Abstract: An overlay metrology system includes a multi-channel energy unit that selectively operates in a first mode to deliver first photons having a first wavelength to an object under test, and a second mode to deliver second photons to the object under test. The second photons have a second wavelength different from the first wavelength. The overlay metrology system further includes an electronic controller that selectively activates either the first mode or the second mode based at least in part on at least one characteristic of an object under test, and that generates the first protons or the second photons to detect at least one buried structure included in the object under test.

Abstract: An overlay metrology system includes a multi-channel energy unit that selectively operates in a first mode to deliver first photons having a first wavelength to an object under test, and a second mode to deliver second photons to the object under test. The second photons have a second wavelength different from the first wavelength. The overlay metrology system further includes an electronic controller that selectively activates either the first mode or the second mode based at least in part on at least one characteristic of an object under test, and that generates the first protons or the second photons to detect at least one buried structure included in the object under test.

Abstract: Methods, systems and apparatus for producing a variable, known number of nanoparticles of various materials in an expanding mist in a vacuum or enclosure. The configurations allow for this mist of small particles to be produced in bursts, at repetition rates over a wide range of frequencies. The technique produces an isotropically expanding mist of particles. Direct applications of the invention can be used for the development of high power short wavelength incoherent light sources for applications in EUV lithography (EUVL), advanced microscopy, precision metrology, and other fields.

Abstract: An apparatus for producing an extreme ultraviolet (EUV) discharge includes a metal source, a laser that produces a focused laser beam, and electrode operatively coupled to the metal source. The electrode includes a plurality of discrete metal retaining zones that deliver a controlled volume of metal into the focused laser beam to produce an EUV discharge plasma.

Abstract: Methods, systems and apparatus for producing a variable, known number of nanoparticles of various materials in an expanding mist in a vacuum or enclosure. The configurations allow for this mist of small particles to be produced in bursts, at repetition rates over a wide range of frequencies. The technique produces an isotropically expanding mist of particles. Direct applications of the invention can be used for the development of high power short wavelength incoherent light sources for applications in EUV lithography (EUVL), advanced microscopy, precision metrology, and other fields.

Abstract: Methods, systems and apparatus for producing a variable, known number of nanoparticles of various materials in an expanding mist in a vacuum or enclosure. The configurations allow for this mist of small particles to be produced in bursts, at repetition rates over a wide range of frequencies. The technique produces an isotropically expanding mist of particles. Direct applications of the invention can be used for the development of high power short wavelength incoherent light sources for applications in EUV lithography (EUVL), advanced microscopy, precision metrology, and other fields.