Patents by Inventor Chihiro Oshimo

Chihiro Oshimo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6486238
    Abstract: A hindered amine compound having thesolubility in an acidic solution of 5.0×10−3 eq./liter or less comprising at least two specific organic groups in a specific weight ratio in a molecule, or at least two specific monomeric units, which can be used as a stabilizer of a resin.
    Type: Grant
    Filed: December 20, 1999
    Date of Patent: November 26, 2002
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Kota Kitamura, Chihiro Oshimo, Genei Matsukawa, Futoshi Ishimaru
  • Patent number: 6245483
    Abstract: A photosensitive resin composition for flexographic printing comprising dispersed particles of (1) a core phase mainly composed of a non-crosslinkable hydrophobic polymer (A) having a glass transition temperature at 5° C. or lower, and (2) a shell phase covering the core phase which is mainly composed of a hydrophilic polymer; and (3) a matrix phase mainly composed of a mixture of a hydrophobic polymer (B) which is immiscible with the hydrophobic polymer (A) and a non gaseous ethylenic unsaturated compound. The difference between refractive index of said hydrophobic polymer (A) of the core phase (1) and that of the mixture of said hydrophobic polymer (B) and said ethylenic unsaturated compound of the matrix phase (3) is 0.010 or less, thereby decreasing light scattering in the resin. The photosensitive resin composition can be developed with an aqueous developer and has wide light exposure latitude, improved printing reproducibility and improved aqueous ink resistance.
    Type: Grant
    Filed: June 1, 1998
    Date of Patent: June 12, 2001
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Chihiro Oshimo, Tohru Wada, Masahiko Nakamori