Abstract: The material, the width, the thickness, with the ruble's tension Plus the unique way (not a part of this patent) of applying this Erectking make this product a universal tool for the treatment or management of Erectile dysfunctions, impotence, or unsatisfied size.

Abstract: A wet etchant solution composition and method for etching oxides of hafnium and zirconium including at least one solvent present at greater than about 50 weight percent with respect to an arbitrary volume of the wet etchant solution; at least one chelating agent present at about 0.1 weight percent to about 10 weight percent with respect to an arbitrary volume of the wet etchant solution; and, at least one halogen containing acid present from about 0.0001 weight percent to about 10 weight percent with respect to an arbitrary volume of the wet etchant solution.

Abstract: A test system for testing a portable electronic apparatus having a digital image capture module and a test interface is described. The test system has at least a sender, a holder, and a controller. The holder is used to hold the portable electronic apparatus. The controller is used to control the sender to send at least a test slide, according to a predetermined procedure, to a position. When the slide is moved to the position, the controller commands the portable electronic apparatus, via the test interface, to capture the image on the test slide and then performs a test on the image data. The test system uses an automatic control and a shop floor system to achieve an automatic test.

Abstract: A test system for testing a portable electronic apparatus is described. The test system has at least a display, a platform, and a controller. The controller controls the display to display test images in sequence. The controller commands the portable electronic apparatus, via a test interface, to capture the test images on the display to generate image data. The controller determines whether the image data meet a predetermined test requirement. The test system can further include at least a light source and a reflector. The reflector reflects the light on the display, so that the display reaches a predetermined uniformity of light.

Abstract: The present invention provides a fountain-type electroplating apparatus with functions of voltage detection and flow rectification, comprising: an electroplating tank, a rectification device, and an overflow tank, wherein the electroplating tank is positioned inside the overflow tank, and the rectification device is arranged under the electroplating tank, in addition, the electroplating tank is composed of a shell, a cathode electrode, and an mesh shaped anode. The apparatus of the present invention further comprises: a power supplier, a switcher, a plurality of detection circuits, and a plurality of connecting line, which is used for monitoring the same.

Abstract: The present invention discloses a puddle etching method of thin film. In a spin etching equipment, pre-wet the wafer by D.I. water and etch solution to remove the contamination and the upper layer of the film on the wafer. Then spin slowly (about 0-50 rpm) and inject etching solution to form a puddle of etching solution which will stay on the wafer, the wafer then keep spin slowly (about 0-50 rpm) such that the puddle of etching solution stay on the wafer and etching is going on by puddle etching. After the thin film is etched, the wafer is spin at higher speed, and D.I. water is injected to rinse. Then, IPA is used to remove the D.I. water by Marangoni effect. Finally raise the speed to dry the wafer.

Abstract: A wafer electroplating apparatus and method, comprising a wafer turning assembly, a vertical movement assembly, a wafer tilting assembly, and a frame. The wafer turning assembly has a turning shaft and a clasp for holding a wafer. The wafer tilting assembly has a tilting table being driven by a driving system, e.g. a cylinder, carrying an electroplating unit and wafer turning assembly. Thus the clasp holding a wafer and the electroplating unit are simultaneously inclined at preset angle against the horizontal plane, allowing for a large inclination angle. Therefore, gas bubbles generated during electroplating readily escape, and quality of electroplating is improved.

Abstract: A protection cover integrally formed of plastic by molding ejection is provided. An elastic locking structure is disposed at two sides of the protection cover. An abutting portions having a ‘<’-shaped part and a ‘>’-shaped part is formed on the locking structure to abut against the outer edge wall of the connector so that the protection cover and the connector can be firmly connected together. Reinforcement portions are formed at the inner top face and the link positions at two inner sides of the protection cover.

Abstract: An improved connector protection cover integrally formed of plastic by molding ejection is provided. An elastic locking structure is disposed at two sides of the protection cover. An abutting portions having a ‘<’-shaped part and a ‘>’-shaped part is formed on the locking structure to abut against the outer edge wall of the connector so that the protection cover and the connector can be firmly connected together. It is not necessary to use a professional tool like a screwdriver to separate the protection cover from the connector. Scrapes on the surface of the connector can also be avoided. Moreover, reinforcement portions are formed at the inner top face and the link positions at two inner sides of the protection cover to prevent the protection cover from crushing terminals in the connector due to stacking of the connectors during transportation.

Abstract: A wet etchant solution composition and method for etching oxides of hafnium and zirconium including at least one solvent present at greater than about 50 weight percent with respect to an arbitrary volume of the wet etchant solution; at least one chelating agent present at about 0.1 weight percent to about 10 weight percent with respect to an arbitrary volume of the wet etchant solution; and, at least one halogen containing acid present from about 0.0001 weight percent to about 10 weight percent with respect to an arbitrary volume of the wet etchant solution.

Abstract: A dry vacuum pump comprises a scroll-type vacuum pump and a rotary-vane vacuum pump, wherein the rotary-vane vacuum pump is mounted on the side of an inlet, whereas the scroll-type vacuum pump is mounted on the side of an outlet, and then a compound-type dry vacuum pump is formed by connecting and integrating the rotary-vane vacuum pump and the scroll-type vacuum pump, having the advantages of high compression ratio, high vacuuming speed, low production cost and simplified structure, thus improving the working effectiveness and quality of pumps accordingly.

Abstract: The present invention discloses a puddle etching method of thin film. In a spin etching equipment, pre-wet the wafer by D.I. water and etch solution to remove the contamination and the upper layer of the film on the wafer. Then spin slowly (about 0-50 rpm) and inject etching solution to form a puddle of etching solution which will stay on the wafer, the wafer then keep spin slowly (about 0-50 rpm) such that the puddle of etching solution stay on the wafer and etching is going on by puddle etching. After the thin film is etched, the wafer is spin at higher speed, and D.I. water is injected to rinse. Then, IPA is used to remove the D.I. water by Marangoni effect. Finally raise the speed to dry the wafer.

Abstract: A mesa-oxide isolation method comprises steps of placing a wafer in a metalorganic chemical vapor deposition (MOCVD) system or a molecular beam epitaxy (MBE) system to grow an epitaxial layer on a surface of the wafer, spinning photo-resist on an upper surface of the epitaxial layer, exposing the wafer under a light to print electric circuit pattern on a masking and soaking the wafer in a developing solution to solve and remove the photosensitive resin, etching to remove a portion of the epitaxial layer, growing an oxide layer on the area of the epitaxial layer without photo-resist by soaking the wafer in a chemical solution, removing photo-resist to form a mesa on the upper surface of the wafer, and depositing metal connections on the mesa and the wafer.

Abstract: The present invention discloses an electrode structure of a light emitted diode and manufacturing method of the electrodes. After formed a pn junction of a light emitted diode on a substrate, a layer of SiO2 is deposited on the periphery of the die of the LED near the scribe line of the wafer, then a transparent conductive layer is deposited blanketly, then a layer of gold or AuGe etc. is formed with an opening on the center of the die. After forming alloy with the semiconductor by heat treatment to form ohmic contact, a strip of aluminum (Al) is formed on one side of the die on the front side for wire bonding and to be the positive electrode of the LED. The negative electrode is formed on the substrate by metal contact.

Abstract: In a method of recovering copper from an industrial waste sludge or liquid, a first treatment agent and/or a second treatment agent is added into a waste feed to separate the coagulants therefrom. A bluish solution and a tail gas are thereby obtained. Alternatively, an acidic etching waste solution is added instead of the first treatment agent and/or the second treatment agent into the waste feed. Then, a converting agent/converting aid agent is added in the bluish solution. Thereafter, the solution is filtrated to obtain a solid copper oxide, a filtrate and a tail oxidizing gas. The filtrate is saturated by the aforementioned gases and fed back to the waste feed. The copper oxide thereby obtained has a high copper content compared to the conventional methods. All of the other resulting products are recycled without being disposed of in the environment.

Abstract: A dry vacuum pump comprises a scroll-type vacuum pump and a rotary-vane vacuum pump, wherein the rotary-vane vacuum pump is mounted on the side of an inlet, whereas the scroll-type vacuum pump is mounted on the side of an outlet, and then a compound-type dry vacuum pump is formed by connecting and integrating the rotary-vane vacuum pump and the scroll-type vacuum pump, having the advantages of high compression ratio, high vacuuming speed, low production cost and simplified structure, thus improving the working effectiveness and quality of pumps accordingly.

Abstract: A fire proof or extinguishing compositions consisting of diammonium hydrogen phosphate, disodium hydrogen phosphate, dicyandiamide, sodium borate decahydrate and water, is characterized in that it is non-toxic, non-polluting and free of chlorofluorocarbons, and that its extinguishing effect is significantly enchanced as well as it can replace Halon 1211 as extinguishing material for using in portable or automatic extinguishing systematic engineering.