Patents by Inventor Chih-Ta CHU

Chih-Ta CHU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11923429
    Abstract: A semiconductor device and method for forming the semiconductor device are provided. In some embodiments, a semiconductor substrate comprises a device region. An isolation structure extends laterally in a closed path to demarcate the device region. A first source/drain region and a second source/drain region are in the device region and laterally spaced. A sidewall of the first source/drain region directly contacts the isolation structure at a first isolation structure sidewall, and remaining sidewalls of the first source/drain region are spaced from the isolation structure. A selectively-conductive channel is in the device region, and extends laterally from the first source/drain region to the second source/drain region. A plate comprises a central portion and a first peripheral portion. The central portion overlies the selectively-conductive channel, and the first peripheral portion protrudes from the central portion towards the first isolation structure sidewall.
    Type: Grant
    Filed: August 18, 2021
    Date of Patent: March 5, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chih-Chang Cheng, Fu-Yu Chu, Ming-Ta Lei, Ruey-Hsin Liu, Shih-Fen Huang
  • Patent number: 9823795
    Abstract: A plurality of first touch patterns of a touch substrate are disposed separately and disposed on the substrate along a first direction. A plurality of second touch patterns are separated from each other and disposed on the substrate along a second direction and interlace with the first touch patterns. One of the first touch patterns includes a plurality of first main portions extended along the second direction, a plurality of branch portions connected to the first main portions and extended along the first direction, and a plurality of first protruding portions connected to the branch portions and extended along the second direction. The first main portions and the first protruding portions are respectively disposed on two ends of the branch portions. The branch portion includes a middle section and two extending sections, and the minimum width of the middle section is less than that of the extending sections.
    Type: Grant
    Filed: June 1, 2015
    Date of Patent: November 21, 2017
    Assignee: INNOLUX CORPORATION
    Inventors: Chih-Ta Chu, Chia-Hsiung Chang, Yang-Chen Chen
  • Publication number: 20160124543
    Abstract: A plurality of first touch patterns of a touch substrate are disposed separately and disposed on the substrate along a first direction. A plurality of second touch patterns are separated from each other and disposed on the substrate along a second direction and interlace with the first touch patterns. One of the first touch patterns includes a plurality of first main portions extended along the second direction, a plurality of branch portions connected to the first main portions and extended along the first direction, and a plurality of first protruding portions connected to the branch portions and extended along the second direction. The first main portions and the first protruding portions are respectively disposed on two ends of the branch portions. The branch portion includes a middle section and two extending sections, and the minimum width of the middle section is less than that of the extending sections.
    Type: Application
    Filed: June 1, 2015
    Publication date: May 5, 2016
    Inventors: Chih-Ta CHU, Chia-Hsiung CHANG, Yang-Chen CHEN