Patents by Inventor Chih-Chiang Yang

Chih-Chiang Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050239747
    Abstract: Enhanced transdermal composition comprising a niosome, which retains within its structure a cyclodextrin inclusion complex of a steroidal active agent and a vesicle of nonionic surfactant are provided herein, which increases the permeability of dermal tissue to transdermally administered steroidal active agents. Methods for producing the enhanced transdermal composition as well as its application are also provided.
    Type: Application
    Filed: April 21, 2004
    Publication date: October 27, 2005
    Applicant: Pharmaceutical Industry Technology and Development Center
    Inventors: Chih-Chiang Yang, Yuan-Chih Le, Chao-Cheng Liu
  • Publication number: 20050196438
    Abstract: A fast dissolving tablet. The fast dissolving tablet comprises a pharmaceutically active ingredient, a starch, a hydrophilic polymer, a surfactant, and excipients. A method of preparing the fast dissolving tablet is also disclosed.
    Type: Application
    Filed: May 3, 2004
    Publication date: September 8, 2005
    Applicant: Pharmaceutical Industry Technology and Development Center
    Inventors: Wen-Che Wang, Hui-Yu Chen, Chih-Chiang Yang
  • Publication number: 20050186284
    Abstract: A taste-masking oral dosage form. The taste-masking oral dosage form comprises a pharmaceutically active ingredient, and a starch, wherein the pharmaceutically active ingredient is packaged by the starch to form a microparticle. A method of preparing the taste-masking oral dosage form is also disclosed.
    Type: Application
    Filed: May 6, 2004
    Publication date: August 25, 2005
    Applicant: Pharmaceutical Industry Technology and Development Center
    Inventors: Chih-Chiang Yang, Wen-Che Wang, Hui-Yu Chen
  • Publication number: 20050099912
    Abstract: An optical data recording method for a disk drive having a plurality of rotation speeds. First, a plurality of write strategies corresponding to different possible rotation speeds of the disk drive is provided. Next, the practical rotation speed of the disk drive is detected. Next, the write strategy is selected according to the detected rotation speed of the disk drive. Next, optical data is written to an optical disc with the selected write strategy. Finally, the practical rotation speed of the disk drive is continuously detected during writing of optical data, and optical data is written to the optical disc with different write strategy when the practical rotation speed of the disk drive is changed to correspond to different write strategy.
    Type: Application
    Filed: October 7, 2004
    Publication date: May 12, 2005
    Inventors: Ying-Lang Chuang, Jarvis Wang, Chih-Chiang Yang
  • Publication number: 20050053655
    Abstract: The present invention provides a fast-disintegrating tablet (RDT) and the method of preparing the RDT. The RDT contains a plurality of microcapsules which contains an active pharmaceutical ingredient surrounded by a polymeric matrix formed by a hydrogel. The microcapsules are separated from each other by a surfactant, particularly lecithin. The RDT is particularly suitable for use as a drug delivery system for antiacid or antiulcer drugs, such as famotidine. The RDT is further characterized by their its fast disintegration time of about 3 second to 3 minutes.
    Type: Application
    Filed: September 5, 2003
    Publication date: March 10, 2005
    Applicant: Pharmaceutical Industry Technology and Development Center
    Inventors: Chih-Chiang Yang, Wen-Che Wang, Hui-Yu Chen
  • Patent number: 6293850
    Abstract: A chemical mechanical polishing machine and a fabrication process using the same. The chemical mechanical polishing machine comprises a retainer ring having a plurality of slurry passages at the bottom of the retainer ring. The retainer ring further comprises a circular path. By conducting the slurry through the slurry passages and the circular, a wafer is planarized within the chemical mechanical polishing machine.
    Type: Grant
    Filed: October 22, 1999
    Date of Patent: September 25, 2001
    Assignee: United Microelectronics Corp.
    Inventors: Juen-Kuen Lin, Chien-Hsin Lai, Peng-Yih Peng, Kun-Lin Wu, Daniel Chiu, Chih-Chiang Yang, Juan-Yuan Wu, Hao-Kuang Chiu
  • Patent number: 6241582
    Abstract: A chemical mechanical polishing machine and a fabrication process using the same. The chemical mechanical polishing machine comprises a retainer ring having a plurality of slurry passages at the bottom of the retainer ring. The retainer ring further comprises a circular path. By conducting the slurry through the slurry passages and the circular, a wafer is planarized within the chemical mechanical polishing machine.
    Type: Grant
    Filed: September 18, 1998
    Date of Patent: June 5, 2001
    Assignee: United Microelectronics Corp.
    Inventors: Juen-Kuen Lin, Chien-Hsin Lai, Peng-Yih Peng, Kun-Lin Wu, Daniel Chiu, Chih-Chiang Yang, Juan-Yuan Wu, Hao-Kuang Chiu
  • Patent number: 6234876
    Abstract: A chemical mechanical polishing machine and a fabrication process using the same. The chemical mechanical polishing machine comprises a retainer ring having a plurality of slurry passages at the bottom of the retainer ring. The retainer ring further comprises a circular path. By conducting the slurry through the slurry passages and the circular, a wafer is planarized within the chemical mechanical polishing machine.
    Type: Grant
    Filed: October 22, 1999
    Date of Patent: May 22, 2001
    Inventors: Juen-Kuen Lin, Chien-Hsin Lai, Peng-Yih Peng, Kun-Lin Wu, Daniel Chiu, Chih-Chiang Yang, Juan-Yuan Wu, Hao-Kuang Chiu
  • Patent number: 6206760
    Abstract: The present invention discloses a method for preventing particle contamination in a polishing machine that utilizes slurry composition for the removal of material from the surface of a substrate. The novel method is particularly suited for use in a chemical mechanical polishing apparatus in which a slurry composition is used. The method includes the step of providing a plurality of cleaning devices each having a bendable, shapable conduit and a spray nozzle for dispensing a cleaning solvent on the spindle and the conditioner arm utilized in the CMP apparatus. The present invention further discloses an apparatus for use in carrying out a method for preventing particle contamination in a CMP apparatus by using bendable, shapable conduits for dispensing a cleaning solvent such as deionized water onto the chamber components for removing slurry deposits that may have splattered thereon and therefore, eliminating sources for particle contamination.
    Type: Grant
    Filed: June 29, 1999
    Date of Patent: March 27, 2001
    Assignees: Taiwan Semiconductor Manufacturing Company, Ltd., Applied Materials, Inc.
    Inventors: Yu-Chia Chang, Jain-Li Wu, Chung-I Cheng, Chih-Chiang Yang, Pei Wei Yeh, Yung-Tai Tseng
  • Patent number: 6183350
    Abstract: A chemical mechanical polishing machine and a fabrication process using the same. The chemical mechanical polishing machine comprises a retainer ring having a plurality of slurry passages at the bottom of the retainer ring. The retainer ring further comprises a circular path. By conducting the slurry through the slurry passages and the circular, a wafer is planarized within the chemical mechanical polishing machine.
    Type: Grant
    Filed: October 22, 1999
    Date of Patent: February 6, 2001
    Assignee: United Microelectronics Corp.
    Inventors: Juen-Kuen Lin, Chien-Hsin Lai, Peng-Yih Peng, Kun-Lin Wu, Daniel Chiu, Chih-Chiang Yang, Juan-Yuan Wu, Hao-Kuang Chiu