Abstract: An ionic compound, an absorbent and an absorption device are provided. The ionic compound has a structure represented by Formula (I): ABn, ??Formula (I) wherein A is B is R1, R2, R3, R4, R5, and R6 are independently H, C1-6 alkyl group; and n is 1 or 2.

Abstract: One or more computing devices, systems, and/or methods for cross-domain action prediction are provided. Action sequence embeddings are generated based upon a textual embedding and a graph embedding utilizing past user action sequences corresponding to sequences of past actions performed by users across a plurality of domains. An autoencoder is trained to utilize the action sequence embeddings to project the action sequence embeddings to obtain intent space vectors. A service switch classifier is trained using the intent space vectors. In response to the service switch classifier predicting that a current user will switch from a current domain to a next domain, the current user is provided with a recommendation of an action corresponding to the next domain.

Abstract: One or more computing devices, systems, and/or methods for generating a list of suggested queries associated with one or more keywords are provided. For example, one or more keywords may be received via a search interface. A plurality of queries associated with the one or more keywords may be determined based upon the one or more keywords and a historical query database. A plurality of relationship scores associated with the plurality of queries may be generated based upon a plurality of search sessions associated with the historical query database. The historical query database may be analyzed to determine a plurality of click rates associated with the plurality of queries. A list of suggested queries may be generated based upon the plurality of relationship scores and the plurality of click rates.

Abstract: A system for chucking and de-chucking a work piece comprises a wafer stage having a chuck support for supporting a chuck. The wafer stage further comprises a chuck mounted on the chuck support for receiving and attaching the work piece thereto; a support lift means for supporting the work piece; a driving means coupled to the support lift means for gradually raising the support lift means to contact the work piece in response to a variable quantity; a controller for receiving the variable quantity; and a regulating means coupled to the driving means and to the controller, the regulating means for controlling the variable quantity going to the driving means when a predetermined variable quantity is detected.

Abstract: A system for chucking and de-chucking a work piece comprises a wafer stage having a chuck support for supporting a chuck. The wafer stage further comprises a chuck mounted on the chuck support for receiving and attaching the work piece thereto; a support lift means for supporting the work piece; a driving means coupled to the support lift means for gradually raising the support lift means to contact the work piece in response to a variable quantity; a controller for receiving the variable quantity; and a regulating means coupled to the driving means and to the controller, the regulating means for controlling the variable quantity going to the driving means when a predetermined variable quantity is detected.

Abstract: A wafer stage installed in a process chamber for safely dechucking a wafer is provided. In one embodiment, the wafer stage comprises: a chuck support for supporting a chuck; a chuck mounted on the chuck support for receiving and attaching a wafer thereto; a support lift means for supporting the wafer; a driving means coupled to the support lift means for gradually raising the support lift means to contact the wafer in response to a variable quantity; a sensor attached to the driving means for detecting a change in the variable quantity; and a controller for controlling the variable quantity to the driving means when a predetermined variable quantity is detected in comparison to the change in the variable quantity for a predetermined time.

Abstract: A wafer stage installed in a process chamber for safely dechucking a wafer is provided. In one embodiment, the wafer stage comprises: a chuck support for supporting a chuck; a chuck mounted on the chuck support for receiving and attaching a wafer thereto; a support lift means for supporting the wafer; a driving means coupled to the support lift means for gradually raising the support lift means to contact the wafer in response to a variable quantity; a controller for receiving the variable quantity; and a regulating means coupled to the driving means and to the controller, the regulating means for controlling the variable quantity going to the driving means when a predetermined variable quantity is detected.

Abstract: A gas burner is provided with a nozzle. The nozzle includes a joint section, an annular rib, an eddy-producing device and an outlet section along an axis. The joint section includes a gas inlet channel defined therein along the axis. The outlet section extends from the joint section. The outlet section includes a wall made of adequate thickness and formed between an external side and an internal side along an axis in perpendicular to the axis. A gas/air mixture channel is defined in the wall along the axis. The eddy-producing device includes air inlet channels each extending throughout the wall not along a radius in perpendicular to the axis. The annular rib extends on the internal side of the outlet section and includes an aperture through which the gas inlet channel is in communication with the gas/air mixture channel.

Abstract: A wafer stage installed in a process chamber for safely dechucking a wafer is provided. In one embodiment, the wafer stage comprises: a chuck support for supporting a chuck; a chuck mounted on the chuck support for receiving and attaching a wafer thereto; a support lift means for supporting the wafer; a driving means coupled to the support lift means for gradually raising the support lift means to contact the wafer in response to a variable quantity; a sensor attached to the driving means for detecting a change in the variable quantity; and a controller for controlling the variable quantity to the driving means when a predetermined variable quantity is detected in comparison to the change in the variable quantity for a predetermined time.

Abstract: A wafer stage installed in a process chamber for safely dechucking a wafer is provided. In one embodiment, the wafer stage comprises: a chuck support for supporting a chuck; a chuck mounted on the chuck support for receiving and attaching a wafer thereto; a support lift means for supporting the wafer; a driving means coupled to the support lift means for gradually raising the support lift means to contact the wafer in response to a variable quantity; a controller for receiving the variable quantity; and a regulating means coupled to the driving means and to the controller, the regulating means for controlling the variable quantity going to the driving means when a predetermined variable quantity is detected.

Abstract: A reflective and a transflective liquid crystal display device and a manufacturing method thereof are provided. The manufacturing method includes the following steps. First, a substrate structure of a reflective or a transflective liquid crystal display device is provided. Next, a reflection layer is formed over the substrate structure, a protection layer is formed over the reflection layer, and a photoresist layer is formed over the protection layer. Then, the photoresist layer is patterned to form a patterned photoresist layer, the protection layer is patterned to form a patterned protection layer, and the reflection layer is patterned to form a patterned reflection layer. Thereafter, the patterned photoresist layer is removed.

Abstract: A reflective and a transflective liquid crystal display device and a manufacturing method thereof are provided. The manufacturing method includes the following steps. First, a substrate structure of a reflective or a transflective liquid crystal display device is provided. Next, a reflection layer is formed over the substrate structure, a protection layer is formed over the reflection layer, and a photoresist layer is formed over the protection layer. Then, the photoresist layer is patterned to form a patterned photoresist layer, the protection layer is patterned to form a patterned protection layer, and the reflection layer is patterned to form a patterned reflection layer. Thereafter, the patterned photoresist layer is removed.

Abstract: In a multi-layer video management and display method carried out on the networks, configuration parameters are set for a plurality of nodes on the networks so that these nodes can be divided into several father layers and several son layers. A root is also set for a network matrix mode. Connection between every two nodes is achieved through the network. The root registers to a registry center to get an authorized number of nodes. Each node then gets authorization from the root. A node therefore can remotely control the nodes at son layers belonging to it and get video images via the networks to accomplish easy expansion and integration and also have the advantages of providing distributed architecture and central management.

Abstract: The present invention provides a ventilation system and method that operates to remove outgassing of chemicals formed on a wafer during a wafer fabrication process to prevent contamination in a sealed wafer handling chamber. More particularly, the present invention discloses a ventilation system having a hood body having a gas supply conduit attached to a sealed outer side chamber of the ventilation hood such that contaminating particles in an interior of the hood are carried out by a purge gas flown into the hood interior through an inlet of the hood connected to the gas supply conduit into a facility vacuum exhaust system attached to an outlet of the hood. Preferably, the chamber is a load-lock chamber that operates to perform load lock processing on wafers and further operates to load and unload wafers to another location for further processing after using the ventilation system.

Abstract: An assembled sluice gate for flood-prevention and water-blocking includes two wall posts, a plurality of sluice gates and a connection plate, wherein the two wall posts respectively and fitly mount with a left and a right grooved boards on a doorframe and with the connected sluice gates; the connection plate is fixed between two sluice gates to form the entire body into a piece of vertical door wall which is covered by a top cover at the upper aspect thereof. A plurality of tight retaining belts fasten the top cover and a fixed groove at the lower portion of the doorframe thereby enabling the door wall to block the water and resist a huge water pressure so as to prevent the water from flowing into the houses or the basements.