Abstract: The present application provides an optical device and a method of fabricating the same. The optical device include a semiconductor stack structure, an anti-reflective film and a highly-reflective film. The semiconductor stack structure is configured to generate a laser beam and emit the laser beam from its front facet while receiving an electric current. The anti-reflective film is disposed on the front facet of the semiconductor stack structure and configured to increase the transmittance (reduce a reflectivity) of the front facet to the laser beam. The highly-reflective film is disposed on a rear facet of the semiconductor stack structure and is configured to reduce a loss (increase a reflectivity) of the laser beam transmitted to the rear facet. The anti-reflective film and the highly-reflective film respectively have refractive indices greater than 2, and the highly-reflective film has a thickness greater than that of the anti-reflective film.

Abstract: The present invention relates to an atomic resolution deformation distribution measurement device that can measure a deformation rate of an atomic scale with low expense by improving resolution using an AFM system, and the atomic resolution deformation distribution measurement device includes: a laser source generating a laser beam; a first cantilever and a second cantilever provided close to a measurement specimen or a reference specimen to cause deformation by an atomic force; an optical system controlling a light path of the laser beam so as to cause the laser beam to be sequentially reflected to the first cantilever and the second cantilever and locate the first cantilever and the second cantilever to an image point; a measurement unit measuring the laser beam reflected from the second cantilever; and a stage on which a measurement specimen or a reference specimen is located and movable in X, Y, and Z axis directions.

Abstract: The present invention relates to an atomic resolution deformation distribution measurement device that can measure a deformation rate of an atomic scale with low expense by improving resolution using an AFM system, and the atomic resolution deformation distribution measurement device includes: a laser source generating a laser beam; a first cantilever and a second cantilever provided close to a measurement specimen or a reference specimen to cause deformation by an atomic force; an optical system controlling a light path of the laser beam so as to cause the laser beam to be sequentially reflected to the first cantilever and the second cantilever and locate the first cantilever and the second cantilever to an image point; a measurement unit measuring the laser beam reflected from the second cantilever; and a stage on which a measurement specimen or a reference specimen is located and movable in X, Y, and Z axis directions.