Patents by Inventor Chien-Hau Chen

Chien-Hau Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6520627
    Abstract: A process for creating and an apparatus employing shaped orifices in a semiconductor substrate. A first layer of material is applied on the semiconductor substrate then a second layer of material is then applied upon the first layer of material. An orifice image is then transferred to the first layer of material and a fluid-well image is transferred to the second layer of material. That portion of the second layer of material where the orifice image is located is then developed along with that portion of the first layer of material where the fluid well is located to define an orifice in the substrate.
    Type: Grant
    Filed: February 1, 2002
    Date of Patent: February 18, 2003
    Assignee: Hewlett-Packard Company
    Inventors: Chien-Hau Chen, Donald E. Wenzel, Qin Liu, Naoto Kawamura, Richard W. Seaver, Carl Wu, Colby Van Vooren, Jeffery S. Hess, Colin C. Davis
  • Patent number: 6447102
    Abstract: A process for creating and an apparatus employing shaped orifices in a semiconductor substrate. A first layer of material is applied on the semiconductor substrate then a second layer of material is then applied upon the first layer of material. An orifice image is then transferred to the first layer of material and a fluid-well image is transferred to the second layer of material. That portion of the second layer of material where the orifice image is located is then developed along with that portion of the first layer of material where the fluid well is located to define an orifice in the substrate.
    Type: Grant
    Filed: June 26, 2000
    Date of Patent: September 10, 2002
    Assignee: Hewlett-Packard Company
    Inventors: Chien-Hau Chen, Donald E. Wenzel, Qin Liu, Naoto Kawamura, Richard W. Seaver, Carl Wu, Colby Van Vooren, Jeffery S. Hess, Colin C. Davis
  • Publication number: 20020071006
    Abstract: A process for creating and an apparatus employing shaped orifices in a semiconductor substrate. A first layer of material is applied on the semiconductor substrate then a second layer of material is then applied upon the first layer of material. An orifice image is then transferred to the first layer of material and a fluid-well image is transferred to the second layer of material. That portion of the second layer of material where the orifice image is located is then developed along with that portion of the first layer of material where the fluid well is located to define an orifice in the substrate.
    Type: Application
    Filed: February 1, 2002
    Publication date: June 13, 2002
    Inventors: Chien-Hau Chen, Donald E. Wenzel, Qin Liu, Naoto Kawamura, Richard W. Seaver, Carl Wu, Colby Van Vooren, Jeffery S. Hess, Colin C. Davis
  • Patent number: 6162589
    Abstract: A process for creating and an apparatus employing shaped orifices in a semiconductor substrate. A first layer of material is applied on the semiconductor substrate then a second layer of material is then applied upon the first layer of material. An orifice image is then transferred to the first layer of material and a fluid-well image is transferred to the second layer of material. That portion of the second layer of material where the orifice image is located is then developed along with that portion of the first layer of material where the fluid well is located to define an orifice in the substrate.
    Type: Grant
    Filed: March 2, 1998
    Date of Patent: December 19, 2000
    Assignee: Hewlett-Packard Company
    Inventors: Chien-Hau Chen, Donald E. Wenzel, Qin Liu, Naoto Kawamura, Richard W. Seaver, Carl Wu, Colby Van Vooren, Jeffery S. Hess, Colin C. Davis