Patents by Inventor Chih-Hsin Chang

Chih-Hsin Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240129766
    Abstract: A throttle control method for a mobile device include collecting input data, generating a first set of user experience indices according to the input data, and checking whether a user experience index of the first set of user experience indices satisfies a UEI threshold. The input data includes common information data, current configuration data and a plurality of throttle control parameters. Each user experience index of the first set of user experience indices is corresponding to at least one of throttle control parameter of the plurality of throttle control parameters.
    Type: Application
    Filed: April 10, 2023
    Publication date: April 18, 2024
    Applicant: MediaTek Singapore Pte. Ltd.
    Inventors: Hung-Yueh Chen, Byeng Hyun Kim, JUNG SHUP SHIN, Shih-Hsin Chen, Chih-Chieh Lai, Chung-Pi Lee, JUNGWOO LEE, Yu-Lun Chang
  • Publication number: 20240097034
    Abstract: A field effect transistor includes a substrate comprising a fin structure. The field effect transistor further includes an isolation structure in the substrate. The field effect transistor further includes a source/drain (S/D) recess cavity below a top surface of the substrate. The S/D recess cavity is between the fin structure and the isolation structure. The field effect transistor further includes a strained structure in the S/D recess cavity. The strain structure includes a lower portion. The lower portion includes a first strained layer, wherein the first strained layer is in direct contact with the isolation structure, and a dielectric layer, wherein the dielectric layer is in direct contact with the substrate, and the first strained layer is in direct contact with the dielectric layer. The strained structure further includes an upper portion comprising a second strained layer overlying the first strained layer.
    Type: Application
    Filed: November 29, 2023
    Publication date: March 21, 2024
    Inventors: Tsung-Lin Lee, Chih-Hao Chang, Chih-Hsin Ko, Feng Yuan, Jeff J. Xu
  • Publication number: 20240086612
    Abstract: An IC device includes first through third rows of fin field-effect transistors (FinFETs), wherein the second row is between and adjacent to each of the first and third rows, the FinFETs of the first row are one of an n-type or p-type, the FinFETs of the second and third rows are the other of the n-type or p-type, the FinFETs of the first and third rows include a first total number of fins, and the FinFETs of the second row include a second total number of fins one greater or fewer than the first total number of fins.
    Type: Application
    Filed: November 22, 2023
    Publication date: March 14, 2024
    Inventors: Po-Hsiang HUANG, Fong-Yuan CHANG, Clement Hsingjen WANN, Chih-Hsin KO, Sheng-Hsiung CHEN, Li-Chun TIEN, Chia-Ming HSU
  • Patent number: 11929434
    Abstract: A switch device includes a P-type substrate, a first gate structure, a first N-well, a shallow trench isolation structure, a first P-well, a second gate structure, a first N-type doped region, a second P-well, and a second N-type doped region. The first N-well is formed in the P-type substrate and partly under the first gate structure. The shallow trench isolation structure is formed in the first N-well and under the first gate structure. The first P-well is formed in the P-type substrate and under the first gate structure. The first N-type doped region is formed in the P-type substrate and between the first gate structure and the second gate structure. The second P-well is formed in the P-type substrate and under the second gate structure. The second N-type doped region is formed in the second P-well and partly under the second gate structure.
    Type: Grant
    Filed: April 15, 2022
    Date of Patent: March 12, 2024
    Assignee: eMemory Technology Inc.
    Inventors: Chih-Hsin Chen, Shih-Chen Wang, Tsung-Mu Lai, Wen-Hao Ching, Chun-Yuan Lo, Wei-Chen Chang
  • Patent number: 11912837
    Abstract: The present disclosure provides a thin film including a first thermoplastic polyolefin (TPO) elastomer which is anhydride-grafted. The present disclosure further provides a method for manufacturing the thin film, a laminated material and a method for adhesion.
    Type: Grant
    Filed: August 2, 2021
    Date of Patent: February 27, 2024
    Assignee: SAN FANG CHEMICAL INDUSTRY CO., LTD.
    Inventors: Chih-Yi Lin, Kuo-Kuang Cheng, Chi-Chin Chiang, Wen-Hsin Tai, Ming-Chen Chang
  • Patent number: 11776889
    Abstract: A semiconductor device package includes a carrier provided with a first conductive element, a second conductive element arranged on a semiconductor disposed on the carrier, and a second semiconductor device disposed on and across the first conductive element and the first semiconductor device, wherein the first conductive element having a surface that is substantially coplanar with a surface of the second conductive element.
    Type: Grant
    Filed: June 1, 2021
    Date of Patent: October 3, 2023
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Chih-Hsin Chang, Tsu-Hsiu Wu, Tsung-Yueh Tsai
  • Patent number: 11486695
    Abstract: The present invention provides a measurement device for grinding wheel. One or more thickness measurement device is disposed slidably on a platform. A spinning device is disposed on the platform. A grinding wheel is fixed on the spinning device. The spinning shaft spins the grinding wheel. The one or more thickness measurement device measures the flatness condition of the grinding wheel. Furthermore, according to the present invention, a diameter measurement device is disposed inside the platform and measures the roundness of the outer periphery of the grinding wheel. Since the structure can be disassembled easily, the whole measurement device for grinding wheel can be carried conveniently. In addition, measurements can be performed by users on the site where the grinding wheel is located for real-timely understanding the real size and wear condition of grinding wheel.
    Type: Grant
    Filed: December 4, 2020
    Date of Patent: November 1, 2022
    Assignee: Metal Industries Research & Development Centre
    Inventors: Chin-Kang Chen, Ching-An Lin, Chia-Ho Cheng, Sung-Liang Hsieh, Chih-Hsin Chang
  • Publication number: 20210296244
    Abstract: A semiconductor device package includes a carrier provided with a first conductive element, a second conductive element arranged on a semiconductor disposed on the carrier, and a second semiconductor device disposed on and across the first conductive element and the first semiconductor device, wherein the first conductive element having a surface that is substantially coplanar with a surface of the second conductive element.
    Type: Application
    Filed: June 1, 2021
    Publication date: September 23, 2021
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Chih-Hsin CHANG, Tsu-Hsiu WU, Tsung-Yueh TSAI
  • Publication number: 20210254965
    Abstract: The present invention provides a measurement device for grinding wheel. One or more thickness measurement device is disposed slidably on a platform. A spinning device is disposed on the platform. A grinding wheel is fixed on the spinning device. The spinning shaft spins the grinding wheel. The one or more thickness measurement device measures the flatness condition of the grinding wheel. Furthermore, according to the present invention, a diameter measurement device is disposed inside the platform and measures the roundness of the outer periphery of the grinding wheel. Since the structure can be disassembled easily, the whole measurement device for grinding wheel can be carried conveniently. In addition, measurements can be performed by users on the site where the grinding wheel is located for real-timely understanding the real size and wear condition of grinding wheel.
    Type: Application
    Filed: December 4, 2020
    Publication date: August 19, 2021
    Inventors: CHIN-KANG CHEN, CHING-AN LIN, CHIA-HO CHENG, SUNG-LIANG HSIEH, CHIH-HSIN CHANG
  • Patent number: 11024570
    Abstract: A semiconductor device package includes a carrier provided with a first conductive element, a second conductive element arranged on a semiconductor disposed on the carrier, and a second semiconductor device disposed on and across the first conductive element and the first semiconductor device, wherein the first conductive element having a surface that is substantially coplanar with a surface of the second conductive element.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: June 1, 2021
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Chih-Hsin Chang, Tsu-Hsiu Wu, Tsung-Yueh Tsai
  • Publication number: 20200303294
    Abstract: A semiconductor device package includes a carrier provided with a first conductive element, a second conductive element arranged on a semiconductor disposed on the carrier, and a second semiconductor device disposed on and across the first conductive element and the first semiconductor device, wherein the first conductive element having a surface that is substantially coplanar with a surface of the second conductive element.
    Type: Application
    Filed: March 19, 2019
    Publication date: September 24, 2020
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Chih-Hsin CHANG, Tsu-Hsiu WU, Tsung-Yueh TSAI
  • Patent number: 8490651
    Abstract: A fluid adjusting device is installed in a valve unit so as to control the volume or pressure of the fluid passing through the valve unit. The fluid adjusting device includes three parts retractably connected to each other and holes are defined through each of the three parts. By expanding or retracting the three parts, the holes can be exposed or hidden to adjust the volume or pressure of the fluid passing through the valve unit.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: July 23, 2013
    Assignee: Metal Industries Research & Development Centre.
    Inventors: Yeuan-Jong Cheng, Chih-Hsin Chang, Po-Yi Tseng
  • Publication number: 20120181472
    Abstract: A fluid adjusting device is installed in a valve unit so as to control the volume or pressure of the fluid passing through the valve unit. The fluid adjusting device includes three parts retractably connected to each other and holes are defined through each of the three parts. By expanding or retracting the three parts, the holes can be exposed or hidden to adjust the volume or pressure of the fluid passing through the valve unit.
    Type: Application
    Filed: December 21, 2011
    Publication date: July 19, 2012
    Applicant: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTRE.
    Inventors: Yeuan-Jong Cheng, Chih-Hsin Chang, Po-Yi Tseng