Patents by Inventor Chih-Kai Chen

Chih-Kai Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190273023
    Abstract: Generally, examples are provided relating to conductive features that include a barrier layer, and to methods thereof. In an embodiment, a metal layer is deposited in an opening through a dielectric layer(s) to a source/drain region. The metal layer is along the source/drain region and along a sidewall of the dielectric layer(s) that at least partially defines the opening. The metal layer is nitrided, which includes performing a multiple plasma process that includes at least one directional-dependent plasma process. A portion of the metal layer remains un-nitrided by the multiple plasma process. A silicide region is formed, which includes reacting the un-nitrided portion of the metal layer with a portion of the source/drain region. A conductive material is disposed in the opening on the nitrided portions of the metal layer.
    Type: Application
    Filed: March 1, 2018
    Publication date: September 5, 2019
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wei-Yip LOH, Chih-Wei CHANG, Hong-Mao LEE, Chun-Hsien HUANG, Yu-Ming HUANG, Yan-Ming TSAI, Yu-Shiuan WANG, Hung-Hsu CHEN, Yu-Kai CHEN, Yu-Wen CHENG
  • Patent number: 10395991
    Abstract: A method for fabricating semiconductor device includes the steps of: forming a first gate structure and a second gate structure on a substrate and an interlayer dielectric (ILD) layer around the first gate structure and the second gate structure; transforming the first gate structure into a first metal gate and the second gate structure into a second metal gate; removing part of the ILD layer between the first metal gate and the second metal gate to form a recess; forming a first spacer and a second spacer in the a recess; performing a first etching process to form a first contact hole; and performing a second etching process to extend the first contact hole into a second contact hole.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: August 27, 2019
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chih-Kai Hsu, Ssu-I Fu, Yu-Hsiang Hung, Chun-Ya Chiu, Chin-Hung Chen, Chi-Ting Wu, Yu-Hsiang Lin
  • Patent number: 10365494
    Abstract: An adjustment structure of a bridle including a bridle, rotating shaft, and a knob is provided. The bridle has a rack. The rotating shaft has a first ring gear and a second ring gear both around an axis, wherein the first ring gear is coupled to the rack, such that the rotating shall moves along the bridle by rotating about the axis itself. The knob is rotated about the axis and moved along the axis to be movably coupled to the rotating shaft. The knob has a third ring gear to be engaged with or released from the second ring gear by the knob moving along the axis. When the third ring gear is engaged with the second ring gear, the knob is forced to drive the rotating shaft to rotate about the axis.
    Type: Grant
    Filed: September 18, 2017
    Date of Patent: July 30, 2019
    Assignee: Acer Incorporated
    Inventors: Li Lin, Ker-Wei Lin, Chih-Kai Tu, Chun-Ta Chen, Chun-Yu Chen
  • Publication number: 20190221469
    Abstract: A method for fabricating semiconductor device includes the steps of: providing a substrate having a fin-shaped structure thereon; forming a single diffusion break (SDB) structure in the substrate to divide the fin-shaped structure into a first portion and a second portion; forming a first gate structure on the SDB structure; forming an interlayer dielectric (ILD) layer on the first gate structure; removing the first gate structure to form a first recess; and forming a dielectric layer in the first recess.
    Type: Application
    Filed: January 17, 2018
    Publication date: July 18, 2019
    Inventors: Chih-Kai Hsu, Ssu-I Fu, Chun-Ya Chiu, Chi-Ting Wu, Chin-Hung Chen, Yu-Hsiang Lin
  • Patent number: 10347526
    Abstract: A semiconductor structure and a method for forming the same are provided. The semiconductor structure includes a substrate, a gate structure, and a conductive element. The gate structure is on the substrate. The gate structure includes a gate electrode and a cap layer on the gate electrode. The conductive element is adjoined with an outer surface of the gate structure. The conductive element includes a lower conductive portion and an upper conductive portion electrically connected on the lower conductive portion and adjoined with the cap layer. The lower conductive portion and the upper conductive portion have an interface therebetween. The interface is below an upper surface of the cap layer.
    Type: Grant
    Filed: April 12, 2018
    Date of Patent: July 9, 2019
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chih-Kai Hsu, Ssu-I Fu, Chun-Ya Chiu, Chi-Ting Wu, Chin-Hung Chen, Yu-Hsiang Lin
  • Publication number: 20190206672
    Abstract: A semiconductor device with three transistors of same conductive type but different threshold voltage is provided in the present invention, wherein the first transistor includes a high-k dielectric layer, a first bottom barrier metal layer, a second bottom barrier metal layer, a work function metal layer and a low resistance metal. The second transistor includes the high-k dielectric layer, the first bottom barrier metal layer, the second bottom barrier metal layer and the low resistance metal, and a third transistor on the substrate. The third transistor includes the high-k dielectric layer, the first bottom barrier metal layer and the low resistance metal.
    Type: Application
    Filed: February 11, 2019
    Publication date: July 4, 2019
    Inventors: Chih-Kai Hsu, Ssu-I Fu, Chun-Ya Chiu, Chin-Hung Chen, Chi-Ting Wu, Yu-Hsiang Lin
  • Patent number: 10331789
    Abstract: A semantic analysis apparatus, method, and non-transitory computer readable storage medium thereof are provided. The semantic analysis apparatus performs phrase analysis on a Chinese character string to obtain several groups and semantically analyzes the groups to obtain at least one first probability distribution, wherein each first probability distribution has several first probability values corresponding to several tags one-to-one. The semantic analysis apparatus divides the Chinese character string into several Chinese characters and semantically analyzes the Chinese characters to obtain at least one second probability distribution, wherein each second probability distribution has several second probability values corresponding to the tags one-to-one.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: June 25, 2019
    Assignee: Institute For Information Industry
    Inventors: Yun-Kai Hsu, Tsung-Chieh Chen, Chih-Li Huo, Keng-Wei Hsu
  • Publication number: 20190171198
    Abstract: A semiconductor manufacturing system includes an operating terminal, a first controller, and a plurality of second controllers. The operating terminal controls a main controller. Each of the plurality of second controllers is electrically connected to the first controller. In an initial or default state, the operating terminal controls the first controller as a main controller, and when the first controller fails, the operating terminal controls one of the plurality of the second controllers as a main controller, the others of the plurality of second controllers being controlled by the main controller.
    Type: Application
    Filed: May 28, 2018
    Publication date: June 6, 2019
    Inventors: YI-CHUN CHIU, CHUN-KAI HUANG, CHIH-CHENG LU, CHUN-CHUNG CHEN, CHEN-TSU FU, SHENG-FU TSAI
  • Publication number: 20190172752
    Abstract: A method for fabricating semiconductor device includes the steps of: forming a first gate structure and a second gate structure on a substrate and an interlayer dielectric (ILD) layer around the first gate structure and the second gate structure; transforming the first gate structure into a first metal gate and the second gate structure into a second metal gate; removing part of the ILD layer between the first metal gate and the second metal gate to form a recess; forming a first spacer and a second spacer in the a recess; performing a first etching process to form a first contact hole; and performing a second etching process to extend the first contact hole into a second contact hole.
    Type: Application
    Filed: December 4, 2017
    Publication date: June 6, 2019
    Inventors: Chih-Kai Hsu, Ssu-I Fu, Yu-Hsiang Hung, Chun-Ya Chiu, Chin-Hung Chen, Chi-Ting Wu, Yu-Hsiang Lin
  • Publication number: 20190157392
    Abstract: A method of fabricating a semiconductor device is provided. In the method, a gate structure is formed on a semiconductor substrate. A photolithography process is performed with a mask having two transparent regions to form a photoresist layer having two openings in the semiconductor substrate. A first photoresist layer of the photoresist layer between the two openings is aligned to the gate structure and formed on the gate structure. The width of the first photoresist layer is shorter than the width of the gate structure such that a first side portion and a second side portion of the gate structure are exposed from both sides of the first photoresist layer, respectively. Next, an ion implantation process is performed to form lightly doped drain regions in the semiconductor substrate which are on two opposite sides of the gate structure of the photoresist layer.
    Type: Application
    Filed: November 22, 2017
    Publication date: May 23, 2019
    Applicant: Vanguard International Semiconductor Corporation
    Inventors: Chih-Wei LIN, Tsung-Han LIN, Chao-Wei WU, Yen-Kai CHEN
  • Publication number: 20190157103
    Abstract: A planarization method and a CMP method are provided. The planarization method includes providing a substrate with a first region and a second region having different degrees of hydrophobicity or hydrophilicity and performing a surface treatment to the first region to render the degrees of hydrophobicity or hydrophilicity in proximity to that of the second region. The CMP method includes providing a substrate with a first region and a second region; providing a polishing slurry on the substrate, wherein the polishing slurry and the surface of the first region have a first contact angle, and the polishing slurry and the surface of the first region have a second contact angle; modifying the surface of the first region to make a contact angle difference between the first contact angle and the second contact angle equal to or less than 30 degrees.
    Type: Application
    Filed: June 8, 2018
    Publication date: May 23, 2019
    Inventors: TUNG-KAI CHEN, CHING-HSIANG TSAI, KAO-FENG LIAO, CHIH-CHIEH CHANG, CHUN-HAO KUNG, FANG-I CHIH, HSIN-YING HO, CHIA-JUNG HSU, HUI-CHI HUANG, KEI-WEI CHEN
  • Publication number: 20190143053
    Abstract: An aerosol generating apparatus includes a vial, a cap assembly and a receptacle. The vial stores liquid medicament and includes a puncturable seal held in position by a retaining ring. The cap assembly includes an actuator with an interior bore extending therethrough, a perforated membrane coupled to the actuator, a fastener and a first mating element. The fastener is adapted to detachably secure the cap assembly to the vial such that the perforated membrane aligns with the puncturable seal. The receptacle receives the cap assembly with the vial. The receptacle includes a driving element and a second mating element capable of mating with the first mating element. The driving element aligns and communicates with the perforated membrane when the receptacle engages the cap assembly. The actuator pierces the puncturable seal to displace the liquid medicament through the interior bore to the perforated membrane and the driving element to generate aerosol.
    Type: Application
    Filed: December 5, 2017
    Publication date: May 16, 2019
    Inventors: Yi-Tong Chen, Chih-Wei Lu, Ting-Kai Tsai, Po-Chuan Chen
  • Publication number: 20190139802
    Abstract: A front opening unified pod (FOUP) loading and air filling system comprises a FOUP loading device and an air filling device. The FOUP loading device is configured to load and unload a FOUP, and comprises a substrate and a controller. The substrate comprises a frame, a bearing platform installed on the frame, and a cavity under the bearing platform. The bearing platform is configured to support the FOUP. The controller and the air filling device are accommodated in the cavity. The air filling device is connected to the FOUP.
    Type: Application
    Filed: December 7, 2017
    Publication date: May 9, 2019
    Inventors: YI-CHUN CHIU, CHUN-KAI HUANG, CHIH-CHENG LU, CHUN-CHUNG CHEN, CHEN-TSU FU, SHENG-FU TSAI
  • Publication number: 20190056368
    Abstract: A device includes a main body and at least one actuating and sensing module. A length of the main body is 50˜70 mm. A width of the main body is 25˜30 mm. A height of the main body is 9˜15 mm. The actuating and sensing module is disposed in the main body. The actuating and sensing module includes a carrier, at least one sensor, at least one actuating device, a driving and transmitting controller and a battery. The sensor, the actuating device, the driving and transmitting controller and the battery are disposed on the carrier. The actuating device is disposed on one side of the sensor. The actuating device includes a guiding channel. The actuating device is enabled to transport fluid to flow toward the sensor through the guiding channel so as to make the fluid measured by the sensor.
    Type: Application
    Filed: July 24, 2018
    Publication date: February 21, 2019
    Applicant: Microjet Technology Co., Ltd.
    Inventors: Hao-Jan MOU, Ching-Sung LIN, Chih-Kai CHEN, Chi-Feng HUANG, Hsuan-Kai CHEN
  • Publication number: 20180343924
    Abstract: An electronic cigarette includes a casing, a mouthpiece, a sensing unit, an atomizing member, a liquid storage member, a fluid transportation device and a power supply device. When the sensing unit senses an airflow, the sensing unit transmits an enabling signal to the power supply device and the power supply device accordingly controls the fluid transportation device to operate. The fluid transportation device guides the cigarette liquid out from the liquid storage member through an intake passage and transfers the cigarette liquid to a liquid conduit of the atomizing member through an outtake passage. The cigarette liquid transferred to the liquid conduit infiltrates out the through holes so as to be transferred to the electric heater of the atomizing member at a fixed amount. Consequently, an atomized vapor is generated and the user can inhale the atomized vapor through the opening of the mouthpiece.
    Type: Application
    Filed: May 24, 2018
    Publication date: December 6, 2018
    Applicant: Microjet Technology Co., Ltd.
    Inventors: Ching-Sung LIN, Chih-Kai CHEN, Shih-Chang CHEN, Li-Pang MO, Hsuan-Kai CHEN, Yung-Lung HAN, Chi-Feng HUANG
  • Patent number: 10005240
    Abstract: A powder recycling system for a three-dimensional rapid prototyping apparatus is provided. The powder recycling system includes a sealed main body, a negative pressure generator, an air pressure generator, a lighting unit and a heater. When an excess powder removing process is performed to remove excess powder from a three-dimensional object, the excess powder is sieved by a screen mesh and collected by a powder collector. Consequently, the excess powder is recycled.
    Type: Grant
    Filed: January 6, 2016
    Date of Patent: June 26, 2018
    Assignee: MICROJET TECHNOLOGY CO., LTD
    Inventors: Chih-Kai Chen, Chi-Feng Huang
  • Patent number: 9937670
    Abstract: A powder filtering mechanism includes a connecting part, a main body, a duct, a suction device and a bracket. The connecting part is in communication with a powder inlet. Moreover, plural filters are disposed within an accommodation space of the main body. The suction device is in communication with the main body. The bracket supports a micro-particle adsorption structure. During operation of the suction device, flying dust of excess construction powder is inhaled into the powder inlet, and a portion of the flying dust is transferred to the accommodation space. After the portion of the flying dust is filtered by the plural filters in multiple filtering steps, micro-particles of flying dust passing through the plural filters are transferred to the micro-particle adsorption structure so as to be adsorbed by the micro-particle adsorption structure.
    Type: Grant
    Filed: February 22, 2016
    Date of Patent: April 10, 2018
    Assignee: Microjet Technology Co., Ltd.
    Inventors: Kwo-Yuan Shi, Chih-Kai Chen, Jheng-Bin Chen
  • Patent number: 9931792
    Abstract: A powder recycling machine includes a casing, a powder collector, a dust-sucking system and a dust-removing system. An accommodation space within the casing is divided into a first space and a second space by a partition plate. The powder collector is disposed within the first space for collecting excess powder from the first space. The dust-sucking system includes a connector, a cyclone separator and a first suction device. The connector, the cyclone separator, the first suction device and the powder collector are sequentially in communication with each other through plural transmission ducts. The dust-removing system includes a second suction device. The first space, the second suction device and the powder collector are sequentially in communication with each other through plural guiding ducts. After the excess powder suspended in the first space is introduced into the dust-removing system, the excess powder is transferred to the powder collector.
    Type: Grant
    Filed: February 22, 2016
    Date of Patent: April 3, 2018
    Assignee: Microjet Technology Co., Ltd.
    Inventors: Kwo-Yuan Shi, Chih-Kai Chen, Chi-Feng Huang
  • Publication number: 20170134207
    Abstract: Signaling and feedback schemes of channel variation information from WLAN receiver are proposed. WLAN receiver performs channel tracking and obtains channel variation information. The signaling and feedback of channel variation information can help WLAN transmitter to decide when to apply travelling pilots or mid-amble in the transmission. Furthermore, the channel variation information can assist WLAN transmitter for scheduling the next transmission properly and thereby enhancing the system performance of WLAN.
    Type: Application
    Filed: November 3, 2016
    Publication date: May 11, 2017
    Inventors: Jianhan Liu, Chih-Kai Chen, Tianyu Wu, Thomas Edward PARE, JR.
  • Patent number: 9586365
    Abstract: A powder recycling system includes a powder feeder, a remaining powder collector, a bridge breaker, a block powder filter, a cyclone separator, a particulate filter cleaner, an air pressure generation device and an electrostatic precipitator. The powder feeder provides a construction powder to a construction platform. The remaining powder collector for collects the remaining powder. The cyclone separator is used to separate the large-size powdery particles and the small-size powdery particles of the remaining powder from each other through a rotating gaseous stream. The large-size powdery particles fall down to the powder feeder due to gravity, and the small-size powdery particles of the remaining powder is removed from the rotating gaseous stream and transmitted to the particulate filter cleaner. After the small-size powdery particles of the remaining powder are filtered by the particulate filter cleaner, the suspended small-size powdery particles are transmitted to the electrostatic precipitator.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: March 7, 2017
    Assignee: MICROJET TECHNOLOGY CO., LTD.
    Inventors: Chang-Chih Chen, Chih-Kai Chen, Kwo-Yuan Shi, Chi-Feng Huang