Patents by Inventor Chih-Peng Lu

Chih-Peng Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Remover solution
    Publication number: 20060166846
    Abstract: A cleaning (stripping) solution comprises a mixture of a first compound, a second compound and water. The cleaning solution can effectively remove metal oxides without damaging the surface of the metal materials. The cleaning solution can successfully remove both organic and inorganic residues.
    Type: Application
    Filed: August 19, 2002
    Publication date: July 27, 2006
    Inventors: Ying-Hao Li, Chih-Peng Lu
  • Method for producing high-purity hydrochloric acid
    Patent number: 6793905
    Abstract: This invention relates to a novel method, which can be carried out according to industrial standards, for producing high-purity hydrochloric acid with a very low particle content, for use in the production of semiconductors.
    Type: Grant
    Filed: April 8, 2002
    Date of Patent: September 21, 2004
    Assignee: Merck Patent GmbH
    Inventors: Werner Büttner, Martin Hostalek, Ching-Jung Kan, Chih-Peng Lu
  • Method for producing high-purity sulphuric acid
    Patent number: 6740302
    Abstract: The invention relates to a novel method for producing high-purity sulfuric acid for use in the semiconductor industry. The method comprises the addition of a hydrogen peroxide solution to an engineered oelum in order to reduce the SO2 concentration, evaporation of the SO3 and separation of acid traces. The high-purity SO3 is then enriched with inert gas and the SO3 is absorbed into sulfuric acid.
    Type: Grant
    Filed: June 26, 2002
    Date of Patent: May 25, 2004
    Assignee: Merck Patent GmbH
    Inventors: Martin Hostalek, Werner Büttner, Rolf Hafner, Chih-Peng Lu, Ching-Jung Kan, Ekkehart Seitz, Ernst Friedel
  • Method for producing high-purity sulphuric acid
    Publication number: 20020192144
    Abstract: The invention relates to a novel method for producing high-purity sulfuric acid for use in the semiconductor industry. The method comprises the addition of a hydrogen peroxide solution to an engineered oelum in order to reduce the SO2 concentration, evaporation of the SO3 and separation of acid traces. The high-purity SO3 is then enriched with inert gas and the SO3 is absorbed into sulfuric acid.
    Type: Application
    Filed: June 26, 2002
    Publication date: December 19, 2002
    Inventors: Martin Hostalek, Werner Buttner, Rolf Hafner, Chih-Peng Lu, Ching-Jung Kan, Erkehart Seitz, Ernst Friedel