Patents by Inventor Chien-Hung TSENG

Chien-Hung TSENG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alignment method and associated metrology device
    Patent number: 11372343
    Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.
    Type: Grant
    Filed: February 14, 2020
    Date of Patent: June 28, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Henricus Martinus Johannes Van De Groes, Johannes Hubertus Antonius Van De Rijdt, Marcel Pieter Jacobus Peeters, Chien-Hung Tseng, Henricus Petrus Maria Pellemans
  • ALIGNMENT METHOD AND ASSOCIATED METROLOGY DEVICE
    Publication number: 20220100107
    Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.
    Type: Application
    Filed: February 14, 2020
    Publication date: March 31, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Henricus Martinus Johannes VAN DE GROES, Johannes Hubertus Antonius VAN DE RIJDT, Marcel Pieter Jacobus PEETERS, Chien-Hung TSENG, Henricus Petrus Maria PELLEMANS
  • Metrology method and apparatus and associated computer product
    Patent number: 10551750
    Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus.
    Type: Grant
    Filed: April 24, 2019
    Date of Patent: February 4, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Adam Jan Urbanczyk, Hans Van Der Laan, Grzegorz Grzela, Alberto Da Costa Assafrao, Chien-Hung Tseng, Jay Jianhui Chen
  • Metrology Method and Apparatus and Associated Computer Product
    Publication number: 20190250520
    Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus.
    Type: Application
    Filed: April 24, 2019
    Publication date: August 15, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Adam Jan URBANCZYK, Hans VAN DER LAAN, Grzegorz GRZELA, Alberto DA COSTA ASSAFRAO, Chien-Hung TSENG, Jay Jianhui CHEN
  • Metrology method and apparatus and associated computer product
    Patent number: 10310388
    Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus. The method comprises: comparing measured target response spectral sequence data relating to the measurement response of actual targets to equivalent reference target response sequence data relating to a measurement response of the targets as designed; and performing a process monitoring action based on the comparison of said measured target response sequence data and reference target response sequence data. The method may also comprise determining stack parameters from the measured target response spectral sequence data and reference target response spectral sequence data.
    Type: Grant
    Filed: January 19, 2018
    Date of Patent: June 4, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Adam Urbanczyk, Hans Van Der Laan, Grzegorz Grzela, Alberto Da Costa Assafrao, Chien-Hung Tseng, Jay Jianhui Chen
  • Method and device for focusing in an inspection system
    Patent number: 10107761
    Abstract: An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: October 23, 2018
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Yevgeniy Konstantinovich Shmarev, Stanislav Smirnov, Chien-Hung Tseng, Armand Eugene Albert Koolen
  • Metrology Method and Apparatus and Associated Computer Product
    Publication number: 20180217508
    Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus. The method comprises: comparing measured target response spectral sequence data relating to the measurement response of actual targets to equivalent reference target response sequence data relating to a measurement response of the targets as designed; and performing a process monitoring action based on the comparison of said measured target response sequence data and reference target response sequence data. The method may also comprise determining stack parameters from the measured target response spectral sequence data and reference target response spectral sequence data.
    Type: Application
    Filed: January 19, 2018
    Publication date: August 2, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Adam URBANCZYK, Hans Van Der Laan, Grzegorz Grzela, Alberto Da Costa Assafrao, Chien-Hung Tseng, Jay Jianhui Chen
  • METHOD AND DEVICE FOR FOCUSING IN AN INSPECTION SYSTEM
    Publication number: 20170191944
    Abstract: An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.
    Type: Application
    Filed: December 21, 2016
    Publication date: July 6, 2017
    Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.
    Inventors: Yevgeniy Konstantinovich SHMAREV, Stanislav SMIRNOV, Chien-Hung TSENG, Armand Eugene Albert KOOLEN