Patents by Inventor Chien-Liang Yeh

Chien-Liang Yeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11955338
    Abstract: A method includes providing a substrate having a surface such that a first hard mask layer is formed over the surface and a second hard mask layer is formed over the first hard mask layer, forming a first pattern in the second hard mask layer, where the first pattern includes a first mandrel oriented lengthwise in a first direction and a second mandrel oriented lengthwise in a second direction different from the first direction, and where the first mandrel has a top surface, a first sidewall, and a second sidewall opposite to the first sidewall, and depositing a material towards the first mandrel and the second mandrel such that a layer of the material is formed on the top surface and the first sidewall but not the second sidewall of the first mandrel.
    Type: Grant
    Filed: January 30, 2023
    Date of Patent: April 9, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shih-Chun Huang, Ya-Wen Yeh, Chien-Wen Lai, Wei-Liang Lin, Ya Hui Chang, Yung-Sung Yen, Ru-Gun Liu, Chin-Hsiang Lin, Yu-Tien Shen
  • Patent number: 11951091
    Abstract: Disclosed herein is a complex, a contrast agent and the method for treating a disease related to CXCR4 receptor. The complex is configured to bind the CXCR4 receptor, and is used as a medicament for diagnosis and treatment of cancers and other indications related to the CXCR4 receptor.
    Type: Grant
    Filed: December 18, 2020
    Date of Patent: April 9, 2024
    Assignee: INSTITUTE OF NUCLEAR ENERGY RESEARCH, ATOMIC ENERGY COUNCIL, EXECUTIVE YUAN, R.O.C
    Inventors: Chien-Chung Hsia, Chung-Hsin Yeh, Cheng-Liang Peng, Chun-Tang Chen
  • Publication number: 20240090234
    Abstract: A magnetoresistive random access memory (MRAM) includes a first transistor and a second transistor on a substrate, a source line coupled to a first source/drain region of the first transistor, and a first metal interconnection coupled to a second source/drain region of the first transistor. Preferably, the first metal interconnection is extended to overlap the first transistor and the second transistor and the first metal interconnection further includes a first end coupled to the second source/drain region of the first transistor and a second end coupled to a magnetic tunneling junction (MTJ).
    Type: Application
    Filed: November 17, 2023
    Publication date: March 14, 2024
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Kuo-Hsing Lee, Sheng-Yuan Hsueh, Te-Wei Yeh, Chien-Liang Wu
  • Publication number: 20240085721
    Abstract: The eyeglasses includes a glasses frame and two temples. The glasses frame has two opposite ends. Each of the two temples has a front end connected pivotally to a respective one of the two opposite ends of the glasses frame. Each of the two temples have a section that is flexible so that, by applying lateral forces to the two temples, the temples are convertible between an outwardly curved state where rear ends of the two temples are spaced apart from each other at a first distance, and an inwardly curved state where the rear ends of the two temples are spaced apart from each other at a second distance that is smaller than the first distance.
    Type: Application
    Filed: January 3, 2023
    Publication date: March 14, 2024
    Inventors: David CHAO, Chien-Ho LIN, Chien-Liang YEH
  • Patent number: 11653720
    Abstract: Systems and methods for monitoring the quality of a surface treatment applied to an article in a manufacturing process are provided. A surface treatment may be applied to at least a portion of an article. A thermal profile of the article may be obtained and used to determine temperature indications of different regions of the article to which the surface treatment has been applied. A standard model of the article may be obtained that includes model regions having model temperature ranges. The temperature indications of the article can be compared with the model temperature ranges to determine if any temperature indications are outside of a corresponding model temperature range. The article may be a shoe part. The surface treatments may include the application of heat, plasma, dye, paint, primer, and/or the application of other materials, substances, and/or processes.
    Type: Grant
    Filed: May 19, 2021
    Date of Patent: May 23, 2023
    Assignee: NIKE, Inc.
    Inventors: Dragan Jurkovic, Chun-Wei Huang, Jen-Chuan Lin, Shih-Yuan Wu, Chih-Chun Chai, Ming-Ji Lee, Chien-Liang Yeh
  • Patent number: 11325146
    Abstract: Systems apply a material (e.g., adhesive) to an article (e.g., a component in an article of footwear) with a multiple-nozzle tool. A first nozzle of the multiple-nozzle tool is effective to provide an edge application of the material that is consistent in application of the material. A second nozzle of the multiple-nozzle tool is effective to provide a greater material coverage application than the first nozzle. The second nozzle may be implemented to apply the material at an interior area from the edge at which the first nozzle applies the material, in an exemplary aspect.
    Type: Grant
    Filed: August 3, 2020
    Date of Patent: May 10, 2022
    Assignee: NIKE, Inc.
    Inventors: Che-Sheng Chen, Chien-Liang Yeh
  • Publication number: 20220097083
    Abstract: A nozzle dispenses a material, such as an adhesive, primer, paint, or other coating, through a dispensing port on to a substrate. The spray pattern provided by the nozzle defines, at least in part, an application pattern of the material on to the substrate. An air mask port integral with the nozzle or a separate nozzle expels a mask stream of pressurized gas. The mask stream projects toward the substrate to aid in limiting an application of the material beyond an application line on the substrate. The air-mask port and the dispensing port may be moved relative to the substrate and/or the application line such that the mask stream provides a barrier to the material being applied.
    Type: Application
    Filed: December 10, 2021
    Publication date: March 31, 2022
    Inventors: Dragan Jurkovic, Che-Sheng Chen, Chien-Liang Yeh
  • Patent number: 11109645
    Abstract: Systems and methods for monitoring the quality of a surface treatment applied to an article in a manufacturing process are provided. A surface treatment may be applied to at least a portion of an article. A thermal profile of the article may be obtained and used to determine temperature indications of different regions of the article to which the surface treatment has been applied. A standard model of the article may be obtained that includes model regions having model temperature ranges. The temperature indications of the article can be compared with the model temperature ranges to determine if any temperature indications are outside of a corresponding model temperature range. The article may be a shoe part. The surface treatments may include the application of heat, plasma, dye, paint, primer, and/or the application of other materials, substances, and/or processes.
    Type: Grant
    Filed: May 25, 2018
    Date of Patent: September 7, 2021
    Assignee: NIKE, Inc.
    Inventors: Dragan Jurkovic, Chun-Wei Huang, Jen-Chuan Lin, Shih-Yuan Wu, Chih-Chun Chai, Ming-Ji Lee, Chien-Liang Yeh
  • Publication number: 20210267318
    Abstract: Systems and methods for monitoring the quality of a surface treatment applied to an article in a manufacturing process are provided. A surface treatment may be applied to at least a portion of an article. A thermal profile of the article may be obtained and used to determine temperature indications of different regions of the article to which the surface treatment has been applied. A standard model of the article may be obtained that includes model regions having model temperature ranges. The temperature indications of the article can be compared with the model temperature ranges to determine if any temperature indications are outside of a corresponding model temperature range. The article may be a shoe part. The surface treatments may include the application of heat, plasma, dye, paint, primer, and/or the application of other materials, substances, and/or processes.
    Type: Application
    Filed: May 19, 2021
    Publication date: September 2, 2021
    Inventors: Dragan Jurkovic, Chun-Wei Huang, Jen-Chuan Lin, Shih-Yuan Wu, Chih-Chun Chai, Ming-Ji Lee, Chien-Liang Yeh
  • Publication number: 20200360953
    Abstract: Systems apply a material (e.g., adhesive) to an article (e.g., a component in an article of footwear) with a multiple-nozzle tool. A first nozzle of the multiple-nozzle tool is effective to provide an edge application of the material that is consistent in application of the material. A second nozzle of the multiple-nozzle tool is effective to provide a greater material coverage application than the first nozzle. The second nozzle may be implemented to apply the material at an interior area from the edge at which the first nozzle applies the material, in an exemplary aspect.
    Type: Application
    Filed: August 3, 2020
    Publication date: November 19, 2020
    Inventors: Che-Sheng Chen, Chien-Liang Yeh
  • Publication number: 20180345300
    Abstract: A nozzle dispenses a material, such as an adhesive, primer, paint, or other coating, through a dispensing port on to a substrate. The spray pattern provided by the nozzle defines, at least in part, an application pattern of the material on to the substrate. An air mask port integral with the nozzle or a separate nozzle expels a mask stream of pressurized gas. The mask stream projects toward the substrate to aid in limiting an application of the material beyond an application line on the substrate. The air-mask port and the dispensing port may be moved relative to the substrate and/or the application line such that the mask stream provides a barrier to the material being applied.
    Type: Application
    Filed: April 27, 2018
    Publication date: December 6, 2018
    Inventors: Dragan Jurkovic, Che-Sheng Chen, Chien-Liang Yeh
  • Publication number: 20180343980
    Abstract: Systems and methods for monitoring the quality of a surface treatment applied to an article in a manufacturing process are provided. A surface treatment may be applied to at least a portion of an article. A thermal profile of the article may be obtained and used to determine temperature indications of different regions of the article to which the surface treatment has been applied. A standard model of the article may be obtained that includes model regions having model temperature ranges. The temperature indications of the article can be compared with the model temperature ranges to determine if any temperature indications are outside of a corresponding model temperature range. The article may be a shoe part. The surface treatments may include the application of heat, plasma, dye, paint, primer, and/or the application of other materials, substances, and/or processes.
    Type: Application
    Filed: May 25, 2018
    Publication date: December 6, 2018
    Inventors: Dragan Jurkovic, Chun-Wei Huang, Jen-Chuan Lin, Shih-Yuan Wu, Chih-Chun Chai, Ming-Ji Lee, Chien-Liang Yeh
  • Publication number: 20180147590
    Abstract: Systems apply a material (e.g., adhesive) to an article (e.g., a component in an article of footwear) with a multiple-nozzle tool. A first nozzle of the multiple-nozzle tool is effective to provide an edge application of the material that is consistent in application of the material. A second nozzle of the multiple-nozzle tool is effective to provide a greater material coverage application than the first nozzle. The second nozzle may be implemented to apply the material at an interior area from the edge at which the first nozzle applies the material, in an exemplary aspect.
    Type: Application
    Filed: November 28, 2017
    Publication date: May 31, 2018
    Inventors: CHE-SHENG CHEN, CHIEN-LIANG YEH
  • Patent number: 8529098
    Abstract: The present disclosure relates to light emitting diode (LED) devices and methods for fabricating the same. An LED device includes a housing adapted to combine a heat sink with a vapor chamber to form an enclosed space interposed therebetween. The LED device includes light emitting diode modules attached to the housing adjacent to the vapor chamber. The vapor chamber is adapted to uniformly disperse heat generated from the LED modules within the enclosed space to form a uniform temperature field on the heat sink to thereby provide effective heat dissipation.
    Type: Grant
    Filed: November 5, 2010
    Date of Patent: September 10, 2013
    Assignee: TSMC Solid State Lighting Ltd.
    Inventors: Hsiao-Wen Lee, Hsueh-Hung Fu, Jin-Hua Wang, Chien-Liang Yeh
  • Patent number: 8526277
    Abstract: A method for determining a type of an optical disk includes following steps. A laser beam of a first type is focused on a disk to generate a first optical reflection signal. A first spherical aberration estimate is generated according to the degree of dispersion and strength of the first optical reflection signal. A laser beam of a second type is focused on the disk to generate a second optical reflection signal. A second spherical aberration estimate is generated according to the degree of dispersion and strength of the second optical reflection signal. The type of the disk is determined based on the first spherical aberration estimate and the second spherical aberration estimate.
    Type: Grant
    Filed: March 4, 2011
    Date of Patent: September 3, 2013
    Assignee: Sunplus Technology Co., Ltd.
    Inventors: Wen-Chun Feng, Chien-Liang Yeh
  • Patent number: 8363516
    Abstract: The present invention discloses a method and an apparatus for compensating astigmatism in an optical storage system. Firstly, the optical storage system focuses on an optical disc and proceeds track seeking. While track seeking, the astigmatism compensator continues adjusting and an astigmatism index signal is also measured. At last, an optimal astigmatism compensated value of the astigmatism compensator is acquired based on the measured result of the astigmatism index signal.
    Type: Grant
    Filed: January 7, 2009
    Date of Patent: January 29, 2013
    Assignee: Sunplus Technology Co., Ltd.
    Inventors: Wen-Chun Feng, Chien-Liang Yeh
  • Patent number: 8233364
    Abstract: An optical disc identifying device includes an optical pickup head, a digital signal processor and a radio frequency amplifier. The optical pickup head has a plurality of laser diodes and a lens. During a start-up procedure, a non-blue laser diode of the optical pickup head is turned on to irradiate a loaded optical disc, thereby generating an electronic signal. The digital signal processor outputs a driving signal, thereby controlling a motor driver to move the lens in a focusing direction. The radio frequency amplifier receives the electronic signal during the movement of the lens, thereby generating a first signal. The digital signal processor includes a detecting unit for comparing the first signal with a slicing signal to generate a pulse signal, and determining whether the optical disc is a blue-ray disc or a non-blue-ray disc according to a pulse number of the pulse signal.
    Type: Grant
    Filed: September 3, 2010
    Date of Patent: July 31, 2012
    Assignee: Sunplus Technology Co., Ltd.
    Inventors: Wen-Chun Feng, Chien-Liang Yeh
  • Publication number: 20120113639
    Abstract: The present disclosure relates to light emitting diode (LED) devices and methods for fabricating the same. An LED device includes a housing adapted to combine a heat sink with a vapor chamber to form an enclosed space interposed therebetween. The LED device includes light emitting diode modules attached to the housing adjacent to the vapor chamber. The vapor chamber is adapted to uniformly disperse heat generated from the LED modules within the enclosed space to form a uniform temperature field on the heat sink to thereby provide effective heat dissipation.
    Type: Application
    Filed: November 5, 2010
    Publication date: May 10, 2012
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hsiao-Wen Lee, Hsueh-Hung Fu, Jin-Hua Wang, Chien-Liang Yeh
  • Patent number: 8154959
    Abstract: An optical storage system and a spherical aberration (SA) compensation apparatus and method thereof are provided. The SA compensation apparatus includes a microprocessor and a digital-signal-processor (DSP). The microprocessor repeatedly regulates a compensation value of an SA compensation driver in the optical-pickup-head (OPH) after the microprocessor has determined the type of an optical storage medium and before the OPH has focused on the optical storage medium. The DSP processes a plurality of electrical signals converted through the OPH whenever the microprocessor has regulated the compensation value of the SA compensation driver, so as to obtain width values of a plurality of focus-error (FE) signals. Accordingly, the microprocessor makes the SA compensation driver to drive an SA compensation unit according to the width values of the FE signals, so as to compensate an SA of the light point generated by the OPH and focused on the optical storage medium.
    Type: Grant
    Filed: December 25, 2008
    Date of Patent: April 10, 2012
    Assignee: Sunplus Technology Co., Ltd.
    Inventors: Wen-Chun Feng, Chien-Liang Yeh
  • Publication number: 20120075971
    Abstract: A method for determining a type of an optical disk includes following steps. A laser beam of a first type is focused on a disk to generate a first optical reflection signal. A first spherical aberration estimate is generated according to the degree of dispersion and strength of the first optical reflection signal. A laser beam of a second type is focused on the disk to generate a second optical reflection signal. A second spherical aberration estimate is generated according to the degree of dispersion and strength of the second optical reflection signal. The type of the disk is determined based on the first spherical aberration estimate and the second spherical aberration estimate.
    Type: Application
    Filed: March 4, 2011
    Publication date: March 29, 2012
    Applicant: SUNPLUS TECHNOLOGY CO., LTD.
    Inventors: Wen-Chun Feng, Chien-Liang Yeh