Patents by Inventor Chien-Ling Huang
Chien-Ling Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11934027Abstract: An optical system affixed to an electronic apparatus is provided, including a first optical module, a second optical module, and a third optical module. The first optical module is configured to adjust the moving direction of a first light from a first moving direction to a second moving direction, wherein the first moving direction is not parallel to the second moving direction. The second optical module is configured to receive the first light moving in the second moving direction. The first light reaches the third optical module via the first optical module and the second optical module in sequence. The third optical module includes a first photoelectric converter configured to transform the first light into a first image signal.Type: GrantFiled: June 21, 2022Date of Patent: March 19, 2024Assignee: TDK TAIWAN CORP.Inventors: Chao-Chang Hu, Chih-Wei Weng, Chia-Che Wu, Chien-Yu Kao, Hsiao-Hsin Hu, He-Ling Chang, Chao-Hsi Wang, Chen-Hsien Fan, Che-Wei Chang, Mao-Gen Jian, Sung-Mao Tsai, Wei-Jhe Shen, Yung-Ping Yang, Sin-Hong Lin, Tzu-Yu Chang, Sin-Jhong Song, Shang-Yu Hsu, Meng-Ting Lin, Shih-Wei Hung, Yu-Huai Liao, Mao-Kuo Hsu, Hsueh-Ju Lu, Ching-Chieh Huang, Chih-Wen Chiang, Yu-Chiao Lo, Ying-Jen Wang, Shu-Shan Chen, Che-Hsiang Chiu
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Patent number: 6926584Abstract: A DMHC (dual mode hybrid control) system and method which facilitates enhanced control in the delivery of polishing slurry to a CMP (chemical mechanical polishing) apparatus. The DMHC comprises a linear table and a PID (proportional integrated differential) controller operably connected to a slurry pump provided in a slurry flow conduit which delivers the polishing slurry to the CMP apparatus. A bubble trap and a flowmeter provided in the slurry flow conduit downstream of the slurry pump are operably connected to the PID controller, and the CMP apparatus is located downstream of the flowmeter.Type: GrantFiled: October 9, 2002Date of Patent: August 9, 2005Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chao-Jung Chang, Ping-Hsu Chen, Chin-Hsin Peng, Jui-Cheng Lo, Chien-Kuo Lu, Chien-Ling Huang
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Patent number: 6896304Abstract: An automatic sensing wafer blade for picking up wafers that is equipped with a sensor capable of self-diagnosing potential failure conditions of the blade and a method for using the wafer blade are described. The automatic sensing wafer blade is equipped with a V-shaped seal ring on a top surface, and a sensor of either a limit switch or a capacitance sensor for sensing the presence or absence of a wafer on top of the wafer blade. The automatic sensing wafer blade is further capable of self-diagnosing any potential failure conditions of the function of the wafer blade due to contaminating particles, or contaminating liquid on the wafer surface, or due to an aged or malfunctioning seal ring on top of the wafer blade.Type: GrantFiled: September 3, 2002Date of Patent: May 24, 2005Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Hsiao-Yi Li, Chin-Hsin Peng, Cheng-Shun Chan, Jiann-Sheng Chang, Chung-Hao Tseng, Chien-Ling Huang
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Publication number: 20050016467Abstract: A system and method which is capable of compensating for unintended elevations in process temperatures induced in a substrate during a semiconductor fabrication process in order to reduce or eliminate disparities in critical dimensions of device features. The system may be a plasma etching system comprising a process chamber containing an electrostatic chuck (ESC) for supporting a wafer substrate. A chiller outside the process chamber includes a main coolant chamber, which contains a main coolant fluid, as well as an compensation coolant chamber, which contains an compensation coolant fluid. A main circulation loop normally circulates the main coolant fluid from the main coolant chamber through the electrostatic chuck to maintain the chuck at a desired set point temperature.Type: ApplicationFiled: July 24, 2003Publication date: January 27, 2005Inventors: Yi-Li Hsiao, Mei-Sheng Zhou, Chin-Hsin Peng, Chien-Ling Huang, Tse-Yi Chen, Chun-Yi Lee, Hsueh-Chang Wu
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Patent number: 6843264Abstract: A new and improved, multi-phase pressure control valve for facilitating quick and accurate attainment and stabilization of gas pressure inside a semiconductor fabrication process chamber such as an etch chamber or CVD chamber. In one embodiment, the multi-phase pressure control valve is a butterfly-type valve which includes outer and inner vanes that independently control flow of gases from a process chamber to a vacuum pump. The larger-diameter outer vane stabilizes gas pressures within a large range, whereas the inner vane stabilizes pressure within a smaller range. In another embodiment, the multi-phase pressure control valve is a gate-type valve which may include a pivoting outer vane and an inner vane slidably disposed with respect to the outer vane for exposing a central gas flow opening in the outer vane.Type: GrantFiled: December 18, 2002Date of Patent: January 18, 2005Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chih-Tien Chang, Hsueh-Chang Wu, Sunny Wu, Chien-Ling Huang, Chin-Hsin Peng, Mei-Seng Zhou
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Publication number: 20040118464Abstract: A new and improved, multi-phase pressure control valve for facilitating quick and accurate attainment and stabilization of gas pressure inside a semiconductor fabrication process chamber such as an etch chamber or CVD chamber. In one embodiment, the multi-phase pressure control valve is a butterfly-type valve which includes outer and inner vanes that independently control flow of gases from a process chamber to a vacuum pump. The larger-diameter outer vane stabilizes gas pressures within a large range, whereas the inner vane stabilizes pressure within a smaller range. In another embodiment, the multi-phase pressure control valve is a gate-type valve which may include a pivoting outer vane and an inner vane slidably disposed with respect to the outer vane for exposing a central gas flow opening in the outer vane.Type: ApplicationFiled: December 18, 2002Publication date: June 24, 2004Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chih-Tien Chang, Hsueh-Chang Wu, Sunny Wu, Chien-Ling Huang, Chin-Hsin Peng, Mei-Seng Zhou
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Publication number: 20040072503Abstract: A DMHC (dual mode hybrid control) system and method which facilitates enhanced control in the delivery of polishing slurry to a CMP (chemical mechanical polishing) apparatus. The DMHC comprises a linear table and a PID (proportional integrated differential) controller operably connected to a slurry pump provided in a slurry flow conduit which delivers the polishing slurry to the CMP apparatus. A bubble trap and a flowmeter provided in the slurry flow conduit downstream of the slurry pump are operably connected to the PID controller, and the CMP apparatus is located downstream of the flowmeter.Type: ApplicationFiled: October 9, 2002Publication date: April 15, 2004Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chao-Jung Chang, Ping-Hsu Chen, Chin-Hsin Peng, Henry Lo, Chien-Kuo Lu, Chien-Ling Huang
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Publication number: 20040041421Abstract: An automatic sensing wafer blade for picking up wafers that is equipped with a sensor capable of self-diagnosing potential failure conditions of the blade and a method for using the wafer blade are described. The automatic sensing wafer blade is equipped with a V-shaped seal ring on a top surface, and a sensor of either a limit switch or a capacitance sensor for sensing the presence or absence of a wafer on top of the wafer blade. The automatic sensing wafer blade is further capable of self-diagnosing any potential failure conditions of the function of the wafer blade due to contaminating particles, or contaminating liquid on the wafer surface, or due to an aged or malfunctioning seal ring on top of the wafer blade.Type: ApplicationFiled: September 3, 2002Publication date: March 4, 2004Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yi-Li Hsiao, Chin-Hsin Peng, Cheng-Shun Chan, Jiann-Sheng Chang, Chung-Hao Tseng, Chien-Ling Huang