Patents by Inventor Chih Yung Lo

Chih Yung Lo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Deposition equipment with adjustable temperature source
    Patent number: 12009208
    Abstract: The present disclosure provides a semiconductor processing apparatus according to one embodiment. The semiconductor processing apparatus includes a chamber; a base station located in the chamber for supporting a semiconductor substrate; a preheating assembly surrounding the base station; a first heating element fixed relative to the base station and configured to direct heat to the semiconductor substrate; and a second heating element moveable relative to the base station and operable to direct heat to a portion of the semiconductor substrate.
    Type: Grant
    Filed: December 8, 2021
    Date of Patent: June 11, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chih Yung Hung, Shahaji B. More, Chien-Feng Lin, Cheng-Han Lee, Shih-Chieh Chang, Ching-Lun Lai, Wei-Jen Lo
  • Antenna apparatus and antenna radome and design method thereof
    Patent number: 7525506
    Abstract: An antenna radome is associated with an antenna and comprises a plurality of radome elements arranged in an array. Each radome element comprises a dielectric substrate on which an upper surface is provided with a first fractal inductor layout and a lower surface is provided with a second fractal inductor layout. The second fractal inductor layout comprises a first inductor and a second inductor. The first inductor and second inductor are associated to accumulate charges so as to increase radiation directionality of the antenna.
    Type: Grant
    Filed: June 25, 2007
    Date of Patent: April 28, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Chun Yih Wu, Shih Huang Yeh, Ken Huang Lin, Hsin Lung Su, Chih Yung Lo
  • Antenna Apparatus and Antenna Radome and Design Method Thereof
    Publication number: 20080316140
    Abstract: An antenna radome is associated with an antenna and comprises a plurality of radome elements arranged in an array. Each radome element comprises a dielectric substrate on which an upper surface is provided with a first fractal inductor layout and a lower surface is provided with a second fractal inductor layout. The second fractal inductor layout comprises a first inductor and a second inductor. The first inductor and second inductor are associated to accumulate charges so as to increase radiation directionality of the antenna.
    Type: Application
    Filed: June 25, 2007
    Publication date: December 25, 2008
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chun Yih Wu, Shih Huang Yeh, Ken Huang Lin, Hsin Lung Su, Chih Yung Lo