Abstract: A semiconductor device includes first and second active regions extending in parallel in a substrate, a plurality of conductive patterns, each conductive pattern of the plurality of conductive patterns extending on the substrate across each of the first and second active regions, and a plurality of metal lines, each metal line of the plurality of metal lines overlying and extending across each of the first and second active regions. Each conductive pattern of the plurality of conductive patterns is electrically connected in parallel with each metal line of the plurality of metal lines.

Abstract: Some implementations described herein include systems and techniques for fabricating a wafer-on-wafer product using a filled lateral gap between beveled regions of wafers included in a stacked-wafer assembly and along a perimeter region of the stacked-wafer assembly. The systems and techniques include a deposition tool having an electrode with a protrusion that enhances an electromagnetic field along the perimeter region of the stacked-wafer assembly during a deposition operation performed by the deposition tool. Relative to an electromagnetic field generated by a deposition tool not including the electrode with the protrusion, the enhanced electromagnetic field improves the deposition operation so that a supporting fill material may be sufficiently deposited.

Abstract: Described is a method of processing an antimicrobial glass substrate. More particularly, described is a method of removing one or more of silver nitrate or silver oxide on the surface of an antimicrobial glass substrate. Also described is a method of manufacturing a glass substrate that is substantially free of yellow discoloration.

Abstract: A screen protector comprises a glass-based substrate and an adhesive. The glass-based substrate comprises a first major surface, a second major surface, a thickness, and an edge. The first major surface comprises a first planar portion and a peripheral portion extending outwardly from the first planar portion. The second major surface comprises a second planar portion opposite the first planar portion and is parallel to the first planar portion. The edge comprises an outer peripheral surface that intersects the peripheral portion of the first major surface. The adhesive comprises a first major surface, a second major surface, a thickness, and an edge. The first major surface of the adhesive is adhered to the second major surface of the glass-based substrate.

Abstract: A physiological signal measurement device includes a housing, a bracket, a rigid circuit board fastened in the housing, a first flexible circuit board assembled in the housing and the in-ear portion, and a protective sleeve. The housing protrudes frontward to form an in-ear portion. The bracket has a base portion fastened to the in-ear portion. Several portions of a front surface of the base portion protrude frontward to form a plurality of first elastic portions. The first flexible circuit board has a resilient end. The resilient end of the first flexible circuit board surrounds the plurality of the first elastic portions. The protective sleeve has a fastening portion, and a plurality of spaced second elastic portions protruded from the fastening portion. The plurality of the spaced second elastic portions surround the plurality of the first elastic portions and the resilient end of the first flexible circuit board.

Abstract: A screen protector comprises a glass-based substrate and an adhesive. The glass-based substrate comprises a first major surface, a second major surface, a thickness, and an edge. The first major surface comprises a first planar portion and a peripheral portion extending outwardly from the first planar portion. The second major surface comprises a second planar portion opposite the first planar portion and is parallel to the first planar portion. The edge comprises an outer peripheral surface that intersects the peripheral portion of the first major surface. The adhesive comprises a first major surface, a second major surface, a thickness, and an edge. The first major surface of the adhesive is adhered to the second major surface of the glass-based substrate.

Abstract: Described is a method of processing an antimicrobial glass substrate. More particularly, described is a method of removing one or more of silver nitrate or silver oxide on the surface of an antimicrobial glass substrate. Also described is a method of manufacturing a glass substrate that is substantially free of yellow discoloration.

Abstract: A physiological signal measurement device includes a housing, a bracket, a rigid circuit board fastened in the housing, a first flexible circuit board assembled in the housing and the in-ear portion, and a protective sleeve. The housing protrudes frontward to form an in-ear portion. The bracket has a base portion fastened to the in-ear portion. Several portions of a front surface of the base portion protrude frontward to form a plurality of first elastic portions. The first flexible circuit board has a resilient end. The resilient end of the first flexible circuit board surrounds the plurality of the first elastic portions. The protective sleeve has a fastening portion, and a plurality of second elastic portions protruded from the fastening portion. The plurality of the second elastic portions surround the plurality of the first elastic portions and the resilient end of the first flexible circuit board.

Abstract: Methods and apparatus are disclosed for etching flexible glass sheets (13) in which the sheets (13) are transported in a vertical or near vertical orientation past non-contact, liquid-ejecting bearings (3) which apply an etching solution (e.g., an aqueous NaF/H3PO4 solution) to one or both sides of the sheets (13). In certain embodiments, the uppermost liquid-ejecting bearing (3) is above the top edge of the sheet (13) and thus is able to apply etching solution to the top of the sheet. In other embodiments, a top shower (11), which includes a set of spray nozzles (21) located above and distributed along the length of the apparatus, is used to apply etching solution to the top of the sheet (13). Using the disclosed methods and apparatus, glass sheets (13) produced by a fusion process are provided which have areas greater than five square meters and average surface roughness values in the range of 0.5 nanometers to 1.1 nanometers.

Abstract: A fluid applicator (20), for cleaning particles from a glass sheet (2), including a conveyor (40) for supporting the glass sheet, a conveyance plane, and a nozzle (24). The conveyance plane is disposed adjacent the conveyor so that when the glass sheet is conveyed by the conveyor, a surface (6) of the glass sheet is disposed in the conveyance plane. The nozzle has a longitudinal axis (23), wherein the longitudinal axis is disposed at an angle of 30 to 90 degrees with respect to the conveyance plane, and the nozzle is disposed at a distance (21) of less than or equal to 100 mm from the conveyance plane. Also, there is disclosed a method for cleaning particles from a glass sheet, using the fluid applicator. The fluid may be delivered to the nozzle at a pressure of 10 to 80 kg/cm2 and a flow rate of from 1 to 20 l/min.

Abstract: Methods and apparatus are disclosed for etching flexible glass sheets (13) in which the sheets (13) are transported in a near vertical orientation past non-contact, liquid-ejecting bearings (3) which apply an etching solution (e.g., an aqueous NaF/H3PO4 solution) to the sheets (13). In certain embodiments, the uppermost liquid-ejecting bearing (3) is above the top edge of the sheet (13) and thus is able to apply etching solution to the top of the sheet. In other embodiments, a top shower (11), which includes a set of spray nozzles (21) located above and distributed along the length of the apparatus, is used to apply etching solution to the top of the sheet (13). Using the disclosed methods and apparatus, glass sheets (13) produced by a fusion process are provided which have areas greater than five square meters and average surface roughness values in the range of 0.5 nanometers to 1.1 nanometers.

Abstract: A method for manufacturing an electrically programmable non-volatile memory cell comprises forming a first electrode on a substrate, forming an inter-electrode layer of material on the first electrode having a property which is characterized by progressive change in response to stress, and forming a second electrode over the inter-electrode layer of material. The inter-electrode layer comprises a dielectric layer, such as ultra-thin oxide, between the first and second electrodes. A programmable resistance, or other property, is established by stressing the dielectric layer, representing stored data. Embodiments of the memory cell are adapted to store multiple bits of data per cell and/or adapted for programming more than one time without an erase process.

Abstract: Methods and apparatus are disclosed for etching flexible glass sheets (13) in which the sheets (13) are transported in a near vertical orientation past non-contact, liquid-ejecting bearings (3) which apply an etching solution (e.g., an aqueous NaF/H3PO4 solution) to the sheets (13). In certain embodiments, the uppermost liquid-ejecting bearing (3) is above the top edge of the sheet (13) and thus is able to apply etching solution to the top of the sheet. In other embodiments, a top shower (11), which includes a set of spray nozzles (21) located above and distributed along the length of the apparatus, is used to apply etching solution to the top of the sheet (13). Using the disclosed methods and apparatus, glass sheets (13) produced by a fusion process are provided which have areas greater than five square meters and average surface roughness values in the range of 0.5 nanometers to 1.1 nanometers.

Abstract: An exemplary lithography process may include: receiving a substrate having a photo-sensitive layer; providing a light source capable of causing an exposure of a portion of the photo-sensitive layer; and providing a mask capable of defining at least one pattern that is to be transferred to the photo-sensitive layer. Specifically, the substrate has a top surface on or over the photo-sensitive layer, and the mask receives an electromagnetic wave from the light source at a first surface of the mask and generates a plurality of electromagnetic components from a second surface of the mask. The lithography process may also include: providing a lens, which provides a flat surface at a bottom surface of the lens, for transferring the pattern to the photo-sensitive layer; and adjusting the distance between the flat surface of the lens and the top surface of the substrate to control the number and amount of the electro-magnetic components projected onto the photo-sensitive layer.

Abstract: Methods and apparatus are disclosed for etching flexible glass sheets (13) in which the sheets (13) are transported in a vertical or near vertical orientation past non-contact, liquid-ejecting bearings (3) which apply an etching solution (e.g., an aqueous NaF/H3PO4 solution) to one or both sides of the sheets (13). In certain embodiments, the uppermost liquid-ejecting bearing (3) is above the top edge of the sheet (13) and thus is able to apply etching solution to the top of the sheet. In other embodiments, a top shower (11), which includes a set of spray nozzles (21) located above and distributed along the length of the apparatus, is used to apply etching solution to the top of the sheet (13). Using the disclosed methods and apparatus, glass sheets (13) produced by a fusion process are provided which have areas greater than five square meters and average surface roughness values in the range of 0.5 nanometers to 1.1 nanometers.

Abstract: A fluid applicator (20), for cleaning particles from a glass sheet (2), including a conveyor (40) for supporting the glass sheet, a conveyance plane, and a nozzle (24). The conveyance plane is disposed adjacent the conveyor so that when the glass sheet is conveyed by the conveyor, a surface (6) of the glass sheet is disposed in the conveyance plane. The nozzle has a longitudinal axis (23), wherein the longitudinal axis is disposed at an angle of 30 to 90 degrees with respect to the conveyance plane, and the nozzle is disposed at a distance (21) of less than or equal to 100 mm from the conveyance plane. Also, there is disclosed a method for cleaning particles from a glass sheet, using the fluid applicator. The fluid may be delivered to the nozzle at a pressure of 10 to 80 kg/m2 and a flow rate of from 1 to 20 l/min.

Abstract: A memory architecture for an integrated circuit comprises a first memory array configured to store data for one pattern of data usage and a second memory array configured to store data for another pattern of data usage. The first and second memory arrays comprise charge storage based nonvolatile memory cells having substantially the same structure in both arrays. A first operation algorithm adapted for example for data flash applications is used for programming, erasing and reading data in the first memory array. A second operation algorithm adapted for example for code flash applications is used for programming, erasing and reading data in the second memory array, wherein the second operation algorithm is different than the first operation algorithm. Thus, one die with memory for both code flash and data flash applications can be easily manufactured using a simple process, at low cost and high yield.

Abstract: Methods and apparatuses for causing electroluminescence with charge trapping structures are disclosed. Various embodiments relate to methods and apparatuses for causing electroluminescence with charge carriers of one type provided to the charge trapping structure by a forward biased p-n structure or a reverse biased p-n structure.

Abstract: An exemplary lithography process may include: receiving a substrate having a photo-sensitive layer; providing a light source capable of causing an exposure of a portion of the photo-sensitive layer; and providing a mask capable of defining at least one pattern that is to be transferred to the photo-sensitive layer. Specifically, the substrate has a top surface on or over the photo-sensitive layer, and the mask receives an electromagnetic wave from the light source at a first surface of the mask and generates a plurality of electromagnetic components from a second surface of the mask. The lithography process may also include: providing a lens, which provides a flat surface at a bottom surface of the lens, for transferring the pattern to the photo-sensitive layer; and adjusting the distance between the flat surface of the lens and the top surface of the substrate to control the number and amount of the electromagnetic components projected onto the photo-sensitive layer.

Abstract: A memory core includes a bit line and a word line. The memory core also includes a core cell in electrical communication with the word line and the bit line. The core cell includes a threshold changing material. The threshold changing material is programmed to enable access to the core cell based upon a voltage applied to the word line. Methods for accessing a memory core cell also are described.