Patents by Inventor Chih-Tao Chien

Chih-Tao Chien has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithography mask with an amorphous capping layer
    Patent number: 11442356
    Abstract: A multi-layer reflective structure is disposed over the substrate. An amorphous capping layer is disposed over the multi-layer reflective structure. The amorphous capping layer may contain ruthenium, oxygen, niobium, nitrogen, tantalum, or zirconium. An amorphous layer may also be disposed between the multi-layer reflective structure and the amorphous capping layer. The amorphous layer includes amorphous silicon, amorphous silicon oxide, or amorphous silicon nitride.
    Type: Grant
    Filed: May 11, 2020
    Date of Patent: September 13, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hsin-Chang Lee, Pei-Cheng Hsu, Chih-Tao Chien, Ming-Wei Chen, Ta-Cheng Lien
  • Lithography Mask with an Amorphous Capping Layer
    Publication number: 20210349386
    Abstract: A multi-layer reflective structure is disposed over the substrate. An amorphous capping layer is disposed over the multi-layer reflective structure. The amorphous capping layer may contain ruthenium, oxygen, niobium, nitrogen, tantalum, or zirconium. An amorphous layer may also be disposed between the multi-layer reflective structure and the amorphous capping layer. The amorphous layer includes amorphous silicon, amorphous silicon oxide, or amorphous silicon nitride.
    Type: Application
    Filed: May 11, 2020
    Publication date: November 11, 2021
    Inventors: Hsin-Chang Lee, Pei-Cheng Hsu, Chih-Tao Chien, Ming-Wei Chen, Ta-Cheng Lien