Abstract: A semiconductor device includes a substrate, a plurality of nanosheets, a plurality of source/drain (S/D) features, and a gate stack. The substrate includes a first fin and a second fin. The first fin has a first width less than a second width of the second fin. The plurality of nanosheets is disposed on the first fin and the second fin. The plurality of source/drain (S/D) features are located on the first fin and the second fin and abutting the plurality of nanosheets. A bottom surface of the plurality of source/drain (S/D) features on the first fin is equal to or lower than a bottom surface of the plurality of source/drain (S/D) features on the second fin. The gate stack wraps each of the plurality of nanosheets.

Abstract: A semiconductor device structure, along with methods of forming such, are described. The structure includes a stack of semiconductor layers spaced apart from and aligned with each other, a first source/drain epitaxial feature in contact with a first one or more semiconductor layers of the stack of semiconductor layers, and a second source/drain epitaxial feature disposed over the first source/drain epitaxial feature. The second source/drain epitaxial feature is in contact with a second one or more semiconductor layers of the stack of semiconductor layers. The structure further includes a first dielectric material disposed between the first source/drain epitaxial feature and the second source/drain epitaxial feature and a first liner disposed between the first source/drain epitaxial feature and the second source/drain epitaxial feature. The first liner is in contact with the first source/drain epitaxial feature and the first dielectric material.

Abstract: According to one example, a semiconductor device includes a substrate and a fin stack that includes a plurality of nanostructures, a gate device surrounding each of the nanostructures, and inner spacers along the gate device and between the nanostructures. A width of the inner spacers differs between different layers of the fin stack.

Abstract: A projection apparatus, an illumination module and a color-level correcting method therefor are provided. The projection apparatus comprises a projection lens, an imaging unit and an illumination module. The illumination module comprises a light source, a color wheel and a controlling unit. The light source provides a light beam. The color wheel is disposed on an optical path of the light beam and the controlling unit is connected to the color wheel and the imaging unit. A plurality of color wheel indices is stored in the controlling unit. When the projection apparatus receives an image signal, the controlling unit selects one of the color wheel indices according to the received image signal and controls the imaging unit according to the selected color wheel index. The projection apparatus automatically selects the corresponding color wheel index according to the received image signal for projecting an image with good tints and color-level performance.

Abstract: A zoomable projection apparatus including a projection system, an optical zoom adjusting device and a zoom ratio readout device is provided. The projection system at least includes a zoom lens set and an image control device. The optical zoom adjusting device is connected with the zoom lens set for adjusting an optical zoom ratio of the zoom lens set. The zoom ratio readout device can be connected to or disposed around the zoom lens set and is connected with the image control device for displaying the optical zoom ratio of the zoom lens set in an image projected by the projection system via the image control device.

Abstract: A color wheel calibrating method being adapted for determining an optimum color wheel index of a color wheel of a projection apparatus is provided. The projection apparatus includes a light source, a control unit and a color wheel. The color wheel calibrating method includes the steps of: first, inputting a roughly estimated color wheel index to the control unit for controlling the rotation of the color wheel; measuring the luminance of the light beam emitted from the light source after passing through the color wheel and getting a testing waveform; comparing the testing waveform with an optimum waveform and adjusting the roughly estimated color wheel index till the testing waveform approaching the optimum waveform and thereby obtaining the optimum color wheel index.