Patents by Inventor Chih-Ping Yang

Chih-Ping Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7445472
    Abstract: A safety electric socket in which two spring-supported doorplates are respectively pivoted to a holder block to block the neutral and hot slots against outside dust and water and to stop the spring-supported on/off switching button from downward movement. The doorplates are opened for allowing downward movement of the switching button to switch on power supply when the neutral and hot blades of an electric plug are respectively inserted into the neutral and hot slots.
    Type: Grant
    Filed: October 11, 2007
    Date of Patent: November 4, 2008
    Inventors: Fu-Hsiang Huang, Te-Lin Chan, Chih-Ping Yang
  • Publication number: 20070196333
    Abstract: A composition of human interferon-alpha (IFN-?) subtypes produced from human lymphoblastoid cells is disclosed. These purified IFN-? composition comprise higher specific activities and may be applied in the treatment of cancers, viruses, and immuno diseases.
    Type: Application
    Filed: February 23, 2006
    Publication date: August 23, 2007
    Inventors: Fu-Yung Lin, Chih-Ping Yang, Shir-Ly Huang, Ching-Yuan Lee
  • Patent number: 6379574
    Abstract: The present disclosure pertains to an integrated post-etch treatment method which is performed after a dielectric etch process. Using the method of the invention, byproducts formed on the sidewalls of contact vias during the dielectric etch process can be removed efficiently. The method of the invention also reduces or eliminates the problem of polymer accumulation on process chamber surfaces. An overlying photoresist layer and anti-reflection layer are removed during the performance of the post-etch treatment method. Typically, after the etch of a dielectric material to define pattern or interconnect filling spaces, a series of post-etch treatment steps is performed to remove residues remaining on the wafer after the dielectric etch process. According to the method of the present invention, a post-etch treatment method including one or more steps is performed after the dielectric etch process, preferably within the same processing chamber in which the dielectric etch process was performed.
    Type: Grant
    Filed: May 26, 1999
    Date of Patent: April 30, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Hui Ou-Yang, Chih-Ping Yang, Lin Ye, Robert W. Wu, Chih-Pang Chen, You-Neng Cheng, Yang Chan-Lon, Tong-Yu Chen
  • Patent number: 5686486
    Abstract: The present invention relates to compounds of formula I which are 4-hydroxy-benzopyran-2-ones and 4-hydroxy-cycloalkyl?b!pyran-2-ones useful for inhibiting a retrovirus in a mammalian cell infected with said retrovirus. ##STR1## Wherein R.sub.10 and R.sub.
    Type: Grant
    Filed: August 4, 1995
    Date of Patent: November 11, 1997
    Assignee: Pharmacia & Upjohn Company
    Inventors: Paul Kosta Tomich, Michael John Bohanon, Steven Ronald Turner, Joseph Walter Strohbach, Suvit Thaisrivongs, Richard C. Thomas, Karen Rene Romines, Chih-Ping Yang, Paul Adrian Aristoff, Harvey Irving Skulnick, Paul D. Johnson, Ronald B. Gammill, Qingwei Zhang, Gordon L. Bundy, David John Anderson, Lee S. Banitt