Kun-Yuan Wu, Chien-Fu Chen, Chen-Hsien Hsu
  • Publication number: 20230096645
    Abstract: A layout includes a first and a second standard cells abutting along a boundary line. The first cell includes first fins. An edge of the first fins closest to and away from the boundary line by a distance D1. A first gate line over-crossing the first fins protrudes from the edge by a length L1. The second cell includes second fins. An edge of the second fins closest to and away from the boundary line by a distance D2. A second gate line over-crossing the second fins protrudes from the edge by a length L2. Two first dummy gate lines at two sides of the first fins and two second dummy lines at two sides of the second fins are respectively away from the boundary line by a distance S. The lengths L1 and L2, the distances S, D1 and D2 have the relationships: L1?D1?S, L2?D2?S, and D1?D2.
    Type: Application
    Filed: April 8, 2022
    Publication date: March 30, 2023
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Ruei-Yau Chen, Wei-Jen Wang, Kun-Yuan Wu, Chien-Fu Chen, Chen-Hsien Hsu
  • Publication number: 20220344321
    Abstract: An integrated circuit layout includes a first standard cell and a second standard cell. The first standard cell includes first gate lines arranged along a first direction and extending along a second direction. The second standard cell abuts to one side of the first standard cell along the second direction and includes second gate lines arranged along the first direction and extending along the second direction. A first gate line width of the first gate lines and a second gate line width of the second gate lines are different. A first cell width of the first standard cell and a second cell width of the second standard cell are integral multiples of a default gate line pitch of the first gate lines and the second gate lines. At least some of the second gate lines and at least some of the first gate lines are aligned along the second direction.
    Type: Application
    Filed: June 16, 2021
    Publication date: October 27, 2022
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Kun-Yuan Wu, Wei-Jen Wang, Chien-Fu Chen, Chen-Hsien Hsu, Chien-Hung Chen, Chun-Hsien Lin
  • Publication number: 20220304665
    Abstract: A sampling device is provided, including: a syringe barrel having an opening and a holding portion; a plunger body having a protruding wall and disposed in the syringe barrel through the opening, where the protruding wall has a first recessed portion; a spring disposed around the plunger body; and a fastening assembly having an engaging structure for engaging the fastening assembly with the holding portion, a groove rail for receiving the protruding wall of the plunger body and a fastening portion for limiting displacement of the plunger body. A semi-automatic sample feeding device is further provided and includes the sampling device and a flow control device, and a test paper detection system is also provided and includes the semi-automatic sample feeding device and a test paper device. The test paper detection system is able to stably introduce samples, suitable for large-volume samples, which meets the needs of point-of-care applications.
    Type: Application
    Filed: May 12, 2021
    Publication date: September 29, 2022
    Applicant: National Taiwan University
    Inventors: Chien-Fu CHEN, Shih-Jie CHEN, Jia-Hui LIN
  • Patent number: 11368146
    Abstract: A delay cell includes a cascode transistor and an inverter. The cascode transistor is used to receive a control voltage to generate a bias current, and includes a source terminal, a drain terminal, and a gate terminal receiving the control voltage. The inverter is coupled to the cascode transistor and used to generate an output signal according to the bias current in response to an input signal.
    Type: Grant
    Filed: April 14, 2020
    Date of Patent: June 21, 2022
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Kun-Yuan Wu, Wei-Jen Wang, Chien-Fu Chen, Chen-Hsien Hsu, Yuan-Hui Chen, Cheng-Yang Tsai, Ruei-Yau Chen, Cheng-Tsung Ku, Zhi-Hong Huang, Yu-Lin Chen
  • Patent number: 11348847
    Abstract: The invention provides a testkey detection circuit, including a plurality of oscillators and a driving circuit. Each of the oscillators has an enable terminal, a voltage terminal and an output terminal, wherein the enable terminals are connected to a common enable terminal. The driving circuit receives the output terminals of the oscillators and increases a driving level of a selected one of the output terminals as a frequency output.
    Type: Grant
    Filed: January 16, 2019
    Date of Patent: May 31, 2022
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Kun-Yuan Wu, Wei-Jen Wang, Chien-Fu Chen, Chen-Hsien Hsu, Yuan-Hui Chen, Ruei-Yau Chen, Cheng-Tsung Ku, Zhi-Hong Huang, Cheng-Yang Tsai, Yu-Lin Chen