Abstract: A pulsed-DC power generator is used to sputter a substrate in a chamber, and the power generator includes a first voltage source, a second voltage source, a switch unit, a control unit, and a detection unit. The control unit provides a first control signal to control the switching of the switch unit to integrate a first voltage of the first voltage source and a second voltage of the second voltage source into a pulse voltage. The control unit adjusts parameters of a first predetermined time period for arc extinction when the pulse voltage is in a working time period of the first voltage, and the number that a voltage value of the first voltage in a voltage variation to be higher than a range is higher than the number of occurrence.

Abstract: A cantilever for gas flow direction control configured to support an electrode housing bowl in an associated etch process chamber. The cantilever may have a cross-section that is circular, elliptical, or airfoil shaped. The shape of the cantilever induces the flow of gas and etch products within the chamber around the cantilever, reducing turbulence around the edge of a wafer.

Abstract: To improve quality assurance and durability of coated components, a multifaceted inspection coupon is provided that includes opposing flat surfaces, separated by sides which include one or more curves or fillets representing surfaces of the coated components to be inspected. The inspection coupon is coated on all sides in the same manner as the components to be inspected, whereby later analysis of the coupon provides quality assurance of all coated surfaces of the components at once.

Abstract: A navigation method applicable to a robot includes: (a) setting a first position coordinate and first movement information; (b) measuring a plurality of to-be-sensed distances in different directions by using a plurality of distance sensors; (c) inputting the plurality of sensed distances, the first position coordinate, and the first movement information into a neural network model to obtain second movement information; (d) setting the second movement information as the first movement information for a next round of a decision-making process; (e) driving, based on the second movement information, the robot to move from the first position coordinate to a second position coordinate; (f) setting the second position coordinate as the first position coordinate for a next round of the decision-making process; and (g) repeating steps (b) to (f) until a distance between the second position coordinate and a destination coordinate is less than a threshold.

Abstract: Methods for preparing a void-free protective coating are disclosed herein. The void-free protective coating is used on a dielectric window having a central hole, which is used in a plasma treatment tool. A first protective coating layer is applied to the window, leaving an uncoated annular retreat area around the central hole. The first protective coating layer is polished to produce a flat surface and fill in any voids on the window. A second protective coating layer is then applied upon the flat surface of the first protective coating layer to obtain the void-free coating. This increases process uptime and service lifetime of the dielectric window and the plasma treatment tool.

Abstract: Methods for preparing a void-free protective coating are disclosed herein. The void-free protective coating is used on a dielectric window having a central hole, which is used in a plasma treatment tool. A first protective coating layer is applied to the window, leaving an uncoated annular retreat area around the central hole. The first protective coating layer is polished to produce a flat surface and fill in any voids on the window. A second protective coating layer is then applied upon the flat surface of the first protective coating layer to obtain the void-free coating. This increases process uptime and service lifetime of the dielectric window and the plasma treatment tool.

Abstract: A pulsed-DC power generator is used to sputter a substrate in a chamber, and the power generator includes a first voltage source, a second voltage source, a switch unit, a control unit, and a detection unit. The control unit provides a first control signal to control the switching of the switch unit to integrate a first voltage of the first voltage source and a second voltage of the second voltage source into a pulse voltage. The control unit adjusts parameters of a first predetermined time period for arc extinction when the pulse voltage is in a working time period of the first voltage, and the number that a voltage value of the first voltage in a voltage variation to be higher than a range is higher than the number of occurrence.

Abstract: Methods for preparing a void-free protective coating are disclosed herein. The void-free protective coating is used on a dielectric window having a central hole, which is used in a plasma treatment tool. A first protective coating layer is applied to the window, leaving an uncoated annular retreat area around the central hole. The first protective coating layer is polished to produce a flat surface and fill in any voids on the window. A second protective coating layer is then applied upon the flat surface of the first protective coating layer to obtain the void-free coating. This increases process uptime and service lifetime of the dielectric window and the plasma treatment tool.

Abstract: An edge ring, for a plasma etcher, may include a circular bottom portion with an opening sized to receive an electrostatic chuck supporting a semiconductor device, and a circular top portion integrally connected to a first top part of the circular bottom portion. The edge ring may include a circular chamfer portion integrally connected to a second top part of the circular bottom portion and integrally connected to a side of the circular top portion. The circular chamfer portion may include an inner surface that is angled radially outward from the opening at less than ninety degrees.

Abstract: A cantilever for gas flow direction control configured to support an electrode housing bowl in an associated etch process chamber. The cantilever may have a cross-section that is circular, elliptical, or airfoil shaped. The shape of the cantilever induces the flow of gas and etch products within the chamber around the cantilever, reducing turbulence around the edge of a wafer.

Abstract: An edge ring, for a plasma etcher, may include a circular bottom portion with an opening sized to receive an electrostatic chuck supporting a semiconductor device, and a circular top portion integrally connected to a first top part of the circular bottom portion. The edge ring may include a circular chamfer portion integrally connected to a second top part of the circular bottom portion and integrally connected to a side of the circular top portion. The circular chamfer portion may include an inner surface that is angled radially outward from the opening at less than ninety degrees.

Abstract: An edge ring, for a plasma etcher, may include a circular bottom portion with an opening sized to receive an electrostatic chuck supporting a semiconductor device, and a circular top portion integrally connected to a first top part of the circular bottom portion. The edge ring may include a circular chamfer portion integrally connected to a second top part of the circular bottom portion and integrally connected to a side of the circular top portion. The circular chamfer portion may include an inner surface that is angled radially outward from the opening at less than ninety degrees.

Abstract: A power supply device includes an inductor, a switch, a power supply, and a snubber circuit. A first terminal of the switch is coupled to a first terminal of the inductor. A first terminal of the power supply is coupled to a second terminal of the witch. A first terminal of the snubber circuit is coupled to the first terminal of the switch at a first voltage output terminal. A second terminal of the snubber circuit is electrically coupled to a second terminal of the power supply at a second voltage output terminal, in which the inductor, the switch, the power supply, and the snubber circuit are configured to cooperate to generate an output voltage at the first voltage output terminal and the second voltage output terminal.

Abstract: A power supply circuit includes an energy storage element, a first switch, a voltage signal converter, a second switch, a third switch and a power supply. The first switch is coupled to the energy storage element at a first voltage output terminal. The voltage signal converter is coupled to, respectively, the energy storage element and the first switch at a first converter output terminal and a second converter output terminal. The second switch is coupled to the first switch. The third switch is coupled to the second switch at a second voltage output terminal. The power supply is coupled to the second switch and the third switch. The energy storage element, the first switch, the voltage signal converter, the second switch, the third switch and the power supply cooperate and generate a output voltage. A method of operating the power supply circuit is also disclosed herein.

Abstract: A power supply device includes an inductor, a switch, a power supply, and a snubber circuit. A first terminal of the switch is coupled to a first terminal of the inductor. A first terminal of the power supply is coupled to a second terminal of the witch. A first terminal of the snubber circuit is coupled to the first terminal of the switch at a first voltage output terminal. A second terminal of the snubber circuit is electrically coupled to a second terminal of the power supply at a second voltage output terminal, in which the inductor, the switch, the power supply, and the snubber circuit are configured to cooperate to generate an output voltage at the first voltage output terminal and the second voltage output terminal.

Abstract: A power supply circuit includes an energy storage element, a first switch, a voltage signal converter, a second switch, a third switch and a power supply. The first switch is coupled to the energy storage element at a first voltage output terminal. The voltage signal converter is coupled to, respectively, the energy storage element and the first switch at a first converter output terminal and a second converter output terminal. The second switch is coupled to the first switch. The third switch is coupled to the second switch at a second voltage output terminal. The power supply is coupled to the second switch and the third switch. The energy storage element, the first switch, the voltage signal converter, the second switch, the third switch and the power supply cooperate and generate a output voltage. A method of operating the power supply circuit is also disclosed herein.

Abstract: An arc suppression device includes an AC to DC converter, a switch, a resistor and a controller. The switch is coupled between the AC to DC converter and a plasma chamber. The resistor is coupled in parallel with the switch. The AC to DC converter is configured to convert an AC voltage into a DC voltage for providing to the plasma chamber. The controller is configured to detect a unit-time rate of change (ROC) of a plasma current received by the plasma chamber. When the controller determines that the unit-time ROC of the plasma current is larger than a first unit-time ROC threshold, the controller controls the switch to electrically isolate the AC to DC converter and the plasma chamber to reduce the plasma current to a first current value through the resistor.

Abstract: A shove board game system and playing method thereof includes: a game host to process a shove board game program and provide a picture of a chessboard and an information window and reset status of all pieces on the chessboard, a display device communicating with the game host to display the chessboard, pieces and the information window and related information, and an input device communicating with the game host to receive operations of players to proceed the shove board game. The chessboard is octagonal and has multiple longitudinal and transverse lines in directions of X and Y axes and diagonal straight lines formed at an angle of 45 degrees against the X and Y axes. The lines cross one another to form points of intersection. The pieces are positioned on the points of intersection.

Abstract: A shove board game system and playing method thereof includes: a game host to process a shove board game program and provide a picture of a chessboard and an information window and reset status of all pieces on the chessboard, a display device communicating with the game host to display the chessboard, pieces and the information window and related information, and an input device communicating with the game host to receive operations of players to proceed the shove board game. The chessboard is octagonal and has multiple longitudinal and transverse lines in directions of X and Y axes and diagonal straight lines formed at an angle of 45 degrees against the X and Y axes. The lines cross one another to form points of intersection. The pieces are positioned on the points of intersection.