Patents by Inventor Chiharu Nakano

Chiharu Nakano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • COLLOIDAL SILICA FOR METAL POLISHING
    Publication number: 20220228001
    Abstract: The problem to be solved by the present invention is to provide colloidal silica for metal polishing that is capable of achieving a high polishing rate. This problem can be achieved by a colloidal silica for metal polishing, comprising a silica particle having a surface on which a functional group having at least one carboxyl group is immobilized by covalent bonding.
    Type: Application
    Filed: April 14, 2020
    Publication date: July 21, 2022
    Applicant: FUSO CHEMICAL CO., LTD.
    Inventors: Daisuke Sugiyama, Chiharu Nakano
  • Can
    Patent number: D816515
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: May 1, 2018
    Assignee: Sapporo Holdings Limited
    Inventors: Seiji Takasaki, Chiharu Nakano, Keigo Aota, Tomoya Shigetomi, Ryo Atsumi, Tetsuya Monna