Patents by Inventor Chih-Ta Wang

Chih-Ta Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • MODIFIED POLYURETHANE MATERIAL AND METHOD FOR MANUFACTURING THE SAME
    Publication number: 20250034312
    Abstract: A modified polyurethane material and a method for manufacturing the same are provided. A dianhydride is added into an aliphatic diisocyanate to form a liquid reactant. A solvent is absent from the liquid reactant. An oligomerization is implemented onto the liquid reactant so as to form an oligomer having a terminal isocyanate group. A polyol and a curative are added into the oligomer having the terminal isocyanate group for a polymerization so as to form the modified polyurethane. Based on a total weight of the modified polyurethane being 100 wt %, a content of a hard segment of the modified polyurethane ranges from 15 wt % to 45 wt %.
    Type: Application
    Filed: June 25, 2024
    Publication date: January 30, 2025
    Inventors: CHIH-LUNG LIN, YI-JYUN LOU, WEN-TENG CHANG, YU-RU WANG, CHEN-TA CHEN
  • Method for processing photoresist
    Publication number: 20050147926
    Abstract: Disclosed is a method for processing photoresist. The method of the present invention performs Ar plasma process to the photoresist after or before the photoreisist is formed into a pattern to make the photoresist dense.
    Type: Application
    Filed: January 2, 2004
    Publication date: July 7, 2005
    Applicant: Nanya Technology Corporation
    Inventors: Hsiu-Chun Lee, Tse-Yao Huang, Yi-Nan Chen, Chih-Ta Wang