Patents by Inventor Chien-Hsiu Hsu

Chien-Hsiu Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070096652
    Abstract: A method for fabricating a step-formed patterned layer is provided. First, a first patterned photo-resist dry film is formed on a first material layer. Next, a second material layer is formed on the first material layer and covers the first patterned photo-resist dry film. A second patterned photo-resist dry film is then formed on a second material layer, and the patterns of the first patterned photo-resist dry film and the second patterned photo-resist dry film are different and the second patterned photo-resist dry film further exposes the second material layer over the first patterned photo-resist dry film. Subsequently, the first material layer and the second material layer are partially removed by using the first patterned photo-resist dry film and the second patterned photo-resist dry film as a mask. The first patterned photo-resist dry film and the second patterned photo-resist dry film are then removed.
    Type: Application
    Filed: October 28, 2005
    Publication date: May 3, 2007
    Inventors: Chao-Jen Chang, Wen-Yu Liu, Chien-Hsiu Hsu, Lu-Yi Yang