Patents by Inventor Chih-Fu Li

Chih-Fu Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11962100
    Abstract: A dual-band antenna module includes a first antenna structure and a second antenna structure. The first antenna structure includes a first insulating substrate, a conductive metal layer, a plurality of grounding supports, and a first feeding pin. The second antenna structure includes a second insulating substrate, a top metal layer, a bottom metal layer, and a second feeding pin. The conductive metal layer is disposed on the first insulating substrate. The grounding supports are configured for supporting the first insulating substrate. The second insulating substrate is disposed above the first insulating substrate. The top metal layer and the bottom metal layer are respectively disposed on a top side and a bottom side of the second insulating substrate. The first frequency band signal transmitted or received by the first antenna structure is smaller than the second frequency band signal transmitted or received by the second antenna structure.
    Type: Grant
    Filed: August 7, 2022
    Date of Patent: April 16, 2024
    Assignee: Taiwan Inpaq electronic Co., Ltd.
    Inventors: Ta-Fu Cheng, Shou-Jen Li, Cheng-Yi Wang, Chih-Ming Su
  • Patent number: 8215510
    Abstract: A photomask storage apparatus including a bottom plate and top lid is provided. The photomask storage apparatus includes poly-ether ketone (PEEK). A fastening element is configured to couple the lid to the bottom plate. A retaining element is secured to the lid to prevent vibrations of a photomask. A vent structure is also provided. The vent structure is configured such that airflow through the vent is purged in approximately 360 degrees into a chamber including the photomask. The vent structure may include a particulate filter. A seal liner is disposed on the bottom component.
    Type: Grant
    Filed: March 24, 2008
    Date of Patent: July 10, 2012
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hsin-Yuan Chen, Chih-Fu Li, Chi-Chung Hsu, Hsing-Fu Lee
  • Publication number: 20090239010
    Abstract: A photomask storage apparatus including a bottom plate and top lid is provided. The photomask storage apparatus includes poly-ether ketone (PEEK). A fastening element is configured to couple the lid to the bottom plate. A retaining element is secured to the lid to prevent vibrations of a photomask. A vent structure is also provided. The vent structure is configured such that airflow through the vent is purged in approximately 360 degrees into a chamber including the photomask. The vent structure may include a particulate filter. A seal liner is disposed on the bottom component.
    Type: Application
    Filed: March 24, 2008
    Publication date: September 24, 2009
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hsin-Yuan Chen, Chih-Fu Li, Chi-Chung Hsu, Hsing-Fu Lee