Patent number: 7799927
Abstract: An indolestyryl compound. The indolestyryl compound has formula (I): wherein Z1 comprises benzene, naphthalene, or heterocyclic ring containing O, S, or N, R2 comprises H, halogen atoms, C1-5 alkyl, nitro, ester, carboxyl, sulfo, sulfonamide, sulfuric ester, amide, C1-3 alkoxy, amino, alkylamino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R3, R4, R5, and R6 comprise H, alkyl, aralkyl, or heterocyclic ring containing O, S, or N, R7 and R8 comprise H or alkyl, R10 comprises H, alkyl, halogen atoms, nitro, hydroxyl, amino, ester, or substituted or non-substituted sulfonyl, W comprises carbon or nitrogen, Y comprises carbon, oxygen, sulfur, selenium, —NR, or —C(CH3)2, m is 1˜3, and X1 comprises an anionic group or an anionic organometallic complex, wherein R3 and R4 are joined to a nitrogen atom or R5 and R6 are joined together to form a ring, and R bonded to nitrogen is C1-5 alkyl.
Type:
Grant
Filed:
April 26, 2006
Date of Patent:
September 21, 2010
Assignee:
Industrial Technology Research Institute
Inventors:
Shin-Shin Wang, Chien-Wen Chen, Jong-Lieh Yang, Chii-Chang Lai, Hui-Ping Tsai, Wen-Ping Chu, Wen-Yih Liao, Chien-Liang Huang, Tzuan-Ren Jeng, Ching-Yu Hsieh, An-Tse Lee
Patent number: 7598359
Abstract: A bis(indolestyryl) compound. The bis(indolestyryl) compound has formula (I): wherein A and B comprise benzene, naphthalene, or heterocyclic ring containing O, S, or N, R1 and R1? are H, halogen, C1-5 alkyl, nitro, ester, carboxyl, sulfo, sulfonamide, amide, sulfo ester, C1-3 alkoxy, amino, alkylamino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R2, R2?, R3, and R3? comprise H, C1-6 alkyl, C6-18 aryl, C2-6 alkenyl, C3-6 cycloalkenyl, or C3-6 cycloalkyl, R4 is H, C1-5 alkyl, hydroxyl, halogen, or alkoxy, R5 and R5? comprise H, halogen, C1-5 alkyl, nitro, C1-3 alkoxy, amino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, W comprises oxygen, sulfur, selenium, —NR, or —C(CH3)2, n is 1˜18 and Z1 and Z2 are different and comprise an anion or an anionic organometallic complex with +1 or +2 valence, wherein R bonded to nitrogen is C1-4 alkyl.
Type:
Grant
Filed:
September 1, 2005
Date of Patent:
October 6, 2009
Assignee:
Industrial Technology Research Institute
Inventors:
Shin-Shin Wang, Jong-Lieh Yang, Chii-Chang Lai, Hui-Ping Tsai, Wen-Ping Chu, Chien-Wen Chen, Chien-Liang Huang, Wen-Yih Liao, Ming-Chia Lee
Patent number: 7598360
Abstract: A bisstyryl compound. The bisstyryl compound has formula (I): wherein Z1 and Z2 are benzene, naphthalene, or heterocyclic ring, R1 is H, C1-5 alkyl, hydroxyl, halogen atoms, or alkoxy, R2 is H, halogen atoms, C1-5 alkyl, nitro, ester, carboxyl, sulfo, sulfonamide, sulfuric ester, amide, C1-3 alkoxy, amino, alkylamino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R3, R4, R5, and R6 are H, halogen atoms, alkyl, aralkyl, or heterocyclic ring containing O, S, or N, or R3 and R4 are joined to a nitrogen atom or R5 and R6 are joined together to form a ring, R7 and R8 are H or alkyl, W is nitrogen with or without Z1 and Z2 or aromatic group without Z1 and Z2, Y is carbon, oxygen, sulfur, selenium, —NR, or —C(CH3)2, m is 1-3, n is 1-18, and X1 and X2 are anionic groups or anionic organometallic complexes.
Type:
Grant
Filed:
October 21, 2005
Date of Patent:
October 6, 2009
Assignee:
Industrial Technology Research Institute
Inventors:
Shin-Shin Wang, Chien-Wen Chen, Jong-Lieh Yang, Chii-Chang Lai, Hui-Ping Tsai, Wen-Ping Chu, Wen-Yih Liao, Chien-Liang Huang, Tzuan-Ren Jeng, Ching-Yu Hsieh, An-Tse Lee
Patent number: 7390549
Abstract: An asymmetric bis(indolestyryl) compound. The asymmetric bis(indolestyryl) compound has formula (I): wherein A and B comprise benzene, naphthalene, or heterocyclic ring containing O, S, or N, R1 and R1? are H, halogen atoms, C1-5 alkyl, nitro, ester, carboxyl, sulfo, C1-3 alkoxy, amine, alkylamine, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R2, R2?, R3, and R3? comprise H, C1-6 alkyl, C6-18 aryl, C2-6 alkenyl, C3-6 cycloalkenyl, or C3-6 cycloalkyl, or C3-6 cycloalkyl containing hetero atom, R4 is H, hydroxyl, halogen atoms, or alkoxy, R5 and R5? comprise H, halogen atoms, C1-5 alkyl, nitro, C1-3 alkoxy, amine, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, n is 1˜18, Y is C(R6R7), C1-3 alkylamino or hetero atom, R6 and R7 are C1-3 alkyl, and Z? is an anion or an anionic organometallic complex. The invention also provides a high density recording medium utilizing the asymmetric bis(indolestyryl) compound.
Type:
Grant
Filed:
June 17, 2005
Date of Patent:
June 24, 2008
Assignee:
Industrial Technology Research Institute
Inventors:
Shin-Shin Wang, Chii-Chang Lai, Hui-Ping Tsai, Chien-Liang Huang, Wen-Yih Liao, Ming-Chia Lee