Abstract: A memory device and a manufacturing method thereof are provided. The memory device includes a magnetic tunneling junction (MTJ) and a spin Hall electrode (SHE). The MTJ includes a free layer, a reference layer and a barrier layer lying between the free layer and the reference layer. The SHE is in contact with the MTJ, and configured to convert a charge current to a spin current for programming the MTJ. The SHE is formed of an alloy comprising at least one heavy metal element and at least one light transition metal element. The heavy metal element is selected from metal elements with one or more valence electrons filling in 5d orbitals, and the light transition metal element is selected from transition metal elements with one or more valence electrons partially filling in 3d orbitals.

Abstract: A memory device and a manufacturing method thereof are provided. The memory device includes a magnetic tunneling junction (MTJ) and a spin Hall electrode (SHE). The MTJ includes a free layer, a reference layer and a barrier layer lying between the free layer and the reference layer. The SHE is in contact with the MTJ, and configured to convert a charge current to a spin current for programming the MTJ. The SHE is formed of an alloy comprising at least one heavy metal element and at least one light transition metal element. The heavy metal element is selected from metal elements with one or more valence electrons filling in 5 d orbitals, and the light transition metal element is selected from transition metal elements with one or more valence electrons partially filling in 3 d orbitals.

Abstract: A method for fabricating magnetoresistive random-access memory cells (MRAM) on a substrate is provided. The substrate is formed with a magnetic tunneling junction (MTJ) layer thereon. When the MTJ layer is etched to form the MRAM cells, there may be metal components deposited on a surface of the MRAM cells and between the MRAM cells by chemical reaction. The metal components are then removed by chemical reaction.

Abstract: A manufacturing method of a semiconductor device includes: forming a first dielectric layer on inductor traces, openings of the first dielectric layer exposing the inductor traces; disposing a buffer material on the first dielectric layer and the inductor traces in the openings; sequentially disposing an etch stop material and a ferromagnetic material on the buffer material; removing the ferromagnetic material from over the openings to form a core material layer covering a first area; removing the etch stop and buffer materials from the openings to form an etch stop layer and a buffer layer, where the etch stop and buffer layers cover a second area, the first area is smaller than and within the second area; forming a second dielectric layer on the first dielectric layer to embed the buffer, etch stop, and core material layers; and forming inductor vias extending through the first and second dielectric layers.

Abstract: An integrated circuit (IC) device includes a plurality of memory segments. Each memory segment includes a plurality of memory cells, and a local bit line electrically coupled to the plurality of memory cells and arranged on a first side of the IC device. The IC device further includes a global bit line electrically coupled to the plurality of memory segments, and arranged on a second side of the IC device. The second side is opposite the first side in a thickness direction of the IC device.

Abstract: An inductor includes a core and a conductive spiral wound around the core. The core includes a buffer layer, an etch stop layer, and a core material layer sequentially stacked. The core material layer includes a ferromagnetic material. A total area of a vertical projection of the core material layer is smaller than an area occupied by the etch stop layer. The vertical projection of the core material layer falls entirely on the etch stop layer. The etch stop layer horizontally protrudes with respect to the core material layer.

Abstract: An electronic device is provided. The electronic device includes an inductor and a dielectric layer. The inductor includes a first magnetic layer, a conductive trace over the first magnetic layer, and a second magnetic layer over the conductive trace. The dielectric layer includes a first portion between the second magnetic layer and an inclined surface of the first magnetic layer. A substantially constant distance between the second magnetic layer and the inclined surface of the first magnetic layer is defined by the dielectric layer.

Abstract: A method for fabricating magnetoresistive random-access memory cells (MRAM) on a substrate is provided. The substrate is formed with a magnetic tunneling junction (MTJ) layer thereon. When the MTJ layer is etched to form the MRAM cells, there may be metal components deposited on a surface of the MRAM cells and between the MRAM cells by chemical reaction. The metal components are then removed by chemical reaction.

Abstract: The disclosure describes embodiments of an apparatus including a first gas chromatograph including a fluid inlet, a fluid outlet, and a first temperature control. A controller is coupled to the first temperature control and includes logic to apply a first temperature profile to the first temperature control to heat, cool, or both heat and cool the first gas chromatograph. Other embodiments are disclosed and claimed.

Abstract: The disclosure describes embodiments of an apparatus including a first gas chromatograph including a fluid inlet, a fluid outlet, and a first temperature control. A controller is coupled to the first temperature control and includes logic to apply a first temperature profile to the first temperature control to heat, cool, or both heat and cool the first gas chromatograph. Other embodiments are disclosed and claimed.

Abstract: Methods and systems are disclosed for the detecting of whether a subject has a lung disorder such as asthma, tuberculosis or lung cancer. Monitoring the subject's health and prognosis is also disclosed.

Abstract: An apparatus and a method forming a semiconductor structure are provided. The method includes receiving a substrate; mounting the substrate to a polishing head with a side of the substrate facing a polishing pad, the polishing pad comprising a first region and a second region; grinding the substrate against the polishing pad; and adjusting a temperature of the first region and a temperature of the second region.

Abstract: The disclosure describes embodiments of an apparatus including a first gas chromatograph including a fluid inlet, a fluid outlet, and a first temperature control. A controller is coupled to the first temperature control and includes logic to apply a first temperature profile to the first temperature control to heat, cool, or both heat and cool the first gas chromatograph. Other embodiments are disclosed and claimed.

Abstract: The disclosure describes embodiments of an apparatus including a first gas chromatograph including a fluid inlet, a fluid outlet, and a first temperature control. A controller is coupled to the first temperature control and includes logic to apply a first temperature profile to the first temperature control to heat, cool, or both heat and cool the first gas chromatograph. Other embodiments are disclosed and claimed.

Abstract: Embodiments of an apparatus comprising a plurality of multiple-gas analysis devices positioned within a relevant area, each multiple-gas analysis device capable of detecting the presence, concentration, or both, of one or more gases. A data and control center is communicatively coupled to each of the plurality of multiple-gas analysis device, the data and control system including logic that, when executed, allows the data and control center to monitor readings from the plurality of multiple-gas analysis devices and if any readings indicate the presence of one or more contaminants, identifying the source of the contaminants based on the readings from the plurality of multiple-gas analysis devices.

Abstract: Embodiments of an apparatus comprising a plurality of multiple-gas analysis devices positioned within a relevant area, each multiple-gas analysis device capable of detecting the presence, concentration, or both, of one or more gases. A data and control center is communicatively coupled to each of the plurality of multiple-gas analysis device, the data and control system including logic that, when executed, allows the data and control center to monitor readings from the plurality of multiple-gas analysis devices and if any readings indicate the presence of one or more contaminants, identifying the source of the contaminants based on the readings from the plurality of multiple-gas analysis devices.

Abstract: Methods and systems are disclosed for the detecting of whether a subject has a lung disorder such as asthma, tuberculosis or lung cancer. Monitoring the subject's health and prognosis is also disclosed.

Abstract: Methods and systems are disclosed for the detecting of whether a subject has a lung disorder such as asthma, tuberculosis or lung cancer. Monitoring the subject's health and prognosis is also disclosed.

Abstract: A display mode conversion method applied to a display driving circuit is disclosed. The display driving circuit is switched between a first display mode and a second display mode. The display mode conversion method includes steps of: (a) finding a ratio setting when the second display mode displays a default brightness according to the default brightness under the first display mode; (b) when receiving a first mode switching command under the first display mode, gradually adjusting to the default brightness; (c) switching to the second display mode and maintaining displaying the default brightness according to the ratio setting; and (d) under the second display mode, gradually adjusting from the default brightness to a target brightness.

Abstract: The disclosure describes embodiments of an apparatus including a first gas chromatograph including a fluid inlet, a fluid outlet, and a first temperature control. A controller is coupled to the first temperature control and includes logic to apply a first temperature profile to the first temperature control to heat, cool, or both heat and cool the first gas chromatograph. Other embodiments are disclosed and claimed.