Abstract: A light-emitting diode chip includes an illuminating body and a first phosphor layer. The first phosphor layer is disposed on the illuminating body, and the first phosphor layer includes multiple first phosphor powder groups and multiple second phosphor powder groups. The illuminating body has a first emission wavelength, the first phosphor powder groups have a second emission wavelength, and the second phosphor powder groups have a third emission wavelength. The first wavelength is smaller than the second emission wavelength, and the second emission wavelength is smaller than the third emission wavelength.

Abstract: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.

Abstract: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.

Abstract: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.

Abstract: The present invention provides a composite light guiding curved surface structure, comprising a structure body and at least one light source. The structure body comprises a light-receiving surface being provided with a plurality of curved surfaces formed thereon, each of which being provided with a plurality of micro lenses. Each micro lens is further provided with a plurality of sub-wavelength anti-reflecting structures. The sub-wavelength anti-reflecting structures also cover the entire curved surface among lenses. At least one light source is disposed on one side of the light-receiving surface to generate a light field projecting to each of the curved surfaces on the light-receiving surface. In the present invention, the micro lens is capable of increasing the diffusing angle for light diffusion; meanwhile, the sub-wavelength anti-reflecting structures are capable of increasing the light transmission efficiency to reduce loss of light at the interface and enhance the utilization of light.

Abstract: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.