Patents by Inventor Chien-Hung Wang
Chien-Hung Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240342745Abstract: A method of preventing drippage in a liquid dispensing system includes generating at least a first proxy signal representing at least a first indirect measure of a position of a first automatic control valve (ACV), wherein the first ACV has positions ranging from fully closed to fully open. The method further includes recognizing, based on at least the first proxy signal, whether a failure state exists in which the first ACV has failed to close. The method further includes causing a second ACV to close when the failure state exists, wherein the second ACV is fluidically connected to the first ACV, and the second ACV has positions ranging from fully closed to fully open.Type: ApplicationFiled: June 27, 2024Publication date: October 17, 2024Inventors: Chien-Hung WANG, Chun-Chih LIN, Chi-Hung LIAO, Yung-Yao LEE, Wei Chang CHENG
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Patent number: 12048944Abstract: A method of preventing drippage in a fluid dispensing system. The fluid dispensing system includes a first automatic control valve (ACV), an input of the first ACV connected to fluid-source of fluid, the first ACV having positions ranging from fully closed to fully open, and a second ACV, an input of the second ACV being connected to an output of the first ACV, and an output of the second ACV being connected to a nozzle, the second ACV having positions ranging from fully closed to fully open. The method includes generating a first proxy signal representing at least a first indirect measure of a position of the first ACV. The method includes recognizing, based on at least the first proxy signal that a failure state exists in which the first ACV has failed to close. The method includes causing the second ACV to close when the failure state exists.Type: GrantFiled: October 5, 2020Date of Patent: July 30, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chien-Hung Wang, Chun-Chih Lin, Chi-Hung Liao, Yung-Yao Lee, Wei Chang Cheng
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Patent number: 11130107Abstract: A method includes mixing a first deionized water (DI) water from a first pipe and a second DI water from a second pipe in a merging pipe that is in fluid communication with the first pipe and the second pipe. An electrical resistivity of the first DI water is different from an electrical resistivity of the second DI water. A mixture of the first DI water and the second DI water is applied from the merging pipe onto a wafer.Type: GrantFiled: November 4, 2019Date of Patent: September 28, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chi-Hung Liao, Wei-Chang Cheng, Chien-Hung Wang
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Patent number: 11035619Abstract: A drainage device includes a tank, a pipe and an air duct. The tank has a base plate and at least one first wall. The first wall is disposed on the base plate. The base plate and the first wall define a space. The pipe defines a channel. The pipe connects with the base plate. The channel communicates with the space. The air duct is disposed partially in the space and partially in the channel. There exists at least one gap between an outer surface of the air duct and an inner surface of the pipe.Type: GrantFiled: March 29, 2017Date of Patent: June 15, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Wei-Chang Cheng, Chi-Hung Liao, Chien-Hung Wang, Guan-Yu Lin, Yung-Yao Lee
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Publication number: 20210016316Abstract: A method of preventing drippage in a fluid dispensing system. The fluid dispensing system includes a first automatic control valve (ACV), an input of the first ACV connected to fluid-source of fluid, the first ACV having positions ranging from fully closed to fully open, and a second ACV, an input of the second ACV being connected to an output of the first ACV, and an output of the second ACV being connected to a nozzle, the second ACV having positions ranging from fully closed to fully open. The method includes generating a first proxy signal representing at least a first indirect measure of a position of the first ACV. The method includes recognizing, based on at least the first proxy signal that a failure state exists in which the first ACV has failed to close. The method includes causing the second ACV to close when the failure state exists.Type: ApplicationFiled: October 5, 2020Publication date: January 21, 2021Inventors: Chien-Hung WANG, Chun-Chih LIN, Chi-Hung LIAO, Yung-Yao LEE, Wei Chang CHENG
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Patent number: 10792697Abstract: A drippage prevention system including: a first automatic control valve (ACV), an input of the first ACV fluidically connected to a source of fluid to be dispensed, the first ACV having a position ranging from fully closed to fully open; a second ACV, an input of the second ACV being fluidically connected to the output of the first ACV, and an output of the second ACV being fluidically connected to a nozzle, the second ACV having positions ranging from fully closed to fully open; a proxy sensor configured to generate a proxy signal representing an indirect measure of a position of the first ACV; and a controller electrically connected to the first and second ACVs and the proxy sensor, the controller being configured to cause the second ACV to close based on the proxy signal and thereby stop flow of the liquid to the nozzle.Type: GrantFiled: May 17, 2017Date of Patent: October 6, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chien-Hung Wang, Chun-Chih Lin, Chi-Hung Liao, Yung-Yao Lee, Wei Chang Cheng
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Publication number: 20200061559Abstract: A method includes mixing a first deionized water (DI) water from a first pipe and a second DI water from a second pipe in a merging pipe that is in fluid communication with the first pipe and the second pipe. An electrical resistivity of the first DI water is different from an electrical resistivity of the second DI water. A mixture of the first DI water and the second DI water is applied from the merging pipe onto a wafer.Type: ApplicationFiled: November 4, 2019Publication date: February 27, 2020Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chi-Hung LIAO, Wei-Chang CHENG, Chien-Hung WANG
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Patent number: 10464032Abstract: A system for providing deionized (DI) water with a dynamic electrical resistivity is provided. The system includes plural DI water sources, source pipes, flow control devices, a merging pipe and a flow controller. The DI water sources respectively have different electrical resistivities. The source pipes are respectively connected to the DI water sources in a one-to-one manner. The flow control devices are respectively disposed in the source pipes in a one-to-one manner. The merging pipe joins the source pipes. The flow controller includes a resistivity sensor disposed in the merging pipe, and the flow controller is configured to control a flowrate of the DI water through the source pipes.Type: GrantFiled: June 20, 2017Date of Patent: November 5, 2019Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chi-Hung Liao, Wei-Chang Cheng, Chien-Hung Wang
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Publication number: 20180333738Abstract: A drippage prevention system including: a first automatic control valve (ACV), an input of the first ACV fluidically connected to a source of fluid to be dispensed, the first ACV having a position ranging from fully closed to fully open; a second ACV, an input of the second ACV being fluidically connected to the output of the first ACV, and an output of the second ACV being fluidically connected to a nozzle, the second ACV having positions ranging from fully closed to fully open; a proxy sensor configured to generate a proxy signal representing an indirect measure of a position of the first ACV; and a controller electrically connected to the first and second ACVs and the proxy sensor, the controller being configured to cause the second ACV to close based on the proxy signal and thereby stop flow of the liquid to the nozzle.Type: ApplicationFiled: May 17, 2017Publication date: November 22, 2018Inventors: Chien-Hung WANG, Chun-Chih LIN, Chi-Hung LIAO, Yung-Yao LEE, Wei Chang CHENG
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Publication number: 20180304215Abstract: A system for providing deionized (DI) water with a dynamic electrical resistivity is provided. The system includes plural DI water sources, source pipes, flow control devices, a merging pipe and a flow controller. The DI water sources respectively have different electrical resistivities. The source pipes are respectively connected to the DI water sources in a one-to-one manner. The flow control devices are respectively disposed in the source pipes in a one-to-one manner. The merging pipe joins the source pipes. The flow controller includes a resistivity sensor disposed in the merging pipe, and the flow controller is configured to control a flowrate of the DI water through the source pipes.Type: ApplicationFiled: June 20, 2017Publication date: October 25, 2018Inventors: Chi-Hung LIAO, Wei-Chang CHENG, Chien-Hung WANG
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Publication number: 20180164839Abstract: A drainage device includes a tank, a pipe and an air duct. The tank has a base plate and at least one first wall. The first wall is disposed on the base plate. The base plate and the first wall define a space. The pipe defines a channel. The pipe connects with the base plate. The channel communicates with the space. The air duct is disposed partially in the space and partially in the channel. There exists at least one gap between an outer surface of the air duct and an inner surface of the pipe.Type: ApplicationFiled: March 29, 2017Publication date: June 14, 2018Inventors: Wei-Chang Cheng, Chi-Hung Liao, Chien-Hung Wang, Guan-Yu Lin, Yung-Yao Lee
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Patent number: 9814097Abstract: A baking apparatus for priming a substrate is provided, which includes a chamber, a hot plate and a barrier element. The hot plate is in the chamber and configured to bake the substrate on the hot plate. The barrier element is in contact with a periphery of the substrate and the hot plate to prevent contamination on a lower surface of the substrate. Another baking apparatus for priming a substrate is also provided, which includes a chamber and a hot plate. The hot plate is in the chamber and in full contact with a lower surface of the substrate to prevent contamination thereon.Type: GrantFiled: April 14, 2014Date of Patent: November 7, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chien-Hung Wang, Ren-Jyh Leu, Shang-Wern Chang, Heng-Hsin Liu
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Publication number: 20150296563Abstract: A baking apparatus for priming a substrate is provided, which includes a chamber, a hot plate and a barrier element. The hot plate is in the chamber and configured to bake the substrate on the hot plate. The barrier element is in contact with a periphery of the substrate and the hot plate to prevent contamination on a lower surface of the substrate. Another baking apparatus for priming a substrate is also provided, which includes a chamber and a hot plate. The hot plate is in the chamber and in full contact with a lower surface of the substrate to prevent contamination thereon.Type: ApplicationFiled: April 14, 2014Publication date: October 15, 2015Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chien-Hung WANG, Ren-Jyh LEU, Shang-Wern CHANG, Heng-Hsin LIU
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Patent number: 6788047Abstract: An IC tester system for eliminating electrostatic discharge damage. The IC tester system includes a temperature control oven and an IC test board. The IC test board contacts a dummy conducting wire and a grounding interface for grounding out the electrostatic discharge (ESD) generated during the loading and unloading of the test board through thermal-insulated rubber installed in the door of the oven.Type: GrantFiled: April 3, 2003Date of Patent: September 7, 2004Assignee: United Microelectronics Corp.Inventor: Chien-Hung Wang