Patents by Inventor ChienShin Chen

ChienShin Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Post ion implant stripper for advanced semiconductor application
    Patent number: 9484218
    Abstract: The present invention relates to a substantially water-free photoresist stripping composition. Particularly, the present invention relates to a substantially water-free photoresist stripping composition useful in removing the photoresist after ion-implant process, comprising: (a) an amine, (b) an organic solvent A, and (c) a co-solvent, wherein the composition is substantially water-free (<3 wt % H2O). The present invention also provides a process for post-ion implantation stripping by using the composition of the present invention.
    Type: Grant
    Filed: July 26, 2010
    Date of Patent: November 1, 2016
    Assignee: BASF SE
    Inventors: ChienShin Chen, MeiChin Shen, ChiaHao Chan, Andreas Klipp
  • POST ION IMPLANT STRIPPER FOR ADVANCED SEMICONDUCTOR APPLICATION
    Publication number: 20120129747
    Abstract: The present invention relates to a substantially water-free photoresist stripping composition. Particularly, the present invention relates to a substantially water-free photoresist stripping composition useful in removing the photoresist after ion-implant process, comprising: (a) an amine, (b) an organic solvent A, and (c) a co-solvent, wherein the composition is substantially water-free (<3 wt % H2O). The present invention also provides a process for post-ion implantation stripping by using the composition of the present invention.
    Type: Application
    Filed: July 26, 2010
    Publication date: May 24, 2012
    Applicant: BASF SE
    Inventors: ChienShin Chen, MeiChin Shen, ChiaHao Chan, Andreas Klipp