Abstract: A panel light guide module for a solid-state drive includes a panel shell and a light guide structure. The panel shell includes a housing and a panel combined to the housing. The panel includes a light source hole. The light guide structure includes a light guide cover combined with the housing and a light guide column positioned on the light guide cover. The light guide column includes a light-receiving surface facing the light sources and a light-emitting surface facing the light source hole. The light sources positioned on different installation surfaces include a plurality of luminous surfaces, and the light-receiving surface faces the luminous surfaces of the light sources and receive the light emitted from the light sources.

Abstract: A memory device and a semiconductor die are provided. The memory device includes single-level-cells (SLCs) and multi-level-cells (MLCs). Each of the SLCs and the MLCs includes: a phase change layer; and a first electrode, in contact with the phase change layer, and configured to provide joule heat to the phase change layer during a programming operation. The first electrode in each of the MLCs is greater in footprint area as compared to the first electrode in each of the SLCs.

Abstract: An electronic device is provided. The electronic device includes a base and a conductive layer that is disposed on the base and patterned by a plurality of processes. The plurality of processes include providing a mask substrate. The mask substrate includes a first substrate and a patterned substrate. In the cross-sectional view, the width of the first substrate is greater than or equal to the width of the patterned substrate. The plurality of processes include arranging the mask substrate and the base correspondingly. The plurality of processes also include performing exposure and development processes on the conductive layer for patterning the conductive layer, and removing the mask substrate.

Abstract: The present invention discloses a diaphragm for a speaker including a lower surface area, a central area formed on said lower surface area, an upper surface area formed on said central area. The upper surface area, the central area and the lower surface area includes homogeneous amorphous materials. The diaphragm includes internal stress changing with a depth from the surface to the center of the diaphragm.

Abstract: Provided is an inspection tool for a touch panel, including a substrate adapted to be placed on the touch panel and multiple protrusions disposed on the substrate in correspondence to multiple touch inspection points and arranged along an inspection trajectory. An inspection method for a touch panel is also provided.

Abstract: A MEMS capacitance microphone includes a substrate, a diaphragm, a back plate structure and a plurality of support structures. The substrate is provided with a plurality of gate structures and a cavity penetrating through the substrate, and the gate structures extend from an inner wall of the cavity to the center of the cavity. The diaphragm is vibratably arranged on one side of the substrate and includes a main deformation zone and a non-main deformation zone. The back plate structure is arranged on the diaphragm, and the diaphragm is located between the substrate and the back plate structure. The support structures are arranged on the back plate structure, penetrate the periphery of the main deformation zone, and respectively abut against the gate structures. The MEMS capacitance microphone has higher rigidity of a back plate, and is capable of greatly reducing the impedance of air to increase its signal-to-noise ratio.

Abstract: A tin (Sn) auto-filling device and system provided to provide new liquid Sn to an inner sidewall surface of a rotation crucible. A laser is exposed to the liquid Sn at the inner sidewall surface of the rotation crucible to generate extreme-ultraviolet-light (EUV) that is utilized to process workpieces within a semiconductor manufacturing plant (FAB). The auto-filling device automatically refills as the liquid Sn at the inner sidewall surface of the rotation crucible is consumed due to the liquid Sn at the inner sidewall surface of the rotation crucible being exposed to the laser.

Abstract: A semiconductor device includes a first channel region disposed over a substrate, and a first gate structure disposed over the first channel region. The first gate structure includes a gate dielectric layer disposed over the channel region, a lower conductive gate layer disposed over the gate dielectric layer, a ferroelectric material layer disposed over the lower conductive gate layer, and an upper conductive gate layer disposed over the ferroelectric material layer. The ferroelectric material layer is in direct contact with the gate dielectric layer and the lower gate conductive layer, and has a U-shape cross section.

Abstract: The present invention relates to ligand-binding molecules that can bind to one or more growth factors including VEGF-A, VEGF-B, VEGF-C, VEGF-D, PIGF, PDGF-AA, PDGF-AB, PDGF-BB and PDGF-CC, and glycosylation-modified forms of the ligand-binding molecules, fusion proteins and compositions containing such ligand-binding molecules, as well as preparation methods and uses thereof.

Abstract: The present disclosure provides an automated system and a method for isolation and/or extracting substance by magnetic beads. With the preset program, sample isolation and the following assay such as PCR or Immunoprecipitation may be performed in single instrument of automated system.

Abstract: A laser produced plasma (LPP)-extreme ultraviolet (EUV) light source includes a vacuum chamber, a rotatable crucible disposed in the vacuum chamber with an annular inner surface for carrying a liquid metal, and a laser arranged to apply laser light to the liquid metal carried on the annular inner surface of the rotatable crucible to cause the liquid metal to emit EUV light. The LPP-EUV light source further includes a stationary component disposed in the vacuum chamber and positioned proximate to the annular inner surface of the rotatable crucible or surrounding the rotatable crucible, a coolant fluid delivery inlet or nozzle, and a cooling element secured with the stationary component and including a feature configured to operatively couple with coolant fluid delivered by the coolant fluid delivery inlet or nozzle.

Abstract: Disclosed is a display device including a display panel, a plurality of color blocks with different colors, a touch panel, and at least one birefringent material layer. The color blocks with different colors are distributed on the display panel. The touch panel is disposed on the color blocks with different colors. The birefringent material layer is disposed between the color blocks with different colors and the touch panel. After passing through the birefringent material layer, a light from the color blocks with different colors is divided into an ordinary light and an extraordinary light laterally shifted by a distance from the ordinary light.

Abstract: An EUV radiation source apparatus includes an EUV source vessel including a chamber; a crucible disposed in the chamber; a tin layer disposed on the crucible; a catcher disposed in the chamber and configured to collect fuel debris generated from a collision of the tin layer and a laser beam; a heat dissipation structure disposed over the catcher; and a venting system coupled to the EUV source vessel and communicable with the chamber. A method for generating EUV radiation includes: collecting fuel debris on a catcher disposed in a chamber of an EUV source vessel; dissipating heat from the catcher to the chamber; and venting a gas out of the EUV source vessel to cool the chamber to a decreased temperature through an opening disposed on the EUV source vessel.

Abstract: An EUV radiation source apparatus includes an EUV source vessel; a tin layer disposed in the EUV source vessel; a chamber disposed adjacent to the EUV source vessel; and a first filter disposed in the chamber, wherein the first filter includes a membrane and a mesh disposed on the membrane, and the membrane and the mesh are integrally formed. A method for generating EUV radiation includes: forming a first filter including a membrane and a mesh integrally formed with the membrane; disposing the first filter in a chamber adjacent to an EUV source vessel; and collecting fuel debris on the first filter in the chamber.

Abstract: A device includes a first conductive line as an input line. The device further includes a second conductive line as an output line, wherein the first conductive line and the second conductive line are in a same level of the integrated circuit. The device further includes a first passive isolation structure between the first conductive line and the second conductive line, wherein the first passive isolation structure and the second conductive line are each positioned at an integer multiple of an interval between the first conductive line and the first passive isolation structure.

Abstract: Disclosed is a boxing training system with a feedback function, including a training robot, a boxing glove assembly and a virtual reality device. The training robot performs a displacement movement. The boxing glove assembly is located on a user's hand and hits the training robot. The virtual reality device is electrically connected to the training robot and the boxing glove assembly, respectively. The virtual reality device is located at the user's eyes and displays a virtual image. The virtual image has a virtual opponent and a virtual boxing glove. When the virtual boxing glove hits the virtual opponent, the boxing glove assembly just hits the training robot.

Abstract: A method of modifying an integrated circuit layout includes determining whether a first conductive line and a second conductive line are subject to a parasitic capacitance above a parasitic capacitance threshold. The method further includes adjusting the integrated circuit layout by moving the first conductive line in the integrated circuit layout in response to determining to move the first conductive line. The method further includes inserting an isolation structure between the first and second conductive lines in the integrated circuit layout in response to determining not to move the first conductive line.

Abstract: A display device includes a light guide plate, a cover lens, a first optical layer, a second optical layer and a display. The light guide plate has a first surface and a second surface opposite to the first surface. The cover lens is disposed on the first surface of the light guide plate. The first optical layer is disposed between the first surface and the cover lens. The second optical layer is disposed between the first surface and the first optical layer. For visible light, a light absorption rate of the first optical layer is larger than or equal to a light absorption rate of the second optical layer. The display is disposed on the second surface of the light guide plate.

Abstract: A three-dimensional printing apparatus includes a liquid tank capable of accommodating a photosensitive liquid. The liquid tank includes a film, a plurality of side walls, a plate and a motor. The film has a workpiece curing area. The plurality of side walls surrounds the film. The plate is capable of supporting the film and having at least one fluid tunnel extending from a first surface of the plate contacting the film to a second surface of the plate. The motor is connected to the liquid tank to incline the liquid tank. A gap is formed between the plat and one of the plurality of side walls of the liquid tank, and the film is communicated with an outside space via the gap.

Abstract: An electronic device is provided. The electronic device includes a base and a conductive layer that is disposed on the base and patterned by a plurality of processes. The plurality of processes include providing a mask substrate. The mask substrate includes a first substrate and a patterned substrate. In the cross-sectional view, the width of the first substrate is greater than or equal to the width of the patterned substrate. The plurality of processes include arranging the mask substrate and the base correspondingly. The plurality of processes also include performing exposure and development processes on the conductive layer for patterning the conductive layer, and removing the mask substrate.