Abstract: A resin composition for optical stereolithography including a cation-polymerizable organic compound (A), a radical polymerizable organic compound (B), a cationic polymerization initiator (C) and a radical polymerization initiator (D), wherein the cationic polymerization initiator (C) is an aromatic sulfonium compound (C-1) represented by the following general formula (C-1): wherein R1, R2, and R3 represent a monovalent organic group, Rf represents a fluoroalkyl group, m is the same number as the cationic charge of the “cation [S+(R1)(R2)(R3)]”, and n is an integer in a range of 0 to 6. The resin composition also includes an aromatic thiol compound (E) represented by the following general formula (E): R4SH)p??(E) wherein, R4 represents a mono- or di-valent aromatic hydrocarbon which may optionally have a substituent, and p is an integer of 1 or 2.

Abstract: A resin composition for optical stereolithography including a cation-polymerizable organic compound (A), a radical polymerizable organic compound (B), a cationic polymerization initiator (C) and a radical polymerization initiator (D) which is characterized by including, as a cationic polymerization initiator (C), an aromatic sulfonium compound (C-1) represented by the following general formula (C-1): (in the above general formula (C-1), R1, R2 and R3 represents a monovalent organic group, Rf represents a fluoroalkyl group, m is the same number as the cationic charge of the “cation [S+(R1) (R2) (R3)]”, n is an integer in the range of 0 to 6) as well as an aromatic thiol compound (E) represented by the following general formula (E): R4—(—SH)p ??(E) (wherein, R4 represents a mono- or di-valent aromatic hydrocarbon which may optionally have a substituent, p is an integer of 1 or 2.