Patents by Inventor Chih-Ching Tzeng

Chih-Ching Tzeng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High-voltage discharging reactor processing exhausted hydrogen gas
    Patent number: 7594810
    Abstract: The present invention provides a reactor utilizing high-voltage discharge for processing exhausted hydrogen gas emitted during membrane plating, etching, or washing of semiconductors, where higher than 95% of destruction and removal efficiency (DRE) of hydrogen gas is obtained.
    Type: Grant
    Filed: October 28, 2005
    Date of Patent: September 29, 2009
    Assignee: Atomic Energy Council - Institute of Nuclear Energy Research
    Inventors: Chih-Ching Tzeng, Den-Lian Lin, Shiaw-Huei Chen, Ming-Song Yang, Jyh-Ming Yan, Yuh-Jenq Yu
  • High - voltage discharging reactor processing exhausted hydrogen gas
    Publication number: 20070111147
    Abstract: The present invention provides a reactor utilizing high-voltage discharge for processing exhausted hydrogen gas emitted during membrane plating, etching, or washing of semiconductors, where higher than 95% of destruction and removal efficiency (DRE) of hydrogen gas is obtained.
    Type: Application
    Filed: October 28, 2005
    Publication date: May 17, 2007
    Inventors: Chih-Ching Tzeng, Den-Lian Lin, Shiaw-Huei Chen, Ming-Song Yang, Jyh-Ming Yan, Yuh-Jeng Yu