Patents by Inventor Chih-Ting Li

Chih-Ting Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240149057
    Abstract: A device for treating a user's skin using plasma is provided. The device comprises a plasma generation assembly and a power supply. The plasma generation assembly comprises a discharge electrode including a first surface; a first dielectric material layer provided on the first surface of the discharge electrode and the first surface, a ground electrode surrounding the discharge electrode, and an insulation member spacing around the discharge electrode from the ground electrode. The power supply configured to apply power to the plasma generation assembly so that plasma is generated from the first surface of the discharge electrode to the ground electrode and between the first dielectric material layer and the user's skin.
    Type: Application
    Filed: November 4, 2022
    Publication date: May 9, 2024
    Inventors: HUI-FANG LI, YU-TING LIN, CHUN-HAO CHANG, CHIH-TUNG LIU, CHUN-PING HSIAO, YU-PIN CHENG
  • Publication number: 20240126275
    Abstract: The present invention is directed to an obstacle avoidance system for an unmanned vehicle, comprising: an obstacle sensing module provided at a vehicle body; a vehicle-mounted computer provided at the vehicle body and electrically connected to the obstacle sensing module; a control module provided at the vehicle body and electrically connected to the vehicle-mounted computer; and a power source provided at the vehicle body and electrically connected to the obstacle sensing module, the vehicle-mounted computer and the control module.
    Type: Application
    Filed: October 5, 2023
    Publication date: April 18, 2024
    Inventors: Tsung-Yuan Wang, Chih-Ting Li, Shou-Hsien Wang
  • Patent number: 11942550
    Abstract: A method for manufacturing a nanosheet semiconductor device includes forming a poly gate on a nanosheet stack which includes at least one first nanosheet and at least one second nanosheet alternating with the at least one first nanosheet; recessing the nanosheet stack to form a source/drain recess proximate to the poly gate; forming an inner spacer laterally covering the at least one first nanosheet; and selectively etching the at least one second nanosheet.
    Type: Grant
    Filed: February 24, 2021
    Date of Patent: March 26, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chien-Chang Su, Yan-Ting Lin, Chien-Wei Lee, Bang-Ting Yan, Chih Teng Hsu, Chih-Chiang Chang, Chien-I Kuo, Chii-Horng Li, Yee-Chia Yeo
  • Publication number: 20240096986
    Abstract: A method includes forming a first gate spacer and a second gate spacer on a sidewall of a first gate structure. The first gate spacer is between the second gate spacer and the first gate structure. A first interlayer dielectric (ILD) layer is formed to surround the first gate spacer, the second gate spacer, and the first gate structure. A portion of the second gate spacer and a portion of the first ILD layer are removed simultaneously. A top surface of the second gate spacer is lower than a top surface of the first ILD layer.
    Type: Application
    Filed: December 1, 2023
    Publication date: March 21, 2024
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chung-Ting LI, Jen-Hsiang LU, Chih-Hao CHANG
  • Publication number: 20240096958
    Abstract: An embodiment is a semiconductor structure. The semiconductor structure includes a fin on a substrate. A gate structure is over the fin. A source/drain is in the fin proximate the gate structure. The source/drain includes a bottom layer, a supportive layer over the bottom layer, and a top layer over the supportive layer. The supportive layer has a different property than the bottom layer and the top layer, such as a different material, a different natural lattice constant, a different dopant concentration, and/or a different alloy percent content.
    Type: Application
    Filed: November 28, 2023
    Publication date: March 21, 2024
    Inventors: Jung-Chi Tai, Chii-Horng Li, Pei-Ren Jeng, Yen-Ru Lee, Yan-Ting Lin, Chih-Yun Chin
  • Patent number: 10123740
    Abstract: The wearable action-aware device includes a clothing body, a signal receiving and computing element, and a conductive line made of conductive fabric. Two ends of the conductive line are electrically connected to the signal receiving and computing element, respectively, to form a circuit, and both the signal receiving and computing element and the conductive line are disposed on the clothing body. An exposed side of the conductive line has electrical conductivity, and the circuit is disposed on a part of the clothing body corresponding to a part of a body that needs to be measured. Action information of a user can be measured when the user wears the present invention wearable action-aware device.
    Type: Grant
    Filed: August 2, 2016
    Date of Patent: November 13, 2018
    Assignee: Far Eastern New Century Corporation
    Inventors: Min-Si Yan, Wei-Che Hung, Yueh-Hsien Lin, Chih-Ting Li
  • Publication number: 20170209093
    Abstract: A wearable action-aware device is disclosed. The wearable action-aware device includes a clothing body, a signal receiving and computing element, and a conductive line made of conductive fabric. Two ends of the conductive line are electrically connected to the signal receiving and computing element, respectively, to form a circuit, and both the signal receiving and computing element and the conductive line are disposed on the clothing body. An exposed side of the conductive line has electrical conductivity, and the circuit is disposed on a part of the clothing body corresponding to a part of a body that needs to be measured. Action information of a user can be measured when the user wears the present invention wearable action-aware device.
    Type: Application
    Filed: August 2, 2016
    Publication date: July 27, 2017
    Inventors: Min-Si YAN, Wei-Che HUNG, Yueh-Hsien LIN, Chih-Ting LI
  • Patent number: D557697
    Type: Grant
    Filed: April 11, 2006
    Date of Patent: December 18, 2007
    Assignee: Apacer Technology, Inc.
    Inventors: Chien-Pang Chen, Chih-Ting Li
  • Patent number: D646443
    Type: Grant
    Filed: September 7, 2010
    Date of Patent: October 4, 2011
    Assignee: Lucky Litter LLC
    Inventors: Alan J. Cook, Jeff Salazar, Jeff Smith, Monica Chih-Ting Li, Roy Chih-Hao Chen