Patents by Inventor Chih-ching Cheng
Chih-ching Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12334314Abstract: A plasma etching system generates a plasma above a wafer in a plasma etching chamber. The wafer is surrounded by a focus ring. The plasma etching system straightens a plasma sheath above the focus ring by generating a supplemental electric field above the focus ring.Type: GrantFiled: August 30, 2021Date of Patent: June 17, 2025Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Po-Lung Hung, Yi-Tsang Hsieh, Yu-Hsi Tang, Chih-Ching Cheng, Chih-Teng Liao
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Publication number: 20250160062Abstract: A light-emitting diode epitaxial structure and a light-emitting diode are provided. The light-emitting diode epitaxial structure is provided with an Mg modulation layer disposed between a multi-quantum well light-emitting layer and a first hole injection layer. The average impurity doping concentration of the Mg modulation layer is A, the average impurity doping concentration of the first hole injection layer is B, and the average impurity doping concentration of an electron blocking layer is C, where B>A>C.Type: ApplicationFiled: November 8, 2022Publication date: May 15, 2025Inventors: Licheng Huang, Changwei Song, Yuan Guo, Chih-Ching Cheng, Ling Lu
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Patent number: 12205844Abstract: A method for processing a semiconductor wafer is provided. The method includes placing a first semiconductor wafer on a wafer chuck in a process chamber. The method further includes adjusting a distance between a gas dispenser positioned above the wafer chuck and an upper edge ring surrounding the wafer chuck. The method also includes producing a plasma for processing the first semiconductor wafer by exciting a gas dispenser from the gas dispenser after the adjustment. In addition, the method includes removing the first semiconductor wafer from the process chamber.Type: GrantFiled: April 8, 2021Date of Patent: January 21, 2025Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Huang-Shao Ko, Jui-Fu Hsieh, Chih-Teng Liao, Chih-Ching Cheng
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Publication number: 20250010899Abstract: A trolley and a folding method thereof. The trolley includes a main bracket, a connecting mechanism, an upper bracket, a sliding mechanism, first to fourth connecting rods and a rear wheel. The main bracket has first and second ends. The upper bracket is connected to the first end through the connecting mechanism slidably arranged on the main bracket. Both ends of the first connecting rod are respectively connected to the sliding mechanism and the upper bracket. The second and third connecting rods are parallel to each other and connected to the sliding mechanism and the rear wheel. The fourth connecting rod has third and fourth ends and a bending portion. The third end is connected to the second connecting rod and located between the sliding mechanism and the rear wheel. The fourth end is connected to the connecting mechanism, at a middle section of which the bending portion is arranged.Type: ApplicationFiled: July 3, 2024Publication date: January 9, 2025Inventor: Chih-Ching CHENG
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Publication number: 20240387152Abstract: A plasma etching system generates a plasma above a wafer in a plasma etching chamber. The wafer is surrounded by a focus ring. The plasma etching system straightens a plasma sheath above the focus ring by generating a supplemental electric field above the focus ring.Type: ApplicationFiled: July 26, 2024Publication date: November 21, 2024Inventors: Po-Lung HUNG, Yi-Tsang HSIEH, Yu-Hsi TANG, Chih-Ching CHENG, Chih-Teng LIAO
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Publication number: 20240379387Abstract: In a method of controlling a plasma beam of a plasma etcher a flow rate controller of the plasma etcher is set to generate one or more flow rates of an etching gas corresponding to one or more plasma beams of the plasma etcher. The emitted light generated by plasma discharge corresponding to the one or more plasma beams of the plasma etcher is monitored. The flow rate controller is calibrated based on the one or more flow rates and a corresponding emitted light of the plasma discharge.Type: ApplicationFiled: July 24, 2024Publication date: November 14, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Po-Lung HUNG, Yi-Tsang HSIEH, Yu-Hsi TANG, Chih-Teng LIAO, Chih-Ching CHENG
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Patent number: 12142494Abstract: In a method of controlling a plasma beam of a plasma etcher a flow rate controller of the plasma etcher is set to generate one or more flow rates of an etching gas corresponding to one or more plasma beams of the plasma etcher. The emitted light generated by plasma discharge corresponding to the one or more plasma beams of the plasma etcher is monitored. The flow rate controller is calibrated based on the one or more flow rates and a corresponding emitted light of the plasma discharge.Type: GrantFiled: June 7, 2021Date of Patent: November 12, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Po-Lung Hung, Yi-Tsang Hsieh, Yu-Hsi Tang, Chih-Teng Liao, Chih-Ching Cheng
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Patent number: 11993301Abstract: An unlocking device with a pause function comprises a first moving member having a first protruding portion, a second moving member having a second protruding portion, and a third moving member having a third end portion and a fourth end portion. The second moving member is disposed corresponding to the first moving member. The second protruding portion is disposed cooperated with the first protruding portion. The third end portion is connected to the second moving member. When the fourth end portion of the third moving member contacts a carry body, and a first end portion of a releasing member moves along a first direction towards the housing, the releasing member drives the first moving member to move in the first direction, so the second moving member holds the position of the releasing member by the second protruding portion and the first protruding portion.Type: GrantFiled: September 18, 2020Date of Patent: May 28, 2024Assignee: UNIQUE PRODUCT & DESIGN CO., LTD.Inventor: Chih-Ching Cheng
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Patent number: 11827265Abstract: A movable carrier includes a bottom frame assembly, a first support member, a link assembly, a position mechanism, and a first unlock member. The first support member has a first end portion pivotally connected to the bottom frame assembly. The link assembly includes a link member and a first connect member. The link member is disposed at a second end portion of the first support member. The first connect member is pivotally connected to the link member and connected to the second end portion through the link member. The position mechanism is disposed on the link assembly and corresponds to the first connect member. The first unlock member is disposed on the link assembly and connected to the position mechanism. When the first unlock member contacts the bottom frame assembly, it carries the position mechanism to move to change the position of the first connect member.Type: GrantFiled: June 4, 2021Date of Patent: November 28, 2023Assignee: UNIQUE PRODUCT & DESIGN CO., LTD.Inventor: Chih-Ching Cheng
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Publication number: 20230335679Abstract: Provided are a light-emitting diode and a semiconductor device.Type: ApplicationFiled: June 8, 2023Publication date: October 19, 2023Inventors: Changwei Song, Licheng Huang, Yuan Guo, Wang Zhan, Chih-Ching Cheng, Ling Lu
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Publication number: 20230067400Abstract: A plasma etching system generates a plasma above a wafer in a plasma etching chamber. The wafer is surrounded by a focus ring. The plasma etching system straightens a plasma sheath above the focus ring by generating a supplemental electric field above the focus ring.Type: ApplicationFiled: August 30, 2021Publication date: March 2, 2023Inventors: Po-Lung HUNG, Yi-Tsang HSIEH, Yu-Hsi TANG, Chih-Ching CHENG, Chih-Teng LIAO
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Publication number: 20230033077Abstract: A pedaling sensing device of an electric bicycle is configured to connect to a motor and includes a crank axle, a first gearwheel, a second gearwheel, an assisting unit and a sensing unit. The crank axle extends along an axial direction and has a plurality of first helical teeth connected to each other and arranged continuously. The first gearwheel is disposed around the crank axle and comprises a first inner annulus surface and a first outer annulus surface. The first inner annulus surface is formed with a plurality of second helical teeth matching the first helical teeth. The second helical teeth are connected to each other and arranged continuously. The second gearwheel is disposed around the first gearwheel and has a second inner annulus surface. The second inner annulus surface is formed with a second transmission structure matching the first transmission structure.Type: ApplicationFiled: October 14, 2022Publication date: February 2, 2023Inventor: CHIH-CHING CHENG
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Publication number: 20220392785Abstract: In a method of controlling a plasma beam of a plasma etcher a flow rate controller of the plasma etcher is set to generate one or more flow rates of an etching gas corresponding to one or more plasma beams of the plasma etcher. The emitted light generated by plasma discharge corresponding to the one or more plasma beams of the plasma etcher is monitored. The flow rate controller is calibrated based on the one or more flow rates and a corresponding emitted light of the plasma discharge.Type: ApplicationFiled: June 7, 2021Publication date: December 8, 2022Inventors: Po-Lung HUNG, Yi-Tsang HSIEH, Yu-Hsi TANG, Chih-Teng LIAO, Chih-Ching CHENG
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Publication number: 20220328342Abstract: A method for processing a semiconductor wafer is provided. The method includes placing a first semiconductor wafer on a wafer chuck in a process chamber. The method further includes adjusting a distance between a gas dispenser positioned above the wafer chuck and an upper edge ring surrounding the wafer chuck. The method also includes producing a plasma for processing the first semiconductor wafer by exciting a gas dispenser from the gas dispenser after the adjustment. In addition, the method includes removing the first semiconductor wafer from the process chamber.Type: ApplicationFiled: April 8, 2021Publication date: October 13, 2022Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Huang-Shao KO, Jui-Fu HSIEH, Chih-Teng LIAO, Chih-Ching CHENG
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Publication number: 20210291887Abstract: A movable carrier includes a bottom frame assembly, a first support member, a link assembly, a position mechanism, and a first unlock member. The first support member has a first end portion pivotally connected to the bottom frame assembly. The link assembly includes a link member and a first connect member. The link member is disposed at a second end portion of the first support member. The first connect member is pivotally connected to the link member and connected to the second end portion through the link member. The position mechanism is disposed on the link assembly and corresponds to the first connect member. The first unlock member is disposed on the link assembly and connected to the position mechanism. When the first unlock member contacts the bottom frame assembly, it carries the position mechanism to move to change the position of the first connect member.Type: ApplicationFiled: June 4, 2021Publication date: September 23, 2021Inventor: CHIH-CHING CHENG
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Patent number: 11052933Abstract: A moving carrier comprises a bottom frame assembly, a first support member and a link assembly. A first end portion of the first support member is connected with the bottom frame assembly. The link assembly includes a link member, a first connect member, a second connect member, and two adapter members. The link member is disposed at a second end portion of the first support member. The first connect member and the second connect member are disposed on the link member and connected to the second end portion through the link member. The adapter members are disposed corresponding to ends of the first connect member and the second connect member, and each adapter member has an adapter portion. In the process of changing positions of the first connect member and the second connect member relative to the link member, the adapter portions are oriented to the same direction.Type: GrantFiled: July 3, 2019Date of Patent: July 6, 2021Assignee: UNIQUE PRODUCT & DESIGN CO., LTD.Inventor: Chih-Ching Cheng
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Publication number: 20210078462Abstract: An unlocking device with a pause function comprises a first moving member having a first protruding portion, a second moving member having a second protruding portion, and a third moving member having a third end portion and a fourth end portion. The second moving member is disposed corresponding to the first moving member. The second protruding portion is disposed cooperated with the first protruding portion. The third end portion is connected to the second moving member. When the fourth end portion of the third moving member contacts a carry body, and a first end portion of a releasing member moves along a first direction towards the housing, the releasing member drives the first moving member to move in the first direction, so the second moving member holds the position of the releasing member by the second protruding portion and the first protruding portion.Type: ApplicationFiled: September 18, 2020Publication date: March 18, 2021Inventor: Chih-Ching CHENG
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Publication number: 20210039744Abstract: A pedaling sensing device of an electric bicycle is configured to connect to a motor and includes a crank axle, a first gearwheel disposed around the crank axle, a second gearwheel disposed around the first gearwheel, a sensing unit, an assisting unit, and a chain wheel. The crank axle has first bevel teeth, and the first gearwheel has a first transmission structure and second bevel teeth matching the first bevel teeth. The second gearwheel has a second transmission structure matching the first transmission structure. When the crank axle is driven by a force to rotate, the first gearwheel, second gearwheel and chain wheel are carried to rotate. The first gearwheel also moves with respect to the crank axle along the axial direction, so the sensing unit can sense the applied force. Then, the motor drives the assisting gearwheel and chain wheel to rotate, thereby achieving assisting riding effect.Type: ApplicationFiled: July 27, 2020Publication date: February 11, 2021Inventor: CHIH-CHING CHENG
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Patent number: 10879051Abstract: A plasma processing apparatus is provided. The apparatus includes a lower sheltering module. The apparatus further includes an upper sheltering module arranged adjacent to the lower sheltering module. The apparatus includes an upper plate and an upper PEZ ring positioned around the upper plate. The apparatus also includes a shadowing unit that includes a number of engaging parts in the form of arcs detachably positioned on the upper PEZ ring. In addition, the apparatus includes a plasma generation module for generating plasma in the peripheral region of the lower sheltering module and the upper sheltering module.Type: GrantFiled: May 11, 2017Date of Patent: December 29, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chun-Hsing Wu, Hung-Jui Chang, Chih-Ching Cheng, Yi-Wei Chiu, Kun-Cheng Chen
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Publication number: 20200269950Abstract: A drivetrain of an electric bike is provided. The drivetrain includes an outer rotor type motor, a shaft gear, a crankshaft and a single-stage velocity-reduction driving assembly. The outer rotor type motor includes a stator assembly, a rotor assembly and a housing. The rotor assembly is disposed to the housing. The shaft gear includes a joint portion and a gear portion. The joint portion is disposed to the housing. The single-stage velocity-reduction driving assembly is configured around the crankshaft and includes a driving gear. A central axis of the shaft gear and a central axis of the crankshaft are substantially parallel to each other and non-coaxial, and the driving gear directly meshes with the gear portion. Accordingly, the drivetrain of the electric bike of the present invention has the advantages of easier assembly and having lower cost.Type: ApplicationFiled: September 24, 2019Publication date: August 27, 2020Inventor: CHIH-CHING CHENG