Patents by Inventor Chien-Hung SUNG

Chien-Hung SUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10239183
    Abstract: A chemical mechanical polishing pad includes a base portion and a polishing portion. The base portion has opposite first and second side surfaces. The polishing portion extends from the first side surface away from the second side surface, has a polishing surface facing away from the base portion, and has at least one trench formed in the polishing surface. Each of the trenches has an opening defined by the polishing surface. A horizontal width of the opening of each of the trenches is equal to or smaller than that of the remaining portion of the trench. The chemical mechanical polishing pad is made by laminating a plurality of polymer layers.
    Type: Grant
    Filed: February 1, 2017
    Date of Patent: March 26, 2019
    Assignee: SLH TECHNOLOGY CO., LTD.
    Inventors: Chien-Hung Sung, Kuan-Ting Lin
  • Publication number: 20180043499
    Abstract: A chemical mechanical polishing pad includes a base portion and a polishing portion. The base portion has opposite first and second side surfaces. The polishing portion extends from the first side surface away from the second side surface, has a polishing surface facing away from the base portion, and has at least one trench formed in the polishing surface. Each of the trenches has an opening defined by the polishing surface. A horizontal width of the opening of each of the trenches is equal to or smaller than that of the remaining portion of the trench. The chemical mechanical polishing pad is made by laminating a plurality of polymer layers.
    Type: Application
    Filed: February 1, 2017
    Publication date: February 15, 2018
    Inventors: Chien-Hung SUNG, Kuan-Ting LIN