Patents by Inventor Chih-Chao Tai

Chih-Chao Tai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SPIN RINSE DRY APPARATUS AND METHOD OF PROCESSING A WAFER USING THE SAME
    Publication number: 20120145201
    Abstract: A spin-rinse-dry (SRD) apparatus includes a housing; a pedestal in the housing, comprising a rotatable wafer supporter for holding and spinning a semiconductor wafer; and at least a first liquid dispensing tube in adjacent to the pedestal. The first liquid dispensing tube includes a bended tubular part and an outlet nozzle that is situated beyond an edge of the semiconductor wafer.
    Type: Application
    Filed: December 13, 2010
    Publication date: June 14, 2012
    Inventors: Chang-Hsin Wu, Chih-Chao Tai, Shieh-Chieh Chen, I-Ting Huang