Patents by Inventor Chih-Chen Chuang

Chih-Chen Chuang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sweep voltage generator and display panel
    Patent number: 11967272
    Abstract: A sweep voltage generator and a display panel are provided. The sweep voltage generator includes an output node, a current generating block and a voltage regulating block. The output node is used to provide a sweep signal. The current generating block is coupled to the output node, includes a detection path for detecting an output load variation on the output node, and adjusts the sweep signal provided by the output node based on the output load variation. The voltage regulating block is coupled to the output node for regulating a voltage of the output node.
    Type: Grant
    Filed: December 9, 2022
    Date of Patent: April 23, 2024
    Assignees: AUO Corporation, National Cheng-Kung University
    Inventors: Chih-Lung Lin, Yi-Chen Huang, Chih-I Liu, Po-Cheng Lai, Ming-Yang Deng, Chia-En Wu, Ming-Hung Chuang, Chia-Tien Peng
  • Dual cup spin coating system
    Patent number: 6596082
    Abstract: A dual cup spin coating system for capturing a discharged flowable coating material in a spin coating process including a first outer cup and a second outer cup said first outer cup concentrically disposed around the second outer cup forming a first capture space arranged for capturing at least a portion of a discharged flowable coating material discharged from a process substrate at a first positive angle with respect to the process substrate in a spin coating process; and, an inner cup disposed concentrically within the second outer cup forming a second capture space arranged for capturing at least a second portion of the discharged flowable coating material discharged from the process substrate at a second positive angle less than about the first positive angle with respect to the process substrate in a spin coating process.
    Type: Grant
    Filed: November 30, 2001
    Date of Patent: July 22, 2003
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Chih-Chen Chuang, Cheng-Hsiang Huang, Der-Yun Liu
  • DUAL CUP SPIN COATING SYSTEM
    Publication number: 20030101928
    Abstract: A dual cup spin coating system for capturing a discharged flowable coating material in a spin coating process including a first outer cup and a second outer cup said first outer cup concentrically disposed around the second outer cup forming a first capture space arranged for capturing at least a portion of a discharged flowable coating material discharged from a process substrate at a first positive angle with respect to the process substrate in a spin coating process; and, an inner cup disposed concentrically within the second outer cup forming a second capture space arranged for capturing at least a second portion of the discharged flowable coating material discharged from the process substrate at a second positive angle less than about the first positive angle with respect to the process substrate in a spin coating process.
    Type: Application
    Filed: November 30, 2001
    Publication date: June 5, 2003
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chih-Chen Chuang, Cheng-Hsiang Huang, Der-Yun Liu