Patents by Inventor Chien-Wei Li
Chien-Wei Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12149837Abstract: An auto white balance adjusting method includes acquiring an image, allocating N windows inside the image according to color information of the image, filtering out M windows from the N windows for generating N-M windows according to feature information of the N windows, grouping the color temperatures of the N-M windows for generating at least one color temperature group according to a standard color temperature curve, setting a first weighting of the at least one color temperature group according to a correlation between the at least one color temperature group and the standard color temperature curve, setting a second weighting of the at least one color temperature group according to spatial information of the at least one color temperature group of the image, and adjusting a white balance of the image according to color information, the first weighting, and the second weighting.Type: GrantFiled: May 3, 2023Date of Patent: November 19, 2024Assignee: WELTREND SEMICONDUCTOR INC.Inventors: Chien-Ming Chen, Chun-Ying Li, Hsuan-Ying Chen, Te-Wei Hsu
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Publication number: 20240378007Abstract: A media docking device is provided and includes an input module, an output module, and a process module. The input module is electrically connected to a media source device. The output module is electrically connected to multiple media playing devices and obtains device data from the media playing devices. The process module transmits the device data and screen numbers to the media source device through the input module. When determining to perform a display switch procedure, the process module modifies the device data and the screen numbers, and transmits the modified device data and the modified screen numbers to the media source device through the input module. The process module also transmits media data from the media source device to the corresponding media playing device.Type: ApplicationFiled: May 8, 2024Publication date: November 14, 2024Inventors: Bo Yu LAI, Tsung-Han LI, You-Wen CHIOU, Kuan-Chi CHOU, Chien-Wei CHEN
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Publication number: 20240362387Abstract: A device includes a first conductive line as an input line. The device further includes a second conductive line as an output line, wherein the first conductive line and the second conductive line are in a same level of the integrated circuit. The device further includes a first passive isolation structure between the first conductive line and the second conductive line, wherein the first passive isolation structure and the second conductive line are each positioned at an integer multiple of an interval between the first conductive line and the first passive isolation structure.Type: ApplicationFiled: July 12, 2024Publication date: October 31, 2024Inventors: Cheok-Kei LEI, Jerry Chang Jui KAO, Chi-Lin LIU, Hui-Zhong ZHUANG, Zhe-Wei JIANG, Chien-Hsing LI
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Patent number: 12131496Abstract: A method for identifying objects by shape in close proximity to other objects of different shapes obtains point cloud information of multiple objects. The objects are arranged in at least two trays and the trays are stacked. A depth image of the objects is obtained according to the point cloud information, and the depth image of the objects is separated and layered to obtain a layer information of all the objects. An object identification system also disclosed. Three-dimensional machine vision is utilized in identifying the objects, improving the accuracy of object identification, and enabling the mechanical arm to accurately grasp the required object.Type: GrantFiled: July 8, 2022Date of Patent: October 29, 2024Assignee: Chiun Mai Communication Systems, Inc.Inventors: Tung-Chun Hsieh, Chung-Wei Wu, Sung-Chuan Lee, Chien-Ming Ko, Tze-Chin Lo, Chih-Wei Li, Hsin-Ko Yu
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Patent number: 12133474Abstract: A method of fabricating magnetoresistive random access memory, including providing a substrate, forming a bottom electrode layer, a magnetic tunnel junction stack, a top electrode layer and a hard mask layer sequentially on the substrate, wherein a material of the top electrode layer is titanium nitride, a material of the hard mask layer is tantalum or tantalum nitride, and a percentage of nitrogen in the titanium nitride gradually decreases from a top surface of top electrode layer to a bottom surface of top electrode layer, and patterning the bottom electrode layer, the magnetic tunnel junction stack, the top electrode layer and the hard mask layer into multiple magnetoresistive random access memory cells.Type: GrantFiled: September 27, 2023Date of Patent: October 29, 2024Assignee: UNITED MICROELECTRONICS CORP.Inventors: Hui-Lin Wang, Chen-Yi Weng, Chin-Yang Hsieh, Yi-Hui Lee, Ying-Cheng Liu, Yi-An Shih, Jing-Yin Jhang, I-Ming Tseng, Yu-Ping Wang, Chien-Ting Lin, Kun-Chen Ho, Yi-Syun Chou, Chang-Min Li, Yi-Wei Tseng, Yu-Tsung Lai, Jun Xie
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Publication number: 20240338804Abstract: A method for high dynamic range imaging is provided. The method includes the following stages. A first image from a first sensor capable of sensing a first spectrum is received. A second image from a second sensor capable of sensing a second spectrum is received. The second spectrum has a higher wavelength range as compared to the first spectrum. A first image feature from the first image and a second image feature from the second image are retrieved. The first and second images are fused by referencing the first image feature and the second image feature to generate a final image.Type: ApplicationFiled: April 6, 2023Publication date: October 10, 2024Inventors: Pin-Wei CHEN, Keh-Tsong LI, Shao-Yang WANG, Chia-Hui KUO, Hung-Chih KO, Yun-I CHOU, Yu-Hua HUANG, Yen-Yang CHOU, Chien-Ho YU, Chi-Cheng JU, Ying-Jui CHEN
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Patent number: 12112986Abstract: A device includes a fin over a substrate, the fin including a first end and a second end, wherein the first end of the fin has a convex profile, an isolation region adjacent the fin, a gate structure along sidewalls of the fin and over the top surface of the fin, a gate spacer laterally adjacent the gate structure, and an epitaxial region adjacent the first end of the fin.Type: GrantFiled: July 22, 2021Date of Patent: October 8, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Kun-Mu Li, Heng-Wen Ting, Hsueh-Chang Sung, Yen-Ru Lee, Chien-Wei Lee
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Patent number: 12094761Abstract: An embodiment is a structure including a first fin over a substrate, a second fin over the substrate, the second fin being adjacent the first fin, an isolation region surrounding the first fin and the second fin, a gate structure along sidewalls and over upper surfaces of the first fin and the second fin, the gate structure defining channel regions in the first fin and the second fin, a source/drain region on the first fin and the second fin adjacent the gate structure, and an air gap separating the source/drain region from a top surface of the substrate.Type: GrantFiled: June 28, 2023Date of Patent: September 17, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yen-Ru Lee, Chii-Horng Li, Chien-I Kuo, Li-Li Su, Chien-Chang Su, Heng-Wen Ting, Jung-Chi Tai, Che-Hui Lee, Ying-Wei Li
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Patent number: 12073162Abstract: A method of modifying an integrated circuit layout includes determining whether a first conductive line and a second conductive line are subject to a parasitic capacitance above a parasitic capacitance threshold. The method further includes adjusting the integrated circuit layout by moving the first conductive line in the integrated circuit layout in response to determining to move the first conductive line. The method further includes inserting an isolation structure between the first and second conductive lines in the integrated circuit layout in response to determining not to move the first conductive line.Type: GrantFiled: November 30, 2022Date of Patent: August 27, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Cheok-Kei Lei, Jerry Chang Jui Kao, Chi-Lin Liu, Hui-Zhong Zhuang, Zhe-Wei Jiang, Chien-Hsing Li
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Publication number: 20240273675Abstract: An image calibration method is applied to an image calibration device includes an image receiver and an operation processor. The image calibration method of providing a motion deblur function includes driving a first camera to capture a first image having a first exposure time, driving a second camera disposed adjacent to the first camera to capture a second image having a second exposure time different from and at least partly overlapped with the first exposure time, and fusing a first feature of the first image and a second feature of the second image to generate a fusion image.Type: ApplicationFiled: January 2, 2024Publication date: August 15, 2024Applicant: MEDIATEK INC.Inventors: Yu-Hua Huang, Pin-Wei Chen, Keh-Tsong Li, Shao-Yang Wang, Chia-Hui Kuo, Hung-Chih Ko, Yun-I Chou, Yen-Yang Chou, Chien-Ho Yu, Chi-Cheng Ju, Ying-Jui Chen
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Publication number: 20240244335Abstract: An auto white balance adjusting method includes acquiring an image, allocating N windows inside the image according to color information of the image, filtering out M windows from the N windows for generating N-M windows according to feature information of the N windows, grouping the color temperatures of the N-M windows for generating at least one color temperature group according to a standard color temperature curve, setting a first weighting of the at least one color temperature group according to a correlation between the at least one color temperature group and the standard color temperature curve, setting a second weighting of the at least one color temperature group according to spatial information of the at least one color temperature group of the image, and adjusting a white balance of the image according to color information, the first weighting, and the second weighting.Type: ApplicationFiled: May 3, 2023Publication date: July 18, 2024Applicant: WELTREND SEMICONDUCTOR INC.Inventors: Chien-Ming Chen, Chun-Ying Li, Hsuan-Ying Chen, Te-Wei Hsu
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Publication number: 20230195519Abstract: One embodiment provides an apparatus comprising a graphics processor device including a first compute engine and a second compute engine, wherein the second compute engine includes a subset of the functionality provided by the first compute engine and a lower power consumption relative to the first compute engine.Type: ApplicationFiled: December 22, 2021Publication date: June 22, 2023Applicant: Intel CorporationInventors: Vidhya Krishnan, Chien-Wei Li, Ben J. Ashbaugh, Durgaprasad Bilagi, Pattabhiraman K
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Publication number: 20110198756Abstract: Vapor deposition precursors that can deposit conformal thin ruthenium films on substrates with a very high growth rate, low resistivity and low levels of carbon, oxygen and nitrogen impurities have been provided. The precursors described herein include a compound having the formula CMC?, wherein M comprises a metal or a metalloid; C comprises a substituted or unsubstituted acyclic alkene, cycloalkene or cycloalkene-like ring structure; and C? comprises a substituted or unsubstituted acyclic alkene, cycloalkene or cycloalkene-like ring structure; wherein at least one of C and C? further and individually is substituted with a ligand represented by the formula CH(X)R1, wherein X is a N, P, or S-substituted functional group or hydroxyl, and R1 is hydrogen or a hydrocarbon. Methods of production of the vapor deposition precursors and the resulting films, and uses and end uses of the vapor deposition precursors and resulting films are also described.Type: ApplicationFiled: August 25, 2006Publication date: August 18, 2011Inventors: ΓΌ Thenappan, Chien-Wei Li, David Nalewajek, Martin Cheney, Jingyu Lao, Eric Eisenbraun, Min Li, Nathaniel Berliner, Mikko Ritala, Markku Leskela, kaupo Kukli, Linda Cheney
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Patent number: 7638178Abstract: A protective coating for a component comprising a ceramic based substrate, and methods for protecting the component, the protective coating adapted for withstanding repeated thermal cycling. The substrate may comprise silicon nitride or silicon carbide, and the protective coating may comprise at least one tantalate of scandium, yttrium, or a rare earth element. The protective coating may further comprise one or more metal oxides. The coating protects the substrate from combustion gases in the high temperature turbine engine environment. The coating may be multi-layered and exhibits strong bonding to Si-based substrate materials and composites.Type: GrantFiled: November 5, 2004Date of Patent: December 29, 2009Assignee: Honeywell International Inc.Inventors: Derek Raybould, Chien-Wei Li, Bjoern Schenk, Thomas E. Strangman
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Patent number: 7572313Abstract: A turbomachinery component includes a substrate having a surface, the surface consisting essentially of at least one composite of at least one metal and at least one compound having the chemical formula Mn+1AXn, wherein M is at least one early transition metal selected from groups IIIB, IVB, VB, and VIB, A is at least one element selected from groups IIIA, IVA, VA, VIA, and VIIA, X is one or both of carbon and nitrogen, and n is an integer between 1 and 3. The component is made by compressing a powdered material to form a substrate that consists essentially of the composite and sintering the substrate, or by coating a substrate with the composite.Type: GrantFiled: May 10, 2005Date of Patent: August 11, 2009Assignee: Drexel UniversityInventors: Thirumalai G. Palanisamy, Surojit Gupta, Michel Barsoum, Chien-Wei Li
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Patent number: 7553564Abstract: A turbomachinery component includes a substrate having a surface, the surface being a material consisting essentially of at least one compound having the chemical formula Mn+1AXn, wherein M is at least one early transition metal selected from groups IIIB, IVB, VB, and VIB, A is at least one element selected from groups IIIA, IVA, VA, VIA, and VIIA, X is one or both of carbon and nitrogen, and n is an integer between 1 and 3. The component is made by forming a compact and sintered substrate with the material, or by coating a substrate with the material.Type: GrantFiled: May 10, 2005Date of Patent: June 30, 2009Assignee: Honeywell International Inc.Inventors: Surojit Gupta, Thirumalai G. Palanisamy, Michel Barsoum, Chien-Wei Li
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Publication number: 20090098346Abstract: A method and superalloy component for depositing a layer of material onto gas turbine engine components by atomic layer deposition. A superalloy component may have a ceramic thermal barrier coating on at least a portion of its surface, comprising a superalloy substrate and a bonding coat; and aluminum oxide (Al2O3) layer may be deposited on top of an yttria-stabilized zirconia layer and form a bonding coat by atomic layer deposition. The yttria-stabilized zirconia layer may have a plurality of micron sized gaps extending from the top surface of the ceramic coating towards the substrate and defining a plurality of columns of the yttria-stabilized zirconia layer. Also, atomic layer deposition may be used to lay an aluminum oxide (Al2O3) layer over a tantalum oxide (Ta2O5) layer on a silicon-based substrate.Type: ApplicationFiled: October 23, 2007Publication date: April 16, 2009Applicant: HONEYWELL INTERNATIONAL, INC.Inventor: Chien-Wei Li
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Publication number: 20080237702Abstract: An LDMOS transistor includes a substrate having first conductive type, a first well having second conductive type, an isolation structure disposed on the substrate, and a deep doped region having first conductive type disposed between the first well and the substrate. The deep doped region is heavily doped, a portion of the deep doped region is disposed in the bottom portion of the first well, and the other portion of the deep doped region is disposed in the substrate.Type: ApplicationFiled: March 26, 2007Publication date: October 2, 2008Inventors: Chih-Hua Lee, Chien-Wei Li
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Publication number: 20080119098Abstract: A method for depositing an encapsulation layer onto a surface of polymeric fibers and ballistic resistant fabrics. More particularly, the atomic layer deposition of materials onto non-semiconductive polymeric fibers and fabrics, and to fabrics having an conformal encapsulation layer that has been applied by atomic layer deposition.Type: ApplicationFiled: November 21, 2006Publication date: May 22, 2008Inventors: Igor Palley, Chien-Wei Li, Ashok Bhatnagar, David A. Hurst, Jingyu Lao
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Publication number: 20080038578Abstract: A method and superalloy component for depositing a layer of material onto gas turbine engine components by atomic layer deposition. A superalloy component may have a ceramic thermal barrier coating on at least a portion of its surface, comprising a superalloy substrate and a bonding coat; and aluminum oxide (Al2O3) layer may be deposited on top of an yttria-stabilized zirconia layer and form a bonding coat by atomic layer deposition. The yttria-stabilized zirconia layer may have a plurality of micron sized gaps extending from the top surface of the ceramic coating towards the substrate and defining a plurality of columns of the yttria-stabilized zirconia layer. Also, atomic layer deposition may be used to lay an aluminum oxide (Al2O3) layer over a tantalum oxide (Ta2O5) layer on a silicon-based substrate.Type: ApplicationFiled: October 23, 2007Publication date: February 14, 2008Applicant: HONEYWELL INTERNATIONAL, INC.Inventor: Chien-Wei Li