Abstract: A semiconductor structure includes an insulator, a semiconductor fin, a gate stack, a gate contact, a source/drain material, and a source/drain contact structure. The semiconductor fin protrudes from the insulator. The gate stack is disposed on the semiconductor fin and the insulator. The gate contact is disposed on and electrically connected to the gate stack. The source/drain material is disposed on the semiconductor fin. The source/drain contact structure is disposed on and electrically connected to the source/drain material. The semiconductor fin extends along a first direction, the gate stack extends along a second direction different from the first direction. An offset S in the second direction between the gate contact and the source/drain contact structure satisfies: 0<S?(W/2+D/2), wherein W is a width of the semiconductor fin, and D is a dimension of the gate contact.

Abstract: An ultraviolet cleaning water device has a cleaning water cylinder, a temperature sensor device, an ultraviolet ray tube inserted in the cleaning water cylinder, a plurality of tube pins disposed on a bottom of the ultraviolet ray tube, a socket connected to the bottom of the ultraviolet ray tube, a power source device, a stabilizer, a cable connected to the power source device and the stabilizer, a wire connected to the power source device and the temperature sensor device, and a plurality of conductive pins connected to the power source device and the socket to communicate with the tube pins. The cleaning water cylinder has a channel to receive the temperature sensor device.