Abstract: In some embodiments, an image sensor is provided. The image sensor includes a photodetector disposed in a semiconductor substrate. A wave guide filter having a substantially planar upper surface is disposed over the photodetector. The wave guide filter includes a light filter disposed in a light filter grid structure. The light filter includes a first material that is translucent and has a first refractive index. The light filter grid structure includes a second material that is translucent and has a second refractive index less than the first refractive index.

Abstract: An integrated circuit (IC) structure includes a substrate having several regions, several semiconductor devices formed at the substrate and respectively within the regions, and an ultra-deep (UD) trench isolation structure formed in the substrate. The substrate has a top surface and a bottom surface oppositely, and the UD trench isolation structure formed in the substrate surrounds peripheries of each of the regions for structurally and physically isolating the semiconductor devices within different regions. The UD trench isolation structure penetrates the substrate by extending from the top surface of the substrate to the bottom surface of the substrate.

Abstract: An integrated circuit (IC) structure includes a substrate having several regions, several semiconductor devices formed at the substrate and respectively within the regions, and an ultra-deep (UD) trench isolation structure formed in the substrate. The substrate has a top surface and a bottom surface oppositely, and the UD trench isolation structure formed in the substrate surrounds peripheries of each of the regions for structurally and physically isolating the semiconductor devices within different regions. The UD trench isolation structure penetrates the substrate by extending from the top surface of the substrate to the bottom surface of the substrate.

Abstract: An integrated circuit (IC) structure includes a substrate having several regions, several semiconductor devices formed at the substrate and respectively within the regions, and an ultra-deep (UD) trench isolation structure formed in the substrate. The substrate has a top surface and a bottom surface oppositely, and the UD trench isolation structure formed in the substrate surrounds peripheries of each of the regions for structurally and physically isolating the semiconductor devices within different regions. The UD trench isolation structure penetrates the substrate by extending from the top surface of the substrate to the bottom surface of the substrate.

Abstract: An integrated circuit (IC) structure includes a substrate having several regions, several semiconductor devices formed at the substrate and respectively within the regions, and an ultra-deep (UD) trench isolation structure formed in the substrate. The substrate has a top surface and a bottom surface oppositely, and the UD trench isolation structure formed in the substrate surrounds peripheries of each of the regions for structurally and physically isolating the semiconductor devices within different regions. The UD trench isolation structure penetrates the substrate by extending from the top surface of the substrate to the bottom surface of the substrate.

Abstract: An integrated circuit (IC) structure includes a substrate having several regions, several semiconductor devices formed at the substrate and respectively within the regions, and an ultra-deep (UD) trench isolation structure formed in the substrate. The substrate has a top surface and a bottom surface oppositely, and the UD trench isolation structure formed in the substrate surrounds peripheries of each of the regions for structurally and physically isolating the semiconductor devices within different regions. The UD trench isolation structure penetrates the substrate by extending from the top surface of the substrate to the bottom surface of the substrate.

Abstract: An integrated circuit (IC) structure includes a substrate having several regions, several semiconductor devices formed at the substrate and respectively within the regions, and an ultra-deep (UD) trench isolation structure formed in the substrate. The substrate has a top surface and a bottom surface oppositely, and the UD trench isolation structure formed in the substrate surrounds peripheries of each of the regions for structurally and physically isolating the semiconductor devices within different regions. The UD trench isolation structure penetrates the substrate by extending from the top surface of the substrate to the bottom surface of the substrate.

Abstract: An integrated circuit (IC) structure includes a substrate having several regions, several semiconductor devices formed at the substrate and respectively within the regions, and an ultra-deep (UD) trench isolation structure formed in the substrate. The substrate has a top surface and a bottom surface oppositely, and the UD trench isolation structure formed in the substrate surrounds peripheries of each of the regions for structurally and physically isolating the semiconductor devices within different regions. The UD trench isolation structure penetrates the substrate by extending from the top surface of the substrate to the bottom surface of the substrate.

Abstract: An integrated circuit (IC) structure includes a substrate having several regions, several semiconductor devices formed at the substrate and respectively within the regions, and an ultra-deep (UD) trench isolation structure formed in the substrate. The substrate has a top surface and a bottom surface oppositely, and the UD trench isolation structure formed in the substrate surrounds peripheries of each of the regions for structurally and physically isolating the semiconductor devices within different regions. The UD trench isolation structure penetrates the substrate by extending from the top surface of the substrate to the bottom surface of the substrate.

Abstract: In a process of forming a seed layer, particularly in a vertical trench or via, a semiconductor substrate having a dielectric structure and a hard mask structure thereon is provided. An opening is formed in the hard mask structure, and a trench or via is formed in the dielectric structure in communication with the opening, wherein an area of the opening is greater than that of an entrance of the trench or via. A seed layer is then deposited in the trench or via through the opening, and then subjected to a reflow process.

Abstract: A power supply topology with pulse width modulation frequency control allows the use of an inductor with higher inductance in a converter. By controlling the switching frequency of the pulse width modulation signal, the inductor can achieve high efficiency during a light load condition and is also suitable for a heavy load condition.

Abstract: A power supply topology with pulse width modulation frequency control allows the use of an inductor with higher inductance in a converter. By controlling the switching frequency of the pulse width modulation signal, the inductor can achieve high efficiency during a light load condition and is also suitable for a heavy load condition.

Abstract: A super battery module is constructed to include a plurality of contacts connected to corresponding contacts of a mobile electronic apparatus for receiving external charging power or providing working power to the mobile electronic apparatus, a protection circuit module connected to the contacts to protect the super battery module against damage, a super capacity connected to the protection circuit module to provide a buffering effect so as to let the super battery module be charged by an external charging power under the protection of the protection circuit module and to absorb impact current during operation of the mobile electronic apparatus after the super battery module charged to the saturated status, and a battery cell connected to the protection circuit module and the super capacity for charging by an external charging power under the protection of the protection circuit module and for providing a working power to the mobile electronic apparatus when charged to the saturated status.

Abstract: A safety syringe comprises a barrel having a grip lug with two fitting holes and two retaining holes communicating with each other; an elastic lashing member capable of retracting elastically and inwards, and having two locating pillars which are provided with an arresting head being retained in the retaining holes of the barrel, two slide confining portions being disposed at each side; a plunger having two slide pieces; a needle holder being caught and pulled by the plunger, and fitting a needle set. In use, the slide pieces of the plunger are confined by the slide confining portion of the elastic lashing member such that the plunger can not be turned. The plunger arrives at the bottom in the wake of injection such that the plunger is not confined by the elastic lashing member, and that the plunger can be thus turned to actuate the needle holder and drawn into the interior of the barrel by the plunger.

Abstract: A safety syringe comprises a barrel having a grip lug with two fitting holes and two retaining holes communicating with each other; an elastic lashing member capable of retracting elastically and inwards, and having two locating pillars which are provided with an arresting head being retained in the retaining holes of the barrel, two slide confining portions being disposed at each side; a plunger having two slide pieces; a needle holder being caught and pulled by the plunger, and fitting a needle set. In use, the slide pieces of the plunger are confined by the slide confining portion of the elastic lashing member such that the plunger can not be turned. The plunger arrives at the bottom in the wake of injection such that the plunger is not confined by the elastic lashing member, and that the plunger can be thus turned to actuate the needle holder and drawn into the interior of the barrel by the plunger.

Abstract: A safety syringe comprises a barrel having a retaining block disposed in the receiving hole, an initial stop portion and a final stop portion disposed in the end edge thereof, and a rotation resisting portion; a needle holder disposed in the barrel, and having a retaining groove and communicating with a port, a rotation stopping rod corresponding between the initial stop portion and the final stop portion of the barrel, overcoming portion capable of passing the rotation resisting portion of the barrel; and a plunger capable of catching and turning the needle holder. As the plunger is not engaged with the needle holder, the retaining groove of the needle holder confines the retaining block of the barrel.

Abstract: A hypodermic syringe comprises a barrel having at least one catching piece disposed at the end; an outer sleeve fitted rotatably with the barrel to turn to locate at the first position and the second position and provided at least one escape hole; a needle holder having a cylinder cooperating portion disposed slidably in the receiving hole of the barrel, a retaining circular groove disposed in the outer periphery of the needle holder for retaining the catching piece of the barrel; a plunger having a rod body capable of pulling back the needle holder. As the outer sleeve is turned to the first position, each catching piece of the barrel retains the retaining tooth of the barrel. The needle holder is unable to displace. As the outer sleeve is turned to the second position, the escape hole is corresponding to the catching piece of the barrel to eject outward. The needle holder is not confined so as to be pulled back by the plunger.

Abstract: A safety hypodermic syringe includes a barrel having a receiving hole, a needle holder slidably and controllably disposed therein and having an insertion hole, an inner tapered hole, a pull stop edge located between the insertion hole and the inner tapered hole, and a liquid transporting hole in communication with a hypodermic needle; a plunger having a rod body, a connection head of a conical shape cooperative with the inner tapered hole, two claws capable of retaining the pull stop edge of the needle holder, and two notches formed in opposite inner side of each claw; wherein the plunger and the needle holder are in intimate cooperation to provide a minimum residue of liquid drug, the claws serving to catch and pull the pull stop edge of the needle holder, so as to enable the plunger to draw the needle holder and the hypodermic needle into the receiving hole of said barrel.